Son Eklenen Ürün
Nanotoz, nanoteknoloji ve ileri malzeme alanında sektörün öncü isimlerinden biri olarak, müşterilerimize yüksek performanslı, güvenilir ve yenilikçi ürünler sunmaktadır. Ürün portföyümüz; araştırma, geliştirme ve endüstriyel uygulamalar için ideal olan, uluslararası kalite standartlarına uygun nanomalzemeleri kapsamaktadır.
Ürün Portföyümüz
Geniş ürün yelpazemiz arasında, uygulama alanınıza uygun birçok ürün bulunmaktadır. Başlıca ürünlerimiz şunlardır:
-
Nanopowder Serileri:
- Graphene Nanoplatelet, High-Purity Graphene, Graphene Oxide Dispersion, Graphene Nanopowder
- Titanium Oxide Nanopowder, Titanium Nitride & Titanium Carbide Nanopowder
- Cobalt Oxide, Nickel, Copper, Silver Nanopowder
- Silicon Carbide, Silicon Nitride, Ceramic, Zirconium Oxide Nanopowders
- Boron Carbide, Boron Nitride, Boron Oxide
- Zinc Oxide, Indium Tin Oxide, Chromium Oxide, Tin Oxide Nanopowders
- Strontium Titanate, Hydroxyapatite, Yttrium, Tungsten, Cerium Oxide Nanopowders
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İleri Fonksiyonel Malzemeler ve Kompozitler:
- Functionalized Multi-Walled Carbon Nanotubes, Multi-Walled Carbon Nanotubes Dispersion
- Carbon Nanotube Composites, Carbon Nanotube-Based Electrodes, Polymer Carbon Nanotube Composites
- Conductive Carbon Black, Electroconductive Carbon Black
- Graphite Sheet Thermal Interface Materials, High-Conductivity Graphite, Graphene-Based Supercapacitors
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Özel Alaşımlar ve Sinterlenmiş Tozlar:
- Nickel Cobalt Iron Oxide, Nickel Titanium Shape Memory Alloy, Iron Nickel Alloy
- Copper Tin Alloy, Aluminum Silicon Copper Sputtering Targets, Magnesium Alloy Powder
- Titanium Diboride Micron Powder, Zirconium Diboride, Copper Tin Alloy Micron Powder
-
Enerji Depolama ve Pil Malzemeleri:
- Lithium-Ion Battery Anode, Lithium Titanate, Lithium Battery Cathode Material
- Lithium Cobalt Oxide, Lithium Iron Phosphate, Lithium Manganese Oxide, Lithium Metal Powder
-
Diğer Özel Ürünler:
- Polyether Ether Ketone, Nanocomposite Materials, Graphene-Based Inks, Graphene Quantum Dots
- Ayrıca, strüktürel ve termal yönetim uygulamaları için geliştirilmiş ürünlerimiz de mevcuttur.
Teknolojik Avantajlar
-
Yüksek Saflık ve Performans:
Ürünlerimiz, en gelişmiş üretim teknikleri ve titiz kalite kontrol süreçleriyle üretilmektedir. Bu sayede, her bir malzeme yüksek saflık, homojen boyut dağılımı ve üstün performans sergilemektedir. -
Geniş Uygulama Yelpazesi:
Nanomalzemelerimiz; elektronik, otomotiv, havacılık, enerji depolama, medikal, malzeme bilimi ve araştırma-geliştirme gibi pek çok alanda kullanılmak üzere tasarlanmıştır. -
Ar-Ge ve Sürekli İnovasyon:
Firmamız, müşterilerimizin ihtiyaçlarını karşılamak ve geleceğin teknolojilerine yön vermek amacıyla sürekli Ar-Ge çalışmalarına yatırım yapmaktadır. Ürün portföyümüz, sektörün en son gelişmelerini yansıtacak şekilde sürekli güncellenmektedir.
Sektörel Uygulamalar
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Elektronik ve Optoelektronik:
İndiyum tin oxide, graphene nanoplatelet, conductive carbon black ve diğer malzemelerimiz, ekran teknolojilerinden sensörlere kadar geniş uygulama alanlarına sahiptir. -
Enerji Depolama:
Lithium-ion battery anode, lithium titanate ve ilgili pil malzemelerimiz, yüksek verimli enerji depolama sistemlerinin temel bileşenlerindendir. -
Otomotiv ve Havacılık:
Titanium oxide nanopowder, silicon carbide nanopowder gibi ürünlerimiz, yapısal ve termal yönetim çözümlerinde kritik rol oynamaktadır. -
Medikal ve Biyomalzemeler:
Hydroxyapatite nanopowder ve özel seramik ürünlerimiz, biyouyumluluk gerektiren uygulamalarda tercih edilmektedir.
Neden Bizimle Çalışmalısınız?
-
Kalite Güvencesi:
Tüm ürünlerimiz uluslararası standartlara uygun olarak üretilmekte ve titiz testlerden geçirilmektedir. -
Özelleştirilebilir Çözümler:
Müşterilerimizin özel gereksinimlerine yönelik olarak, ürün portföyümüzde esneklik ve özelleştirme imkanı sunmaktayız. -
Uzman Destek:
Deneyimli teknik ekibimiz, uygulama ve entegrasyon süreçlerinde kapsamlı danışmanlık hizmetleri vermekte, projenizin her aşamasında yanınızda olmaktadır.
| Ürün Adı | Ürün Kodu | Kullanım Alanları | Özellikler |
| Graphene Sheet | NK0001 | Elektronik, Batarya Elektrotları, Sensörler | Size: 1 cm x 1 cm, Thickness: 35 µm, Highly Conductive |
| Nitinol Shape Memory Alloy Sheet | NK0002 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Thickness: 2 mm, AF: -10 – -15°C |
| Magnesium Hydroxide (Mg(OH)2) Micron Powder | NK0003 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95+%, Size: 325 mesh |
| Silicon Carbide (SiC) Micron Powder | NK0004 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99, 9%, Size: 250 µm |
| Nitinol Shape Memory Alloy Sheet | NK0005 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Thickness: 1 mm, AF: 50-55°C |
| Nitinol Shape Memory Alloy Sheet | NK0006 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Thickness: 0, 5 mm, AF: 80-85°C |
| Nitinol Shape Memory Alloy Sheet | NK0007 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Thickness: 0, 5 mm, AF: 35-40°C |
| Magnesium Carbonate (MgCO3) Micron Powder | NK0008 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9+%, Size: 325 mesh |
| Iron Oxide (Fe2O3) Micron Powder | NK0009 | Pigment, Manyetik Malzemeler, Katalizörler | Gamma, Purity 99.9+%, Size: 325 mesh |
| Activated Carbon (C) Nanopowder/Nanoparticles | NK0010 | Genel Endüstriyel Kullanım | Purity: 95%, Size: <100 nm, Charcoal |
| no image available | NK0011 | Genel Endüstriyel Kullanım | |
| Natural Graphite (C) Nanopowder/Nanoparticles | NK0012 | Genel Endüstriyel Kullanım | Purity: 99.9% Size: 380 nm-1.2 um |
| Iron Oxide (Fe3O4) Micron Powder | NK0013 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9+%, Size: 325 mesh |
| Silicon Carbide (SiC) Micron Powder | NK0014 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.9%, Size: 325 mesh |
| Nitinol Shape Memory Alloy Sheet | NK0015 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Thickness: 0, 15 mm, AF: 15-20°C |
| Silicon Carbide (SiC) Micron Powder | NK0016 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99, 9%, Size: 1 µm |
| Antibacterial Nanopowder/Nanoparticles | NK0017 | Genel Endüstriyel Kullanım | Size: 100 nm |
| Copper Tin (Cu:85-Sn:15) Alloy Micron Powder | NK0018 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 325 mesh |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0019 | Genel Endüstriyel Kullanım | Gamma, Purity: 99.55%, Size: 78 nm, Hydrophilic |
| Iron Oxide (Fe2O3) Micron Powder | NK0020 | Pigment, Manyetik Malzemeler, Katalizörler | Gamma, Purity: 99.9+%, Size: 1 µm |
| Graphene Nanoplatelet | NK0021 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9%, Size: 3 nm, S.A: 800 m2/g, Dia: 1.5 μm |
| Coin Style Single Wafer Shipper | NK0022 | Genel Endüstriyel Kullanım | 3’’ / 76 mm , Natural PP |
| Titanium Dioxide (TiO2) Micron Powder | NK0023 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+ %, Size: 325 mesh |
| Copper Tin (Bronze | NK0024 | Genel Endüstriyel Kullanım | Cu:80-Sn:20) Alloy Micron Powder, Purity: 99.95%, Size: 325 mesh |
| Titanium Diboride (TiB2) Micron Powder | NK0025 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+%, Size: 40-50 µm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0026 | Genel Endüstriyel Kullanım | Purity: 99.95+%, Size: 50-100 µm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0027 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: 10 µm, Fused |
| Coin Style Single Wafer Shipper | NK0028 | Genel Endüstriyel Kullanım | 2’’ / 51 mm , Natural PP |
| Copper (Cu) Micron Powder | NK0029 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh, Spherical |
| Coin Style Single Wafer Shipper | NK0030 | Genel Endüstriyel Kullanım | 5’’ / 125 mm , Natural PP |
| Samarium Oxide (Sm2O3) Micron Powder | NK0031 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Titanium Diboride (TiB2) Micron Powder | NK0032 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+%, Size: 200 mesh |
| Graphene Nanoplatelet | NK0033 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9+%, Size: 3 nm, S.A: 320 m2/g, Dia: 1.5 μm |
| Boron Carbide (B4C) Micron Powder | NK0034 | Genel Endüstriyel Kullanım | Purity: 95+%, Size: 325 mesh |
| Coin Style Single Wafer Shipper | NK0035 | Genel Endüstriyel Kullanım | 6’’ / 150 mm , Natural PP |
| Coin Style Single Wafer Shipper | NK0036 | Genel Endüstriyel Kullanım | 4’’ / 100 mm , Natural PP |
| Graphene Nanoplatelet | NK0037 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9+%, Size: 5 nm, S.A: 135 m2/g, Dia: 7 μm |
| Tellurium Dioxide (TeO2) Micron Powder | NK0038 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 1-5 µm |
| Graphene Nanoplatelet | NK0039 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9+%, Size: 3 nm, S.A: 530 m2/g, Dia: 1.5 μm |
| Tellurium (Te) Micron Powder | NK0040 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 325 mesh |
| Boron Carbide (B4C) Micron Powder | NK0041 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: < 10 µm |
| Iron Oxide (Fe3O4) Micron Powder | NK0042 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.5+%, Size: 1 µm |
| Nickel (Ni) Micron Powder | NK0043 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 10 µm |
| Silicon Nitride (Si3N4) Micron Powder | NK0044 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.9%, Size: 10 µm |
| Nickel (Ni) Micron Powder | NK0045 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Porous Carbon (C) Nanopowder/Nanoparticles | NK0046 | Genel Endüstriyel Kullanım | Size: 18-38 nm, (Plant) |
| Graphene Sheet | NK0047 | Elektronik, Batarya Elektrotları, Sensörler | Size: 5cm x 5cm, Thickness: 35 µm, Highly Conductive |
| Nanocalcite | NK0048 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: <200 nm |
| Silicon Nitride (Si3N4) Micron Powder | NK0049 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.9%, Size: 325 mesh |
| Strontium Titanate (SrTiO3) Micron Powder | NK0050 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 3 µm |
| Boron Carbide (B4C) Micron Powder | NK0051 | Genel Endüstriyel Kullanım | Purity: 95+%, Size: 250 µm |
| Graphene Nanoplatelet | NK0052 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9+%, Size: 5 nm, S.A: 135 m2/g, Dia: 30 μm |
| Conductive Carbon Black Nanopowder/Nanoparticles | NK0053 | Genel Endüstriyel Kullanım | Purity: 95%, Size: 148 nm (Plant) |
| Silicon (Si) Micron Powder | NK0054 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.99 %, Size: 325 mesh |
| Graphene Nanoplatelet | NK0055 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9+%, Size: 5 nm, S.A: 170 m2/g, Dia: 7 μm |
| AZ91 Magnesium Alloy Powder | NK0056 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 15-53 μm |
| Graphite Micron Powder | NK0057 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5-10 µm |
| Graphene Nanoplatelet | NK0058 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9+%, Size: 5 nm, S.A: 135 m2/g, Dia: 18 μm |
| Water-_19_.webp | NK0059 | Genel Endüstriyel Kullanım | |
| Lanthanum Oxide (La2O3) Micron Powder | NK0060 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1-10 μm |
| Titanium Carbide (TiC) Micron Powder | NK0061 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99, 9+%, Size: 325 mesh |
| Graphene Nanoplatelet | NK0062 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9+%, Size: 5 nm, S.A: 170 m2/g, Dia: 18 μm |
| Cobalt (Co) Nanopowder/Nanoparticles | NK0063 | Genel Endüstriyel Kullanım | Purity: 99.85%, Size: 28 nm, Partially Passivated |
| Hydroxyapatite Powder | NK0064 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 40-50 µm |
| Hydroxyapatite Powder | NK0065 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 10-20 µm |
| Copper Oxide (CuO) Nanopowder/Nanoparticles | NK0066 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 38 nm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0067 | Genel Endüstriyel Kullanım | Alpha, Purity: 99.5+%, Size: 78 nm, Hydrophilic |
| Graphene Nanoplatelet | NK0068 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.9+%, Size: 5 nm, S.A: 170 m2/g, Dia: 30 μm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0069 | Genel Endüstriyel Kullanım | Gamma, Purity: 99.5+%, Size: 18 nm, Hydrophilic |
| Manganese (Mn) Micron Powder | NK0070 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 35 µm, Metal Basis |
| Indium Hydroxide (In(OH)3) Micron Powder | NK0071 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Sulphur (S) Micron Powder | NK0072 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 325 mesh |
| Zinc (Zn) Micron Powder | NK0073 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3 µm |
| Tungsten Carbide (WC) Micron Powder | NK0074 | Genel Endüstriyel Kullanım | Purity: 99, 9%, Size: -325 mesh |
| Molybdenum (Mo) Micron Powder | NK0075 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1-10 µm, Metal Basis |
| Barium Ferrite (BaFe12O19) Micron Powder | NK0076 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 1-3 µm |
| Titanium Carbide (TiC) Micron Powder | NK0077 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 1 µm |
| Nickel (Ni) Micron Powder | NK0078 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 500 Mesh, Spherical |
| Titanium Hydride (TiH2) Micron Powder | NK0079 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 325 mesh |
| Activated Carbon (C) Nanopowder/Nanoparticles | NK0080 | Genel Endüstriyel Kullanım | Size: < 90 nm, Coconut |
| Graphene Sheet | NK0081 | Elektronik, Batarya Elektrotları, Sensörler | Size: 10 cm x 10 cm, Thickness: 35 µm, Highly Conductive |
| Aluminum Oxide (Al2O3) Micron Powder | NK0082 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: Sub-Micron, Fused |
| Silicon Dioxide(SiO2) Micron Powder | NK0083 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: -325 mesh, Purity: 99.9% |
| PTFE Nanopowder/Nanoparticles [Polytetrafluoroethylene | NK0084 | Genel Endüstriyel Kullanım | (C2F4)n)], Purity: 99.9% |
| Chromium (Cr) Micron Powder | NK0085 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 100 mesh |
| Conductive Bakelite Powder | NK0086 | Genel Endüstriyel Kullanım | |
| Hydroxyapatite Micron Powder | NK0087 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 3 µm |
| Strontium Iron Oxide (SrFe12O19) Micron Powder | NK0088 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9+%, Size: 1-3 µm |
| Barium (Ba) Micron Powder | NK0089 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 325 mesh |
| Zinc (Zn) Micron Powder | NK0090 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 325 mesh |
| Aluminum (Al) Micron Powder | NK0091 | Genel Endüstriyel Kullanım | Purity: 99.9+ %, Size: 55 µm |
| Copper Oxide (CuO) Micron Powder | NK0092 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 20 µm |
| Aluminum (Al) Micron Powder | NK0093 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 20-35 µm |
| Cuprous Oxide (Cu2O) Micron Powder | NK0094 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: -200 mesh |
| Neodymium (Nd) Micron Powder | NK0095 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Aluminum (Al) Micron Powder | NK0096 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 1-2 µm |
| Boron Carbide (B4C) Micron Powder | NK0097 | Genel Endüstriyel Kullanım | Purity: 95+%, Size: 1-3 µm |
| Calcium Oxide (CaO) Micron Powder | NK0098 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95+ %, Size: < 5 µm |
| Molybdenum Disilicide (MoSi2) Micron Powder | NK0099 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 1-10 µm |
| Silicon Dioxide (SiO2) Micron Powder | NK0100 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: <15 Micron, Purity: 99.8% |
| Aluminum (Al) Micron Powder | NK0101 | Genel Endüstriyel Kullanım | Purity: 99.9+ %, Size: 30 µm |
| Niobium (Nb) Micron Powder | NK0102 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 45 µm, Metal Basis |
| Sodium Dodecyl Sulfate Micron Powder | NK0103 | Genel Endüstriyel Kullanım | Size: -325 mesh |
| Chromium(III) oxide (Cr2O3) Micron Powder | NK0104 | Genel Endüstriyel Kullanım | Purity: 99%, Average Particle Size: 4.5µm |
| Carbon Nanotubes Doped with 12 wt% Graphene Nanopowder/Nanoparticles | NK0105 | Elektronik, Batarya Elektrotları, Sensörler | |
| Lithium Metaborate (LiBO2) Nanopowder/Nanoparticles | NK0106 | Genel Endüstriyel Kullanım | Purity: 99.95+ %, Size: 500 nm, Metals Basis |
| Niobium (Nb) Micron Powder | NK0107 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 10 µm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in Water | NK0108 | Genel Endüstriyel Kullanım | Alpha, Size: 28 nm, 22 wt% |
| Barium Titanate (BaTiO3) Nanopowder/Nanoparticles | NK0109 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 90 nm, Cubic |
| Barium Titanate (BaTiO3) Nanopowder/Nanoparticles | NK0110 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 280 nm, Tetragonal |
| Barium Titanate (BaTiO3) Nanopowder/Nanoparticles | NK0111 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 370 nm, Tetragonal |
| Molybdenum Disulfide (MoS2) Micron Powder | NK0112 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 325 mesh |
| Barium Titanate (BaTiO3) Nanopowder/Nanoparticles | NK0113 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 500 nm, Tetragonal |
| Silicon (Si) Micron Powder | NK0114 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.95%, Size: 1-3 um, Polycrystalline |
| Aluminum (Al) Micron Powder | NK0115 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 100 mesh |
| Aluminum (Al) Micron Powder | NK0116 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 70 µm |
| Nickel Iron Oxide (NiFe2O4) Nanopowder/Nanoparticles | NK0117 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 98.99%, Size: 25 nm |
| Bismuth (Bi) Micron Powder | NK0118 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 200 mesh |
| Magnesium Oxide (MgO) Nanopowder/Nanoparticles | NK0119 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.5+%, Size: < 55 nm |
| Iron Oxide (Fe3O4) Nanopowder/Nanoparticles | NK0120 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 98.45+%, Size: 18-28 nm |
| Iron Oxide (Fe2O3) Nanopowder/Nanoparticles | NK0121 | Pigment, Manyetik Malzemeler, Katalizörler | Gamma, Purity: 99.55%, Size: 18-38 nm |
| Antimony (III) Oxide (Sb2O3) Micron Powder | NK0122 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3 µm |
| Graphite (C) Micron Powder | NK0123 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1-5 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0124 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 600-850 μm |
| Phosphorus (P) Micron Powder | NK0125 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1 µm, Metal Basis |
| Aluminum Oxide (Al2O3) Micron Powder | NK0126 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 300-425 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0127 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 250-355 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0128 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 212-300 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0129 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 180-250 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0130 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 850-1180 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0131 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 150-212 μm |
| Lithium Hydroxide | NK0132 | Genel Endüstriyel Kullanım | Monohydrate (Battery Grade, LiOH.H2O), Purity: ≥ 99.0% |
| Aluminum Oxide (Al2O3) Micron Powder | NK0133 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 125-180 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0134 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 90-125 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0135 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 63-106 μm |
| Silicon (Si) Micron Powder | NK0136 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.99 %, Size: 10 µm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0137 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 53-90 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0138 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 1180-1700 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0139 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 1400-2000 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0140 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 45-75 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0141 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 34-82 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0142 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 28-70 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0143 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 22-59 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0144 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 16-49 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0145 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 12-40 μm |
| Aluminum Silicon Copper (AlSiCu) Sputtering Targets | NK0146 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Micron Powder | NK0147 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 8-32 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0148 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 5-25 μm |
| Activated Carbon Micron Powder | NK0149 | Genel Endüstriyel Kullanım | Size: 8-30 Mesh |
| Aluminum Oxide (Al2O3) Micron Powder | NK0150 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 3-19 μm |
| Zinc (Zn) Micron Powder | NK0151 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 200 mesh |
| Aluminum Oxide (Al2O3) Micron Powder | NK0152 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 2-14 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0153 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 355-500 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0154 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 425-600 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0155 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 500-710 μm |
| Tantalum (Ta) Micron Powder | NK0156 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 3 µm |
| Nickel Chromium (Ni-Cr) Alloy Micron Powder | NK0157 | Genel Endüstriyel Kullanım | Size: 325 mesh, Ni-80%, Cr-20% |
| Tin (Sn) Micron Powder | NK0158 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 1 µm |
| Zinc (Zn) Nanopowder/Nanoparticles | NK0159 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 790 nm |
| Gadolinium Oxide (Gd2O3) Micron Powder | NK0160 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Zinc Iron Oxide (ZnFe2O4) Nanopowder/Nanoparticles | NK0161 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 98.7%, Size: 8-28 nm |
| Aluminum (Al) Micron Powder | NK0162 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 80 µm |
| Iron (Fe) Micron Powder | NK0163 | Genel Endüstriyel Kullanım | Purity: 99.5+ %, Size: 325 mesh |
| Aluminum (Al) Micron Powder | NK0164 | Genel Endüstriyel Kullanım | Purity: 99.95+ %, Size: 14 µm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0165 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 106-150 μm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0166 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 1000-1400 μm |
| Nickel Oxide (NiO) Micron Powder | NK0167 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 200 mesh, Black |
| Manganese (Mn) Micron Powder | NK0168 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 10 µm |
| Calcium Oxide (CaO) Micron Powder | NK0169 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9 %, Size: 325 mesh |
| Holmium (Ho) Micron Powder | NK0170 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles | NK0171 | Elektronik, Yarı İletkenler, Optik Malzemeler | S-type, Spherical, Purity: 99.95+%, Size: 13-22 nm, Nonporous and Amorphous |
| Aluminum Oxide (Al2O3) Micron Powder | NK0172 | Genel Endüstriyel Kullanım | Alpha, Purity: 99.9%, Size: 20 µm |
| Aluminum (Al) Micron Powder | NK0173 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 9-11 µm |
| Tantalum (Ta) Micron Powder | NK0174 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 10 µm |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles | NK0175 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.65+%, Size: 13-23 nm, Porous and Amorphous |
| Calcium Copper Titanate (CaCu3Ti4O12) Micron Powder | NK0176 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | D50:1-3um, Purity: ≥ 99.5 % |
| Samarium Oxide (Sm2O3) Nanopowder/Nanoparticles | NK0177 | Genel Endüstriyel Kullanım | Purity: 99.955%, Size: 13-47 nm |
| Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles | NK0178 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8-110 nm |
| Multi Walled Carbon Nanotubes | NK0179 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: < 8 nm |
| Aluminum Silicon Copper (AlSiCu) Sputtering Targets | NK0180 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Micron Powder | NK0181 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 20 µm |
| Tin (Sn) Micron Powder | NK0182 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 15 µm |
| Zinc Oxide (ZnO) Micron Powder | NK0183 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 325 mesh, White |
| Molybdenum Trioxide (MoO3) Micron Powder | NK0184 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh |
| Silver (Ag) Nanopowder/Nanoparticles | NK0185 | Genel Endüstriyel Kullanım | Purity: 99.95+%, Size: 20 nm, metal basis |
| (-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes | NK0186 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 20-40 nm |
| Carbon Nanofibers | NK0187 | Genel Endüstriyel Kullanım | Purity: > 95%, Outside Diameter: 50-150 nm |
| (-COOH) Functionalized Multi Walled Carbon Nanotubes | NK0188 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 48-78 nm |
| Aluminum (Al) Micron Powder | NK0189 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh, Spherical |
| (-COOH) Functionalized Multi Walled Carbon Nanotubes | NK0190 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 28-48 nm |
| Zirconium (Zr) Micron Powder | NK0191 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 80 µm, Metal Basis |
| Activated Carbon Micron Powder | NK0192 | Genel Endüstriyel Kullanım | Size: 4000 µm |
| Vulcan XC72 Conductive Carbon Black | NK0193 | Genel Endüstriyel Kullanım | |
| Lanthanum Oxide (La2O3) Nanopowder/Nanoparticles | NK0194 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 8-190 nm |
| Cobalt (Co) Micron Powder | NK0195 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 10 µm |
| Boron Nitride (BN) Micron Powder | NK0196 | Genel Endüstriyel Kullanım | Purity: 99.7%, Size: 40-50 µm, Hexagonal |
| Activated Carbon Micron Powder | NK0197 | Genel Endüstriyel Kullanım | Size: 2000 µm |
| Copper (Cu) Nanopowder/Nanoparticles | NK0198 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 780 nm, Metal Basis |
| Zinc Ferrite (ZnFe2O4) Micron Powder | NK0199 | Genel Endüstriyel Kullanım | Zinc Iron Oxide Micron Powder, -200 mesh, 99.9% |
| Activated Carbon Micron Powder | NK0200 | Genel Endüstriyel Kullanım | Size: 1500 µm |
| Silver (Ag) Nanopowder/Nanoparticles | NK0201 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 28-48 nm, Metal Basis |
| Titanium Dioxide (TiO2) Micron Powder | NK0202 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+%, Size: 20 µm |
| Silver (Ag) Nanopowder/Nanoparticles | NK0203 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 28-48 nm, w/~0.25% PVP |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0204 | Genel Endüstriyel Kullanım | Alpha, High Purity: 99.95%, Size: 290 nm, Hydrophilic |
| Polyether Ether Ketone (PEEK) Micron Powder | NK0205 | Genel Endüstriyel Kullanım | Purity: 99.95+ %, Size: <325 mesh |
| Silver (Ag) Nanopowder/Nanoparticles | NK0206 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 48-78 nm, metal basis |
| Barium Carbonate (BaCO3) Nanopowder/Nanoparticles | NK0207 | Genel Endüstriyel Kullanım | Purity: 99.98%, Size: 780 nm |
| Aluminum (Al) Micron Powder | NK0208 | Genel Endüstriyel Kullanım | Purity: 99.9+ %, Size: 7 µm |
| Cadmium (Cd) Micron Powder | NK0209 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 200 mesh, Irregular |
| Iron (Fe) Nanopowder/Nanoparticles | NK0210 | Genel Endüstriyel Kullanım | Purity: 99.55%, Size: 790 nm |
| Chromium (Cr) Micron Powder | NK0211 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 10 µm |
| Silver (Ag) Nanopowder/Nanoparticles | NK0212 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 18 nm, w/~0.25% PVP |
| Tungsten Disulfide Micron powder | NK0213 | Genel Endüstriyel Kullanım | WS2, 99.9%, 325 mesh |
| Tin Oxide (SnO2) Nanopowder/Nanoparticles | NK0214 | Genel Endüstriyel Kullanım | High Purity: 99.87%, Size: 30-60 nm |
| Aluminum (Al) Micron Powder | NK0215 | Genel Endüstriyel Kullanım | Purity: 99.9+ %, Size: 5 µm |
| Copper Oxide (CuO) Nanopowder/Nanoparticles | NK0216 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: < 77 nm |
| Magnesium Hydroxide (Mg(OH)2) Nanopowder/Nanoparticles | NK0217 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.5%, Size: 8 nm |
| Silver (Ag) Micron Powder | NK0218 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: Sub-Micron |
| Lithium Titanium Oxide (Li4Ti5O12) Micron Powder for Li-ion Battery Anode (LTO) | NK0219 | Seramik, Yarı İletken, Kimyasal Endüstri | |
| Bismuth Oxide (Bi2O3) Nanopowder/Nanoparticles | NK0220 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 75-195 nm |
| Aluminum Hydroxide (Al(OH)3) Nanopowder/Nanoparticles | NK0221 | Genel Endüstriyel Kullanım | High Purity: 99.95%, Size: 8-18 nm, Hydrophilic |
| Silver-_Ag_-Micron-Powder-99.9_-1-3-um.webp | NK0222 | Genel Endüstriyel Kullanım | |
| Silver (Ag) Micron Powder | NK0223 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 1-3 µm |
| Porous Carbon (C) Nanopowder/Nanoparticles | NK0224 | Genel Endüstriyel Kullanım | Purity: 95%, Size: 55-75 nm, (Plant) |
| Praseodymium Oxide (Pr6O11) Nanopowder/Nanoparticles | NK0225 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 13-57 nm |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles | NK0226 | Elektronik, Yarı İletkenler, Optik Malzemeler | Amorphous, Purity: 98.5+%, Size: 55-75 nm |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles | NK0227 | Elektronik, Yarı İletkenler, Optik Malzemeler | Amorphous, Purity: 99.5+%, Size: 15-35 nm |
| Tungsten Oxide (WO3) Nanopowder/Nanoparticles | NK0228 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 55 nm, Tetragonal |
| Selenium (Se) Micron Powder | NK0229 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 325 mesh |
| Zirconium Hydride (ZrH2) Micron Powder | NK0230 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Thickness: 1- 10 µm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0231 | Genel Endüstriyel Kullanım | Alpha, High Purity: 99.95%, Size: 136 nm, Hydrophilic |
| Titanium (Ti) Micron Powder | NK0232 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+%, Size: 325 mesh |
| Antimony (Sb) Micron Powder | NK0233 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Silicon (Si) Nanopowder/Nanoparticles | NK0234 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 90nm |
| (-COOH) Functionalized Multi Walled Carbon Nanotubes | NK0235 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 8-18 nm |
| Aluminum Silicon Copper (AlSiCu) Sputtering Targets | NK0236 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Manganese Iron Oxide (MnFe2O4) Nanopowder/Nanoparticles | NK0237 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 98.95%, Size: 55 nm |
| Nickel (Ni) Micron Powder | NK0238 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 325 mesh, Spherical |
| Boron (B) Nanopowder/Nanoparticles | NK0239 | Genel Endüstriyel Kullanım | Purity: 99.55+%, Size: 450 nm |
| Silicon Carbide (SiC) Micron Powder | NK0240 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 34-82 μm |
| Graphite (C) Micron Powder | NK0241 | Genel Endüstriyel Kullanım | Purity: ≥99.99%, Size: < 45 μm |
| Silicon Carbide (SiC) Micron Powder | NK0242 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 1400-2000 μm |
| Silicon Carbide (SiC) Micron Powder | NK0243 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+% , Size: 1180-1700 μm |
| Silicon Carbide (SiC) Micron Powder | NK0244 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 1000-1400 μm |
| Silicon Carbide (SiC) Micron Powder | NK0245 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 850-1180 μm |
| Silicon Carbide (SiC) Micron Powder | NK0246 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 600-850 μm |
| Silicon Carbide (SiC) Micron Powder | NK0247 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 500-710 μm |
| Silicon Carbide (SiC) Micron Powder | NK0248 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 425-600 μm |
| Silicon Carbide (SiC) Micron Powder | NK0249 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 355-500 μm |
| Silicon Carbide (SiC) Micron Powder | NK0250 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 300-425 μm |
| Silicon Carbide (SiC) Micron Powder | NK0251 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 250-355 μm |
| Silicon Carbide (SiC) Micron Powder | NK0252 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 212-300 μm |
| Silicon Carbide (SiC) Micron Powder | NK0253 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 180-250 μm |
| Silicon Carbide (SiC) Micron Powder | NK0254 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 150-212 μm |
| Silicon Carbide (SiC) Micron Powder | NK0255 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 125-180 μm |
| Silicon Carbide (SiC) Micron Powder | NK0256 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 106-150 μm |
| Silicon Carbide (SiC) Micron Powder | NK0257 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 90-125 μm |
| Silicon Carbide (SiC) Micron Powder | NK0258 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 63-106 μm |
| Silicon Carbide (SiC) Micron Powder | NK0259 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 53-90 μm |
| Silicon Carbide (SiC) Micron Powder | NK0260 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 45-75 μm |
| Silicon Carbide (SiC) Micron Powder | NK0261 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 28-70 μm |
| Silicon Carbide (SiC) Micron Powder | NK0262 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 22-59 μm |
| Silicon Carbide (SiC) Micron Powder | NK0263 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99+%, Size: 16-49 µm |
| Silicon Carbide (SiC) Micron Powder | NK0264 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 12-40 μm |
| Silicon Carbide (SiC) Micron Powder | NK0265 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 8-32 μm |
| Silicon Carbide (SiC) Micron Powder | NK0266 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 5-25 μm |
| Silicon Carbide (SiC) Micron Powder | NK0267 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 3-19 μm |
| Silicon Carbide (SiC) Micron Powder | NK0268 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5+%, Size: 2-14 μm |
| Manganese Ferrite Black Oxide Micron Powder | NK0269 | Genel Endüstriyel Kullanım | (Fe, Mn)3O4, 94+%, -325 mesh |
| Nickel Oxide (NiO) Micron Powder | NK0270 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh, Green |
| Yttrium Oxide (Y2O3) Nanopowder/Nanoparticles | NK0271 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 25-50 nm |
| Nickel Oxide (NiO) Nanopowder/Nanoparticles | NK0272 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 8-18 nm |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles | NK0273 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 95.9+%, Size: 18-35 nm, KH570 Coated |
| Magnesium Oxide (MgO) Nanopowder/Nanoparticles | NK0274 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.5+%, Size: < 90 nm |
| Antimony-Oxide-400-nm-99-.webp | NK0275 | Genel Endüstriyel Kullanım | |
| Antimony Oxide (Sb2O3) Nanopowder/Nanoparticles | NK0276 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: 400 nm |
| Zirconium (II) Hydride (ZrH2) Micron Powder | NK0277 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: <10 µm |
| Cerium Oxide (CeO2) Nanopowder/Nanoparticles Water Dispersion | NK0278 | Genel Endüstriyel Kullanım | Size: 25-45 nm, 22 wt% |
| Nickel Oxide (NiO) Nanopowder/Nanoparticles | NK0279 | Genel Endüstriyel Kullanım | High Purity: 99.55+%, Size: 10-40 nm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0280 | Genel Endüstriyel Kullanım | Amorphous, Size: 45 nm, Al2O3: 92 wt%, H2O: 6-7 wt% |
| Magnesium Oxide (MgO) Nanopowder/Nanoparticles | NK0281 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.5+%, Size: 18 nm |
| Hafnium Oxide (HfO2) Nanopowder/Nanoparticles | NK0282 | Genel Endüstriyel Kullanım | High Purity: 99.99%, Size: 55-75 nm |
| Magnesium Oxide (MgO) Nanopowder/Nanoparticles | NK0283 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.5+%, Size: 35 nm |
| Tungsten Carbide (WC) Nanopowder/Nanoparticles | NK0284 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 55 nm |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles | NK0285 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 96.3+%, Size: 18-35 nm, KH550 Coated |
| Barium Titanate (BaTiO3) Micron Powder | NK0286 | Genel Endüstriyel Kullanım | Purity: > 99 %, Size: 1-3 µm |
| Hafnium Oxide (HfO2) Micron Powder | NK0287 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 1 µm |
| Silver (Ag) Doped Antibacterial Nanopowder/Nanoparticles | NK0288 | Genel Endüstriyel Kullanım | Size: 100 nm |
| Hydroxyapatite Nanopowder/Nanoparticles | NK0289 | Genel Endüstriyel Kullanım | Needle Type, Purity: 96%, Size: 200 nm |
| Zinc Ferrite (ZnFe2O4) Micron Powder | NK0290 | Genel Endüstriyel Kullanım | Zinc Iron Oxide Micron Powder, -325 mesh, 99.9% |
| Iron (Fe) Micron Powder | NK0291 | Genel Endüstriyel Kullanım | Purity: 99%, Size: 100 mesh |
| Silver (Ag) Nanopowder/Nanoparticles Dispersion | NK0292 | Genel Endüstriyel Kullanım | Purity: %99.99, Size: 20-30 nm, 167 ppm |
| Activated Carbon & Carbon Nanotube Mixed | NK0293 | Genel Endüstriyel Kullanım | |
| Short Length Multi Walled Carbon Nanotubes | NK0294 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 8-18 nm |
| Molybdenum (Mo) Micron Powder | NK0295 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 20 µm |
| Titanium Silicon Carbide (Ti3SiC2) Micron Powder | NK0296 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+%, Size: < 325 mesh |
| Aligned Multi Walled Carbon Nanotubes | NK0297 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 8-18 nm, Length 9-14 µm |
| C-NERGY Super P Conductive Carbon Black | NK0298 | Genel Endüstriyel Kullanım | 1 bag: 40 g |
| Titanium Diboride (TiB2) Micron Powder | NK0299 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 98.5+%, Size: 2.5-13 μm |
| Zinc Oxide (ZnO) Nanopowder Dispersion in Ethanol | NK0300 | Genel Endüstriyel Kullanım | Size: 20-30nm, 20wt% |
| Magnesium Oxide (MgO) Micron Powder | NK0301 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.99 %, Size: 500 nm – 1500nm |
| Silver (Ag) Nanopowder/Nanoparticles | NK0302 | Genel Endüstriyel Kullanım | Purity: 99.95% , Size: 45-75 nm, w/~0.25% PVP |
| Silicon Carbide (SiC) Nanopowder/Nanoparticles | NK0303 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.5+%, Size: 790 nm |
| Silica (SiO2) Micron Powder | NK0304 | Genel Endüstriyel Kullanım | Spherical, APS: 0.3um, SiO2 Content:99.5+% |
| Terbium Oxide (Tb4O7) Micron Powder | NK0305 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Lithium Fluoride Powder | NK0306 | Genel Endüstriyel Kullanım | Size: <100 μm, Purity: 99.95 % |
| Yttrium (Y) Micron Powder | NK0307 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Cerium Oxide (CeO2) Micron Powder | NK0308 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh, White |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0309 | Genel Endüstriyel Kullanım | Alpha, High Purity: 99.95%, Size: 180 nm, Hydrophilic |
| C-NERGY SUPER C45 Conductive Carbon Black (set: 80 g) | NK0310 | Genel Endüstriyel Kullanım | |
| KETJENBLACK EC-300J Conductive Carbon Black | NK0311 | Genel Endüstriyel Kullanım | |
| Silicon (Si) Micron Powder | NK0312 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.99 %, Size: 100 mesh |
| (-OH) Functionalized Multi Walled Carbon Nanotubes | NK0313 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 48-78 nm |
| Holmium Oxide (Ho2O3) Micron Powder | NK0314 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Multi Walled Carbon Nanotubes | NK0315 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 48-78 nm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0316 | Genel Endüstriyel Kullanım | Alpha/Gamma, Size: 48 nm, 85% Alpha, 15% Gamma |
| Cobalt (Co) Micron Powder | NK0317 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1 µm |
| Tungsten Disulfide (WS2) Micron Powder | NK0318 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1 µm |
| Lanthanum (La) Micron Powder | NK0319 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Titanium Aluminum Carbide (Ti2AlC) Micron Powder | NK0320 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9+%, Size: 50 µm |
| Aluminum Nitride (AlN) Nanopowder/Nanoparticles | NK0321 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 60-70 nm, Hexagonal |
| Nickel (Ni) Nanopowder/Nanoparticles | NK0322 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 18 nm, Partially Passivated |
| Hydroxyapatite Nanopowder/Nanoparticles | NK0323 | Genel Endüstriyel Kullanım | Purity: 95% min, Size: 50 nm |
| Antimony Tin Oxide (ATO) Nanopowder/Nanoparticles | NK0324 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 20-50 nm |
| Tungsten (W) Nanopowder/Nanoparticles | NK0325 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 780 nm, metal basis |
| Chromium (Cr) Micron Powder | NK0326 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 15-60 µm, Spherical |
| Tungsten Carbide Cobalt (WC/Co) Nanopowder/Nanoparticles | NK0327 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 35-75 nm |
| Nanoclay | NK0328 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 800 nm |
| Boron Nitride (BN) Nanopowder/Nanoparticles | NK0329 | Genel Endüstriyel Kullanım | Purity: 99.7%, Size: 790 nm, Hexagonal |
| Aluminum Oxide (Al2O3) Micron Powder | NK0330 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 1-10 μm |
| Barium Titanate (BaTiO3) Nanopowder/Nanoparticles | NK0331 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 45 nm, Cubic |
| Gadolinium Oxide (Gd2O3) Nanopowder/Nanoparticles | NK0332 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 13-95 nm |
| Zirconium Oxide (ZrO2) Nanopowder/Nanoparticles Water Dispersion | NK0333 | Genel Endüstriyel Kullanım | Size: 40-50 nm, 22 wt% |
| Aluminum Silicon Copper (AlSiCu) Sputtering Targets | NK0334 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Neodymium Oxide (Nd2O3) Nanopowder/Nanoparticles | NK0335 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 25-40 nm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles | NK0336 | Genel Endüstriyel Kullanım | Gamma, Purity: 99.995%, Size: 4 nm, Hydrophilic |
| P25 Titanium Dioxide Nanopowder (TiO2) Purity 99.5+ % Size 20 nm | NK0337 | Seramik, Yarı İletken, Kimyasal Endüstri | |
| Lanthanum Oxide (La2O3) Nanopowder/Nanoparticles | NK0338 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: < 180 nm |
| Erbium Oxide (Er2O3) Nanopowder/Nanoparticles | NK0339 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8-90 nm, Cubic |
| Spherical Nickel Base Alloy Micron Powder | NK0340 | Genel Endüstriyel Kullanım | Inconel 625 Powder, Size: 50-150 µm |
| Spherical Nickel Base Alloy Micron Powder | NK0341 | Genel Endüstriyel Kullanım | Inconel 718 Powder, Size: 50-150 µm |
| Manganese Dioxide (MnO2) Micron Powder | NK0342 | Genel Endüstriyel Kullanım | Purity: 99 %, Size: 200 mesh |
| Zirconium Oxide (ZrO2) Nanopowder/Nanoparticles | NK0343 | Genel Endüstriyel Kullanım | Purity: 99.95+ %, Size: 30 nm |
| Titanium Nitride (TiN) Nanopowder/Nanoparticles | NK0344 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.2+%, Size: 20 nm, Cubic |
| Titanium Carbide (TiC) Nanopowder/Nanoparticles | NK0345 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+%, Size: 35-55 nm, Cubic |
| Tantalum Carbide (TaC) Nanopowder/Nanoparticles | NK0346 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 950 nm, Cubic |
| Molybdenum Oxide (MoO3) Nanopowder/Nanoparticles | NK0347 | Genel Endüstriyel Kullanım | High Purity: 99.96+%, Size: 8-75 nm |
| CR2025 Coin Cell Cases (Positive and Negative Cases) | NK0348 | Genel Endüstriyel Kullanım | Materials: 304SS |
| Cobalt Oxide (Co3O4) Nanopowder/Nanoparticles | NK0349 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 8-28 nm |
| Chromium Oxide (Cr2O3) Nanopowder/Nanoparticles | NK0350 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 55 nm, Hexagonal |
| Nickel (II) Hydroxide (Ni(OH)2) Nanopowder/Nanoparticles | NK0351 | Genel Endüstriyel Kullanım | High Purity: 99.99%, Size: 18 nm, Beta |
| Selenium Dioxide (SeO2) Micron Powder | NK0352 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Graphene Water Dispersion | NK0353 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Black Liquid, Graphene: 0.5 wt% |
| Zinc Oxide (ZnO) Nanopowder/Nanoparticles Water Dispersion | NK0354 | Genel Endüstriyel Kullanım | Size: 25-35 nm, 22 wt% |
| Boron Carbide (B4C) Nanopowder/Nanoparticles | NK0355 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 40-60 nm, Hexagonal |
| Titanium (Ti) Micron Powder | NK0356 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+%, Size: 200 mesh |
| Silicon Carbide (SiC) Nanopowder/Nanoparticles | NK0357 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.5%, Size: 20 nm, Laser Synthesized |
| Iron (Fe) Nanopowder/Nanoparticles | NK0358 | Genel Endüstriyel Kullanım | Purity: 99.55%, Size: 22 nm, Partially Passivated |
| Yttrium Oxide (Y2O3) Nanopowder/Nanoparticles | NK0359 | Genel Endüstriyel Kullanım | High Purity: 99.99%, Size: 18-38 nm |
| Nitinol Shape Memory Alloy Wire | NK0360 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Diameter: 2 mm, AF: 80-85°C |
| KETJENBLACK EC-600JD Conductive Carbon Black | NK0361 | Genel Endüstriyel Kullanım | |
| Strontium Titanate (SrTiO3) Nanopowder/Nanoparticles | NK0362 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 300-500 nm |
| Iron Oxide (Fe3O4) Nanopowder/Nanoparticles | NK0363 | Pigment, Manyetik Malzemeler, Katalizörler | High Purity: 99.55+%, Size: 14-29 nm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0364 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile:99.5+%, Size: 200 nm |
| Cobalt Oxide (Co3O4) Nanopowder/Nanoparticles | NK0365 | Genel Endüstriyel Kullanım | Purity: 99.75%, Size: 48 nm |
| Dysprosium Oxide (Dy2O3) Nanopowder/Nanoparticles | NK0366 | Genel Endüstriyel Kullanım | High Purity: 99.95+%, Size: 28 nm |
| Iron Oxide (Fe2O3) Nanopowder/Nanoparticles | NK0367 | Pigment, Manyetik Malzemeler, Katalizörler | Alpha, High Purity: 99.6+%, Size: 28 nm |
| Iron Oxide (Fe2O3) Nanopowder/Nanoparticles | NK0368 | Pigment, Manyetik Malzemeler, Katalizörler | Gamma, High Purity: 99.55+%, Size: 18 nm |
| Multi Walled Carbon Nanotubes | NK0369 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 8-18 nm |
| Polymer Dispersant for Dispersion of Carbon Nanotubes (CNTs) in Ester Solvents | NK0370 | Genel Endüstriyel Kullanım | |
| Tin Oxide (SnO2) Nanopowder/Nanoparticles | NK0371 | Genel Endüstriyel Kullanım | Purity: 99.97%, Size: 430 nm |
| 304 Stainless Steel Wave Spring (Belleville Washers) for CR2032 | NK0372 | Genel Endüstriyel Kullanım | Diameter: 15.4 mm, Thickness: 0.2 mm, Height: (1.2±0.03) mm |
| Cobalt Oxide (Co3O4) Nanopowder/Nanoparticles | NK0373 | Genel Endüstriyel Kullanım | Purity: 99.77%, Size: 48 nm |
| (-COOH) Functionalized Multi Walled Carbon Nanotubes | NK0374 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 18-28 nm |
| (-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes | NK0375 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 10-30 nm |
| (-COOH) Functionalized Multi Walled Carbon Nanotubes | NK0376 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 4-16 nm |
| Carbon Nanotube (CNT) Nanoribbon Water Dispersion | NK0377 | Genel Endüstriyel Kullanım | 0.5 mg/mL |
| Spherical Nickel Base Alloy Micron Powder | NK0378 | Genel Endüstriyel Kullanım | Inconel 625 Powder, Size: 30-60 µm |
| Calcium Copper Titanate (CaCu3Ti4O12) Nano Powder | NK0379 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | D50: 360 nm, Purity: ≥ 99.5 % |
| Multi Walled Carbon Nanotubes Water Dispersion | NK0380 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 96%, OD: 45-75 nm, Length: 8-18 µm |
| Multi Walled Carbon Nanotubes | NK0381 | Genel Endüstriyel Kullanım | Purity: > 95%, Outside Diameter: 30-50 nm |
| Zinc Oxide (ZnO) Nanopowder/Nanoparticles | NK0382 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 18 nm, KH550 |
| Multi Walled Carbon Nanotubes | NK0383 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 4-16 nm |
| Silicon Dioxide (SiO2) Sputtering Targets | NK0384 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 1”, Thickness: 0.125” |
| Lithium Carbonate (Battery Grade | NK0385 | Genel Endüstriyel Kullanım | Li2CO3) Purity ≥99.5% |
| Activated Carbon Micron Powder | NK0386 | Genel Endüstriyel Kullanım | Size: 200 Mesh |
| Spherical Nickel Base Alloy Micron Powder | NK0387 | Genel Endüstriyel Kullanım | Inconel 718 Powder, Size: 30-60 µm |
| Iron Nickel (Fe-Ni) Alloy Powder | NK0388 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 325 mesh, Fe/Ni: 5:5 |
| Tin (Sn) Micron Powder | NK0389 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh |
| Graphene NMP Dispersion | NK0390 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Graphene: 0.5 wt% |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Ethylene Glycol | NK0391 | Seramik, Yarı İletken, Kimyasal Endüstri | Size: 12 nm, Anatase, 22 wt % |
| Tungsten (W) Micron Powder | NK0392 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 2 µm |
| Spherical Nickel Base Alloy Micron Powder | NK0393 | Genel Endüstriyel Kullanım | Inconel 718 Powder, Size: 10-25 µm |
| Spherical Nickel Base Alloy Micron Powder | NK0394 | Genel Endüstriyel Kullanım | Inconel 625 Powder, Size: 15-45 µm |
| Tungsten Oxide (WO3) Micron Powder | NK0395 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3 µm |
| Lithium Manganese Oxide (LiMn2O4) Powder for Li-ion Battery Cathode Application | NK0396 | Genel Endüstriyel Kullanım | |
| Europium Oxide (Eu2O3) Nanopowder/Nanoparticles | NK0397 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 8-90 nm, Cubic |
| Lead (Pb) Micron Powder | NK0398 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Gadolinium Oxide (Gd2O3) Micron Powder | NK0399 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2-3 μm |
| Calcium Oxide (CaO) Nanopowder/Nanoparticles | NK0400 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95+%, Size: 10-70 nm |
| Nitinol Shape Memory Alloy Wire | NK0401 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Diameter: 1 mm, AF: 15-20°C |
| Copper Oxide (CuO) Nanopowder/Nanoparticles | NK0402 | Genel Endüstriyel Kullanım | High Purity: 99.995%, Size: 15-45 nm |
| (-OH) Functionalized Multi Walled Carbon Nanotubes | NK0403 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 28-48 nm |
| Tantalum Carbide (TaC) Micron Powder | NK0404 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 3 µm |
| Type 316 Stainless Steel Powder | NK0405 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh |
| Nitinol Shape Memory Alloy Wire | NK0406 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Diameter: 1 mm, AF: 45-50°C |
| Titanium Dioxide (TiO2) Micron Powder | NK0407 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+ %, Size: 1 µm, White, Rutile |
| Calcium Oxide (CaO) Micron Powder | NK0408 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9 %, Size: 1µm |
| Spherical Nickel Base Alloy Micron Powder | NK0409 | Genel Endüstriyel Kullanım | Inconel 718 Powder, Size: 15-45 µm |
| Boron Nitride (BN) Nanopowder/Nanoparticles | NK0410 | Genel Endüstriyel Kullanım | Purity: 99.85+%, Size: 65-75 nm, Hexagonal |
| (-OH) Functionalized Multi Walled Carbon Nanotubes | NK0411 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 18-28 nm |
| Silicon (Si) Nanopowder/Nanoparticles | NK0412 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 97+%, Size: 45-65 nm, Oxygen Content: < 3% |
| Cobalt Oxide (Co3O4) Nanopowder/Nanoparticles | NK0413 | Genel Endüstriyel Kullanım | High Purity: 99.55%, Size: 28-48 nm |
| Short Length Multi Walled Carbon Nanotubes | NK0414 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 4-16 nm |
| Multi Walled Carbon Nanotubes | NK0415 | Genel Endüstriyel Kullanım | Purity: 92%, Outside Diameter: 8-10 nm |
| (-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0416 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 18-28 nm |
| Industrial Grade Multi Walled Carbon Nanotubes | NK0417 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 7-16 nm |
| Aqueous Suspension of Nanocrystalline Cellulose (NCC) | NK0418 | Genel Endüstriyel Kullanım | 6%wt |
| Highly Conductive Expanded Graphite Micron Powder | NK0419 | Genel Endüstriyel Kullanım | Purity: ≥ 96%, Size: 20 µm |
| Short Length Multi Walled Carbon Nanotubes | NK0420 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 48-78 nm |
| Manganese Oxide (Mn2O3) Nanopowder/Nanoparticles | NK0421 | Genel Endüstriyel Kullanım | Purity: 99.4%, Size: 28 nm |
| Silicon (Si) Nanopowder/Nanoparticles | NK0422 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99+%, Size : < 70 nm, Laser Synthesized |
| Aluminum Sulfate Octadecahydrate (Al2H36O30S3) | NK0423 | Genel Endüstriyel Kullanım | Purity: > 99% |
| Cadmium Selenide (CdSe) Nanopowder/Nanoparticles | NK0424 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: <100 nm |
| Graphite (C) Nanopowder/Nanoparticles | NK0425 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: < 50 nm |
| Boron (B) Nanopowder/Nanoparticles | NK0426 | Genel Endüstriyel Kullanım | APS:100 nm, Purity:99.55+% |
| Niobium Carbide (NbC) Micron Powder | NK0427 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1-3 µm |
| Silicon (Si) Nanopowder/Nanoparticles | NK0428 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 97+%, Size: 35-55 nm, Oxygen Content: < 3% |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Coated with Aluminic Ester | NK0429 | Genel Endüstriyel Kullanım | Alpha, Size: 55 nm, Super Hydrophobic, Al2O3: Aluminic Ester=98.1:1.2 |
| Double Walled Carbon Nanotubes | NK0430 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0431 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile Si Oil, Size: 25 nm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0432 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile, High Purity: 99.5+ %, Size: 28 nm |
| Titanium Carbide (TiC) Nanopowder/Nanoparticles | NK0433 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 790 nm, Cubic |
| Magnesium Oxide (MgO) Nanopowder/Nanoparticles | NK0434 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 45 nm |
| Zirconium Carbide (ZrC) Nanopowder/Nanoparticles | NK0435 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 400-1100 nm, Cubic |
| Silicon Carbide (SiC) Micron Powder | NK0436 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.5+%, Size: < 2, 6 µm, Whisker |
| Zinc Oxide (ZnO) Nanopowder/Nanoparticles | NK0437 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 18 nm |
| Nickel Tabs | NK0438 | Genel Endüstriyel Kullanım | Width: 3 mm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0439 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile Al, Si, Stearic Acid, Size: 25 nm |
| Indium Tin Oxide (ITO) Nanopowder/Nanoparticles | NK0440 | Genel Endüstriyel Kullanım | 90:10, Purity: 99.99%, Size: 18-65 nm |
| High Capacity and High Purity Graphite Micron Powder for Li-ion Battery | NK0441 | Genel Endüstriyel Kullanım | |
| Antimony (Sb) Micron Powder | NK0442 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 200 mesh |
| Manganese Sulfate Monohydrate (MnSO4.H2O) | NK0443 | Genel Endüstriyel Kullanım | Purity: > 99% |
| Tungsten (W) Micron Powder | NK0444 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: Sub-Micron |
| Magnesium (Mg) Micron Powder | NK0445 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 35 µm, Metal Basis |
| Expandable Graphite | NK0446 | Genel Endüstriyel Kullanım | Purity: 95-97%, Size: 50 mesh |
| Tungsten (W) Micron Powder | NK0447 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 5 µm |
| Titanium (Ti) Micron Powder | NK0448 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5+ %, Size: 100 mesh |
| Aluminum Oxide (Al2O3) Micron Powder | NK0449 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: 200 mesh, Fused |
| Europium (Eu) Micron Powder | NK0450 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Zinc Oxide (ZnO) Nanopowder/Nanoparticles | NK0451 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 30-50 nm |
| Lithium hydroxide monohydrate (Trace Metals basis | NK0452 | Genel Endüstriyel Kullanım | LiOH.H2O), Purity: 99.995% |
| Molybdenum (Mo) Micron Powder | NK0453 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 10 µm |
| Molybdenum (Mo) Micron Powder | NK0454 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 325 mesh |
| Aligned Multi Walled Carbon Nanotubes | NK0455 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 8-18 nm, Length 25-95 µm |
| Bismuth Oxide (Bi2O3) Micron Powder | NK0456 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1-5 µm |
| Carbon Nanotubes Doped with 32 wt% Graphene Nanopowder/Nanoparticles | NK0457 | Elektronik, Batarya Elektrotları, Sensörler | |
| Carbon Black Powder | NK0458 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 4 µm |
| Bismuth Oxide (Bi2O3) Micron Powder | NK0459 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 10 µm |
| Aluminum Oxide (Al2O3) Micron Powder | NK0460 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 1-2 µm, Fused |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0461 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase, Purity: 99.5+ %, Size: 20-30 nm |
| Graphene Oxide Dispersion | NK0462 | Elektronik, Batarya Elektrotları, Sensörler | 8 mg/mL, in H2O |
| Nitinol Shape Memory Alloy Wire | NK0463 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Diameter: 0, 5 mm, AF: -10 – -15°C |
| Cobalt Iron Oxide (CoFe2O4) Nanopowder/Nanoparticles | NK0464 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.5+%, Size: 30 nm |
| Industrial Grade Multi Walled Carbon Nanotubes | NK0465 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 8-28 nm |
| 304SS Coin Cell Conical Spring for CR2032 | NK0466 | Genel Endüstriyel Kullanım | Diameter: 15.4 mm, Height: 1.1 mm, Thickness: 0.25 mm |
| Manganese (II) Carbonate (MnCO3) Nanopowder/Nanoparticles | NK0467 | Genel Endüstriyel Kullanım | Purity: 99.5+ %, Size: 50 nm |
| (-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0468 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 8-18 nm |
| (-COOH) Functionalized Multi Walled Carbon Nanotubes | NK0469 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: < 8 nm |
| Tungsten (W) Micron Powder | NK0470 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 10 µm |
| Conductive Graphite Powder for Lithium Battery | NK0471 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 1-5 µm |
| Cellulose Nanocrystal (Nanocrystalline Cellulose | NK0472 | Genel Endüstriyel Kullanım | CNC) |
| (-OH) Functionalized Multi Walled Carbon Nanotubes | NK0473 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: < 8 nm |
| CNTs-High Impact Polystyrene Resin Matrix | NK0474 | Genel Endüstriyel Kullanım | CNTs: 22 wt%, HIPS: 78 wt% |
| Expandable Graphite | NK0475 | Genel Endüstriyel Kullanım | Purity: 99-99.5%, Size: 50 mesh |
| Aluminum Oxide (Al2O3) Micron Powder | NK0476 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: 325 mesh, Fused |
| Carbon Black & Carbon Nanotube Mixed | NK0477 | Genel Endüstriyel Kullanım | Purity: >97.5% |
| Short Length Multi Walled Carbon Nanotubes | NK0478 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 18-28 nm |
| Carbon Nanotubes-based Conductive Additives for Lithium Ion Battery | NK0479 | Genel Endüstriyel Kullanım | |
| Indium Tin Oxide (ITO) Nanopowder/Nanoparticles | NK0480 | Genel Endüstriyel Kullanım | 95:5, Purity: 99.97+%, Size: 18-73 nm |
| Magnesium Carbonate (MgCO3) Nanopowder/Nanoparticles | NK0481 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99+%, Size: 10-70 nm |
| Chromium Carbide (Cr3C2) Nanopowder/Nanoparticles | NK0482 | Genel Endüstriyel Kullanım | Purity: 99.75+%, Size: 25-125 nm |
| Zinc Cobalt Iron Oxide (Zn0.5Co0.5Fe2O4) Nanopowder/Nanoparticles | NK0483 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.995%, Size: 38 nm |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0484 | Elektronik, Yarı İletkenler, Optik Malzemeler | Amorphous, Size: 28 nm, 26 wt% |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles Dispersion in Ethylene Glycol | NK0485 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 22 nm, Amorphous, 15 wt% |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles Dispersion in 1 | NK0486 | Elektronik, Yarı İletkenler, Optik Malzemeler | 2-Propanediol, Size: 22 nm, Amorphous, 15 wt% |
| Graphitized Multi Walled Carbon Nanotubes | NK0487 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 28-48 nm |
| Cuprous Oxide (Cu2O) Micron Powder | NK0488 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1 µm |
| Boron (B) Micron Powder | NK0489 | Genel Endüstriyel Kullanım | Purity: 99 %, Size: 10 µm, Amorphous |
| Carbon Nanotube (CNT) Nanoribbon Water Dispersion | NK0490 | Genel Endüstriyel Kullanım | 1 mg/mL |
| Manganese (Mn) Micron Powder | NK0491 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Short Length Multi Walled Carbon Nanotubes | NK0492 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 28-48 nm |
| Copper (Cu) Nanopowder/Nanoparticles | NK0493 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 570 nm, Metal Basis |
| Copper (Cu) Nanowire | NK0494 | Genel Endüstriyel Kullanım | Purity: 99.55%, in Ethanol |
| Tungsten Disulfide (WS2) Nanopowder/Nanoparticles | NK0495 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 35-75 nm |
| Copper (Cu) Nanopowder/Nanoparticles | NK0496 | Genel Endüstriyel Kullanım | Purity: 99.85%, Size: 22 nm, Partially Passivated |
| Zirconium Carbide (ZrC) Nanopowder/Nanoparticles | NK0497 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Thickness: 18 nm, Cubic |
| Magnesium Carbonate (MgCO3) Nanopowder/Nanoparticles | NK0498 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.55%, Size: 8 nm |
| Nickel Tab with Adhesive Polymer Tape as Negative Terminal for Pouch Cell | NK0499 | Genel Endüstriyel Kullanım | Width: 4 mm |
| Silver (Ag) Nanopowder/Nanoparticles Dispersion | NK0500 | Genel Endüstriyel Kullanım | Purity: %99.99, Size: 3 nm, 2200 ppm |
| Zirconium Hydride (ZrH4) Nanopowder/Nanoparticles | NK0501 | Genel Endüstriyel Kullanım | Purity: 99.5+ %, Size: 20-40 nm |
| (-OH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0502 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 28-48 nm |
| Silicon Dioxide (SiO2) Sputtering Targets | NK0503 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 1”, Thickness: 0.250” |
| C-NERGY SUPER C65 Conductive Carbon Black | NK0504 | Genel Endüstriyel Kullanım | |
| Nickel (Ni) Nanopowder/Nanoparticles | NK0505 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 790 nm, Metal Basis |
| Carbon Titanium Nitride (TiNC) Micron Powder | NK0506 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.95%, Size: 1.05-3.05 μm |
| Zirconia-Yttria Nanopowder/Nanoparticles | NK0507 | Genel Endüstriyel Kullanım | ZrO2-8Y, Purity: 99.95%, Size: 30 nm |
| Triton X-100 | NK0508 | Genel Endüstriyel Kullanım | |
| Iron (Fe) Nanopowder/Nanoparticles | NK0509 | Genel Endüstriyel Kullanım | Purity: 99.55%, Size: 22 nm, Carbon Coated |
| Nickel (Ni) Nanopowder/Nanoparticles | NK0510 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size:18 nm, Carbon Coated |
| Silicon Carbide (SiC) Micron Powder | NK0511 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 98+%, Size: 1-10 μm |
| Graphite Sheet Thermal Interface Material | NK0512 | Genel Endüstriyel Kullanım | EYG Series, 1350 W/m.K, Thickness: 40 µm, Lenght: 115 mm, Width: 90 mm |
| PTFE Inside Chamber for Hydrothermal Synthesis Autoclave Reactors | NK0513 | Genel Endüstriyel Kullanım | Volume:50, 100, 500 ml |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in Water | NK0514 | Genel Endüstriyel Kullanım | Gamma, Size: 8 nm, 22 wt% |
| 304SS Coin Cell Battery Spacer | NK0515 | Genel Endüstriyel Kullanım | Diameter: 15.8 mm, Thickness: 0.5 mm |
| Polytetrafluoroethylene (PTFE) Condensed Liquid Binder for Li-ion Battery | NK0516 | Genel Endüstriyel Kullanım | |
| Molybdenum (Mo) Micron Powder | NK0517 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 3 µm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0518 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile, High Purity: 99.5+ %, Size: 490 nm |
| Molybdenum Carbide (Mo2C) Micron Powder | NK0519 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2.6 µm, Hexagonal |
| Zinc Carbonate (ZnCO3) Nanopowder/Nanoparticles | NK0520 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 18 nm |
| Molybdenum (Mo) Micron Powder | NK0521 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 1 µm |
| 316 Stainless Steel Wave Spring (Belleville Washers) for CR2032 | NK0522 | Genel Endüstriyel Kullanım | Diameter: 15.8 mm, Thickness: 0.5 mm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0523 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase/Rutile, Purity: 99.5+%, Size: 18 nm |
| Cobalt Aluminate Blue Spinel Nanopowder CoAl2O4 Size: 300-500 nm | NK0524 | Genel Endüstriyel Kullanım | |
| Nickel Foam for Battery Applications Size: 200 mm x 300 mm x 0.5 mm | NK0525 | Genel Endüstriyel Kullanım | |
| Indium Hydroxide (In(OH)3) Nanopowder/Nanoparticles | NK0526 | Genel Endüstriyel Kullanım | High Purity: 99.996%, Size: 15-65 nm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0527 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase, Purity: 99.5+ %, Size: 17 nm |
| Graphite Sheet Thermal Interface Material | NK0528 | Genel Endüstriyel Kullanım | EYG Series, 1700 W/m.K, Thickness: 25 µm, Lenght: 180 mm, Width: 115 mm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in 1 | NK0529 | Seramik, Yarı İletken, Kimyasal Endüstri | 2-Propanediol, Size: 12 nm, Anatase, 22 wt% |
| Stellite 6 Spherical Micron Powder | NK0530 | Genel Endüstriyel Kullanım | Size : 15-45μm |
| Graphite Sheet Thermal Interface Material | NK0531 | Genel Endüstriyel Kullanım | EYG Series, 1600 W/m.K, Thickness: 25 µm, Lenght: 180 mm, Width: 115 mm |
| Graphitized Multi Walled Carbon Nanotubes | NK0532 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 48-78 nm |
| Cerium Oxide (CeO2) Nanopowder/Nanoparticles Water Dispersion | NK0533 | Genel Endüstriyel Kullanım | Size: 25-45 nm, 42 wt% |
| Graphitized Multi Walled Carbon Nanotubes | NK0534 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 18-28 nm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0535 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile, High Purity: 99.5+ %, Size: 45 nm |
| Silicon Carbide (SiC) Micron Powder | NK0536 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.5+%, Size: 1.5-35 µm, D50 |
| Erbium (Er) Micron Powder | NK0537 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Cerium Oxide (CeO2) Nanopowder/Nanoparticles | NK0538 | Genel Endüstriyel Kullanım | Purity: 99.975%, Size: 8-28 nm |
| (-OH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0539 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 8-18 nm |
| (-OH) Functionalized Single Walled Carbon Nanotubes | NK0540 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Nickel Hydroxide Ni(OH)2 (NiOH-Co) Micron Powder | NK0541 | Genel Endüstriyel Kullanım | Size: 10-15 µm, Spherical |
| Magnesium Oxide (MgO) Nanopowder/Nanoparticles Ethanol Dispersion | NK0542 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Size: 45 nm, 22 wt% |
| Nitinol Shape Memory Alloy Wire | NK0543 | Medikal Cihazlar, Aktüatörler, Akıllı Malzemeler | Diameter: 1, 5 mm, AF: 35-40°C |
| Terbium (Tb) Micron Powder | NK0544 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| (-OH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0545 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 18-28 nm |
| Carbon Nanotubes Doped with 52 wt% Boron Nitride (BN) Nanopowder/Nanoparticles | NK0546 | Genel Endüstriyel Kullanım | |
| (-OH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0547 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 4-16 nm |
| (-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0548 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 4-16 nm |
| (-OH) Functionalized Multi Walled Carbon Nanotubes | NK0549 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 4-16 nm |
| (-OH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0550 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 8-18 nm |
| (-OH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0551 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 4-16 nm |
| Lithium Nickel Manganese Cobalt Oxide (LiNiCoMnO2) Powder for High Power Li-ion Battery Cathode Application | NK0552 | Genel Endüstriyel Kullanım | (Ni:Mn:Co=5:3:2) NMC 532 |
| Copper (Cu) Sputtering Targets | NK0553 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Copper (Cu) Nanopowder/Nanoparticles | NK0554 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 80-240 nm, Metal Basis |
| (-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0555 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 28-48 nm |
| Graphite Fluoride (Carbon Monofluoride) Micron Powder | NK0556 | Genel Endüstriyel Kullanım | 10-20 micron, F/C Ratio : 1.0 |
| Silicon Nitride (Si3N4) Nanopowder/Nanoparticles | NK0557 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.6%, Size: 760 nm |
| (-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0558 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 48-78 nm |
| (-COOH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0559 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: < 8 nm |
| Nickel Cobalt Iron Oxide (Ni0.5Co0.5Fe2O4) Nanopowder/Nanoparticles | NK0560 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.995%, Size: 35 nm |
| Tin (Sn) Nanopowder/Nanoparticles | NK0561 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 50-70 nm, Metal Basis |
| Zinc (Zn) Nanopowder/Nanoparticles | NK0562 | Genel Endüstriyel Kullanım | High purity: 99.995+%, Size: 90-110 nm |
| (-OH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0563 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 18-28 nm |
| Spherical TC4 Titanium Based Micron Powder for 3d Printers | NK0564 | Seramik, Yarı İletken, Kimyasal Endüstri | Ti6Al4V, 50-150 µm, Spherical |
| Graphite Sheet Thermal Interface Material | NK0565 | Genel Endüstriyel Kullanım | EYG Series, 1300 W/m.K, Thickness: 50 µm, Lenght: 115 mm, Width: 90 mm |
| Spherical Nickel Base Alloy Micron Powder | NK0566 | Genel Endüstriyel Kullanım | Inconel 625 Powder, Size: 10-25 µm |
| Carbon Nanotubes Doped with 52 wt% Graphene Nanopowder/Nanoparticles | NK0567 | Elektronik, Batarya Elektrotları, Sensörler | |
| Aluminum (Al) Sputtering Targets | NK0568 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Zinc Manganese Iron Oxide (Zn0.5Mn0.5Fe2O4) Nanopowder/Nanoparticles | NK0569 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.995%, Size:28-58 nm |
| Carboxymethyl Cellulose (CMC) Micron Powder for Li-ion Battery Anode Materials | NK0570 | Genel Endüstriyel Kullanım | |
| (-OH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0571 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 48-78 nm |
| Carbon Nanotubes Thermal Radiation Coating Dispersion | NK0572 | Genel Endüstriyel Kullanım | |
| (-OH) Functionalized Industrial Short Multi Walled Carbon Nanotubes | NK0573 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 8-28 nm |
| High Temperature Polyimide Tape for Lithium Battery | NK0574 | Genel Endüstriyel Kullanım | Width: 10 mm |
| (-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes | NK0575 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 8-15 nm |
| (-OH) Functionalized Industrial Multi Walled Carbon Nanotubes | NK0576 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 48-78 nm |
| (-OH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0577 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 48-78 nm |
| (-OH) Functionalized Industrial Multi Walled Carbon Nanotubes | NK0578 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 18-38 nm |
| Reduced Graphene Oxide (rGO) | NK0579 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99%, S.A: 15.62 m2/g, 2-5 layers |
| Graphene Ethanol Dispersion | NK0580 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Graphene: 0.5 wt% |
| Tungsten Oxide (WO3) Nanopowder/Nanoparticles | NK0581 | Genel Endüstriyel Kullanım | High Purity: 99.99%, Size: 20-60 nm, Orthorhombic |
| Nickel (Ni) Nanopowder/Nanoparticles | NK0582 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 65 nm, Metal Basis |
| Titanium Nitride (TiN) Nanopowder/Nanoparticles | NK0583 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.3+%, Size: 790 nm, Cubic |
| (-COOH) Functionalized Single Walled Carbon Nanotubes | NK0584 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Silicon Monoxide (SiO) Pellets | NK0585 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.99%, Size: 1-3 mm |
| Erbium Oxide (Er2O3) Micron Powder | NK0586 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1-10 µm |
| Zinc Titanate Micron Powder (ZnTiO3) Purity: 99+% | NK0587 | Genel Endüstriyel Kullanım | Size: 1-2 µm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0588 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase, High Purity: 99.5+ %, Size: 10-20 nm |
| Conductive Carbon Black Nanopowder/Nanoparticles | NK0589 | Genel Endüstriyel Kullanım | Size: 30 nm |
| (-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0590 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 8-18 nm |
| Aluminum (Al) Micron Powder | NK0591 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| (-OH) Functionalized Short Length Multi Walled Carbon Nanotubes | NK0592 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: < 8 nm |
| Zirconium Diboride (ZrB2) Nanopowder/Nanoparticles | NK0593 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 45 nm, Hexagonal |
| Praseodymium Oxide (Pr6O11) Micron Powder | NK0594 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Carbon Aluminum Nitride (AlNC) Micron Powder | NK0595 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1-3 µm |
| (-OH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0596 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 28-48 nm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in Water | NK0597 | Genel Endüstriyel Kullanım | Gamma, Size: 28 nm, 22 wt% |
| Copper (Cu) Sputtering Targets | NK0598 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Silicon Dioxide (SiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0599 | Elektronik, Yarı İletkenler, Optik Malzemeler | Amorphous, Size: 8-33 nm, 26 wt% |
| Zinc (Zn) Nanopowder/Nanoparticles | NK0600 | Genel Endüstriyel Kullanım | High purity: 99.9+%, Size: 60-70 nm |
| CR2025 Coin Cell Cases (Positive and Negative Cases) | NK0601 | Genel Endüstriyel Kullanım | Materials: 316SS |
| Spherical TC4 Titanium Based Micron Powder for 3d Printers | NK0602 | Seramik, Yarı İletken, Kimyasal Endüstri | Ti6Al4V, 25-50 µm, Spherical |
| Iron (II | NK0603 | Genel Endüstriyel Kullanım | III) Oxide (Fe3O4) Nanopowder/Nanoparticles Water Dispersion, Size: 13-18 nm, 22 wt% |
| Lithium Zirconate (Lithium Zirconium Oxide | NK0604 | Genel Endüstriyel Kullanım | Li2ZrO3), Purity: ≥99, Size: 1 -3 µm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0605 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase, Size: 25-45 nm, 42 wt% |
| 316SS Coin Cell Battery Spacer | NK0606 | Genel Endüstriyel Kullanım | Diameter: 15.8 mm, Thickness: 0.5 mm |
| Graphite Fluoride (Carbon Monofluoride) Micron Powder for Li-ion Battery | NK0607 | Genel Endüstriyel Kullanım | 10-20 micron, F/C Ratio : 0.8-1.0 |
| Thulium Oxide (Tm2O3) Micron Powder | NK0608 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in 1 | NK0609 | Genel Endüstriyel Kullanım | 2-Propanediol, Size: 12 nm, Gamma, 18 wt% |
| Lithium Iron Phosphate (LiFePO4) Powder for Li-ion Battery Cathode Application | NK0610 | Genel Endüstriyel Kullanım | |
| Indium Oxide (In2O3) Nanopowder/Nanoparticles | NK0611 | Genel Endüstriyel Kullanım | High Purity: 99.9%, Size: 18-68 nm |
| Cobalt (Co) Micron Powder | NK0612 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 325 mesh |
| (-COOH) Functionalized Industrial Multi Walled Carbon Nanotubes | NK0613 | Genel Endüstriyel Kullanım | Purity: > 90%, Outside Diameter: 50-80 nm |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in Ethylene Glycol | NK0614 | Genel Endüstriyel Kullanım | Size: 12 nm, Gamma, 18 wt% |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0615 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase, Size: 3-28 nm, 16 wt% |
| Silicon (Si) Micron Powder | NK0616 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.99 %, Size: 1 µm |
| Short Single Walled Carbon Nanotubes | NK0617 | Genel Endüstriyel Kullanım | Purity: > 65%, SSA: 400 m2/g |
| Iron (Fe) Nanopowder/Nanoparticles | NK0618 | Genel Endüstriyel Kullanım | Purity: 99.55+%, Size: 60-70 nm, Metal Basis |
| Lanthanum Trifluoride (LaF3) Nanopowder/Nanoparticles | NK0619 | Genel Endüstriyel Kullanım | Highly Dispersible, Purity: 99+%, Size: 30-50 nm |
| Nickel-Coated Multi Walled Carbon Nanotubes | NK0620 | Genel Endüstriyel Kullanım | Purity: > 99%, Outside Diameter: 48-78 nm |
| Iron (Fe) Nanopowder/Nanoparticles | NK0621 | Genel Endüstriyel Kullanım | Purity: 99.55+%, Size: 90-100 nm, Metal Basis |
| Industrial Grade Multi Walled Carbon Nanotubes | NK0622 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 48-78 nm |
| (-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0623 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 4-16 nm |
| Silicon Nitride (Si3N4) Nanopowder/Nanoparticles | NK0624 | Elektronik, Yarı İletkenler, Optik Malzemeler | Amorphous, Purity: 99.5%, Size: 20-35 nm |
| Erbium Oxide (Er2O3) Micron Powder | NK0625 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Silicon Carbide (SiC) Nanopowder/Nanoparticles | NK0626 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.5+%, Size: < 70 nm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0627 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile, Size: 4-28 nm, 17 wt% |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0628 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile, Size: 25-45 nm, 22 wt% |
| Cellulose Nanofiber (Cellulose Nanofibril | NK0629 | Genel Endüstriyel Kullanım | Nanofibrillated Cellulose, CNFs) |
| Conductive Carbon Black Nanopowder/Nanoparticles | NK0630 | Genel Endüstriyel Kullanım | Size: 20 nm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0631 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase, Size: ≤10nm |
| 316SS Coin Cell Conical Spring for CR2032 | NK0632 | Genel Endüstriyel Kullanım | Diameter: 15.4 mm, Height: 1.2 mm, Thickness: 0.25 mm |
| Aluminum (Al) Nanopowder/Nanoparticles | NK0633 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 110 nm, Metal Basis |
| Dysprosium Oxide (Dy2O3) Micron Powder | NK0634 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Neodymium Oxide (Nd2O3) Micron Powder | NK0635 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Manganese (II) Acetate Tetrahydrate (C4H16MnO8) | NK0636 | Genel Endüstriyel Kullanım | Purity: > 99% |
| (-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0637 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 18-28 nm |
| Nickel-Coated Multi Walled Carbon Nanotubes | NK0638 | Genel Endüstriyel Kullanım | Purity: > 99%, Outside Diameter: 28-48 nm |
| Ytterbium (Yb) Micron Powder | NK0639 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Aluminum (Al) Nanopowder/Nanoparticles | NK0640 | Genel Endüstriyel Kullanım | Purity: ≥99.9%, Size: 68 nm, Metal Basis |
| Silver (Ag) Nanopowder/Nanoparticles Dispersion | NK0641 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 14 nm, 1200 ppm |
| (-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0642 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 28-48 nm |
| Graphene Water Dispersion | NK0643 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Black Liquid, Graphene: 1, 0 wt% |
| Copper (Cu) Sputtering Targets | NK0644 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| (-COOH) Functionalized Graphitized Multi Walled Carbon Nanotubes | NK0645 | Genel Endüstriyel Kullanım | Purity: > 99.99 %, Outside Diameter: 48-78 nm |
| Lithium Nickel Manganese Oxide (LMNO) for Li-Ion Cathode Material | NK0646 | Genel Endüstriyel Kullanım | LiNi0.5Mn1.5O4 |
| Zirconium Nitride (ZrN) Micron Powder | NK0647 | Genel Endüstriyel Kullanım | Purity: 99.97%, Thickness: 3.5 μm, Cubic |
| Cadmium Sulfide (CdS) Nanopowder/Nanoparticles | NK0648 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 20 nm |
| Dummy CZ-Si Wafer | NK0649 | Genel Endüstriyel Kullanım | Size: 8”, Orientation: (100), Boron Doped, Resistivity: 0.001 – 1000 (ohm.cm), 1-Side Polished, Thickness: 725 ± 50 μm |
| Cuprous Oxide (Cu2O) Nanopowder/Nanoparticles | NK0650 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 16 nm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0651 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile, Size: 3-13 nm, 16 wt% |
| Aluminum Chloride Hexahydrate (AlCl3H12O6) | NK0652 | Genel Endüstriyel Kullanım | Purity: > 97% |
| Graphitized Multi Walled Carbon Nanotubes | NK0653 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 4-16 nm |
| Spherical TC4 Titanium Based Micron Powder for 3d Printers | NK0654 | Seramik, Yarı İletken, Kimyasal Endüstri | Ti6Al4V, 15-35 µm, Spherical |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Water Dispersion | NK0655 | Genel Endüstriyel Kullanım | Gamma, Size: 100-200 nm, 23wt% |
| Terbium Oxide (Tb4O7) Nanopowder/Nanoparticles | NK0656 | Genel Endüstriyel Kullanım | Purity: 99.97%, Size: 8-110 nm, Cubic |
| Conductive Acetylene Black for Li-ion Battery Anode/Cathode | NK0657 | Genel Endüstriyel Kullanım | |
| Praseodymium (Pr) Sputtering Targets | NK0658 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Praseodymium (Pr) Sputtering Targets | NK0659 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| ZK60 Magnesium Alloy Micron Powder | NK0660 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Size Range: 20-63 µm, Spherical |
| High Temperature Teflon Tape for Lithium Battery | NK0661 | Genel Endüstriyel Kullanım | Width: 19 mm, Thickness: 0.13 mm, Length: 10 m |
| Graphene NMP Dispersion | NK0662 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Graphene: 1, 0 wt% |
| (-OH) Functionalized Double Walled Carbon Nanotubes | NK0663 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Graphene Ethanol Dispersion | NK0664 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Graphene: 1 wt% |
| Silicon (Si) Sputtering Targets | NK0665 | Elektronik, Yarı İletkenler, Optik Malzemeler | undoped, Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Graphene Sheet | NK0666 | Elektronik, Batarya Elektrotları, Sensörler | Size: 29 cm x 29 cm, Thickness: 35 µm, Highly Conductive |
| Tungsten (W) Sputtering Targets | NK0667 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Manganese (Mn) Micron Powder | NK0668 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 100 mesh |
| Copper (Cu) Sputtering Targets | NK0669 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Lithium (Li) Foil Thickness:0.5 mm | NK0670 | Genel Endüstriyel Kullanım | Width: 50 mm, Length: 100 mm, Purity: 99.9% |
| Yttrium Aluminate (Y3Al5O12) Nanopowder/Nanoparticles | NK0671 | Genel Endüstriyel Kullanım | Purity: 99.7+%, Size: 25 nm |
| Silver (Ag) Nanopowder/Nanoparticles Water Dispersion | NK0672 | Genel Endüstriyel Kullanım | Size: 2 nm, Colorless & Transparent, 2.200 ppm |
| Water.webp | NK0673 | Genel Endüstriyel Kullanım | |
| Water Soluble Carbon Quantum Dots 590-620 nm | NK0674 | Genel Endüstriyel Kullanım | |
| Boron (B) Micron Powder | NK0675 | Genel Endüstriyel Kullanım | Purity: 95+%, Size: 1-2 μm Amorphous |
| Silicon (Si) Sputtering Targets | NK0676 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK0677 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Titanium (Ti) Micron Powder | NK0678 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity:99.5+%, Size:75-150 µm, Spherical |
| G-QD.webp | NK0679 | Genel Endüstriyel Kullanım | |
| Graphene Quantum Dots (1mg/ml) (GQD) | NK0680 | Elektronik, Batarya Elektrotları, Sensörler | |
| Barium Iron Oxide (BaFe12O19) Nanopowder/Nanoparticles | NK0681 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.95%, Size: 55 nm |
| Aluminum Silicon Copper (AlSiCu) Sputtering Targets | NK0682 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Hafnium Oxide (HfO2) Micron Powder | NK0683 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Nickel-Coated Multi Walled Carbon Nanotubes | NK0684 | Genel Endüstriyel Kullanım | Purity: > 99%, Outside Diameter: 18-28 nm |
| (-COOH) Functionalized Industrial Short Multi Walled Carbon Nanotubes | NK0685 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 28-48 nm |
| Titanium Alloy Micron Powders | NK0686 | Seramik, Yarı İletken, Kimyasal Endüstri | CPTi, 50-150 µm, Spherical |
| Nickel-Coated Multi Walled Carbon Nanotubes | NK0687 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: 8-18 nm |
| Copper Nickel (Cu-Ni) Alloy Nanopowder/Nanoparticles | NK0688 | Genel Endüstriyel Kullanım | Size: < 80 nm |
| Carbon (C) (Graphite) Sputtering Targets | NK0689 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Short Length Multi Walled Carbon Nanotubes | NK0690 | Genel Endüstriyel Kullanım | Purity: > 96%, Outside Diameter: < 8 nm |
| Zirconium Diboride (ZrB2) Micron Powder | NK0691 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 5.5 μm, Hexagonal |
| Nickel (Ni) Micron Powder | NK0692 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 4 µm, Spherical |
| Copper (Cu) Sputtering Targets | NK0693 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Copper (Cu) Sputtering Targets | NK0694 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK0695 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 2”, Thickness: 0.125” |
| Cadmium Sulfide (CdS) Nanopowder/Nanoparticles | NK0696 | Genel Endüstriyel Kullanım | Purity: 99.95+%, Size: 5 nm |
| Zinc (Zn) Sputtering Targets | NK0697 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| High Purity Natural Graphite Nanopowder/Nanoparticles for Li-ion Battery | NK0698 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 30 nm |
| Carbon Nanotube (CNT) Nanoribbon Water Dispersion | NK0699 | Genel Endüstriyel Kullanım | 2 mg/mL |
| Iron (Fe) Micron Powder | NK0700 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 5 µm |
| Spherical TC4 Titanium Based Micron Powder for 3d Printers | NK0701 | Seramik, Yarı İletken, Kimyasal Endüstri | Ti6Al4V, 10-25 µm, Spherical |
| Copper (Cu) Micron Powder | NK0702 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 1 µm, Spherical |
| Industrial Grade Short Multi Walled Carbon Nanotubes | NK0703 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 28-48 nm |
| Titanium Alloy Micron Powders | NK0704 | Seramik, Yarı İletken, Kimyasal Endüstri | CPTi, 25-50 µm, Spherical |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0705 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase, Size: 25-45 nm, 16 wt% |
| Aluminum chloride (AlCl3) Purity: > 99% | NK0706 | Genel Endüstriyel Kullanım | |
| Cuprous Oxide (Cu2O) Micron Powder | NK0707 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 3 µm |
| Vanadium Carbide (VC) Nanopowder/Nanoparticles | NK0708 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 550-750 nm, Cubic |
| Lead (Pb) Sputtering Targets | NK0709 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Multi Walled Carbon Nanotubes Water Dispersion | NK0710 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 96%, OD: 18-28 nm, Length: 8-35 µm |
| Boron (B) Micron Powder | NK0711 | Genel Endüstriyel Kullanım | Purity: 95+ %, Size: -325 mesh, Amorphous |
| Lithium Nickel Manganese Cobalt Oxide (LiNiMnCoC) Powder (NMC 622) | NK0712 | Genel Endüstriyel Kullanım | |
| Lithium Nickel Manganese Cobalt Oxide Powder (NMC 811) | NK0713 | Genel Endüstriyel Kullanım | |
| Nickel (Ni) Sputtering Targets | NK0714 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Aluminum Foam for Battery and Supercapacitor Research | NK0715 | Genel Endüstriyel Kullanım | Purity: 99+%, Size : 100 mm x100 mm x 4mm |
| Titanium Alloy Micron Powders | NK0716 | Seramik, Yarı İletken, Kimyasal Endüstri | CPTi, 15-35 µm, Spherical |
| Lithium Nickel Manganese Cobalt Oxide (LiNiMnCoC) Powder (NMC 111) | NK0717 | Genel Endüstriyel Kullanım | |
| Nickel (III) Oxide (Ni2O3) Nanopowder/Nanoparticles | NK0718 | Genel Endüstriyel Kullanım | Purity: 99.95+ %, Size: 40 nm |
| (-OH) Functionalized Industrial Short Multi Walled Carbon Nanotubes | NK0719 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 28-48 nm |
| Tungsten (W) Micron Powder | NK0720 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 325 mesh |
| Highly Conductive Expanded Graphite Micron Powder | NK0721 | Genel Endüstriyel Kullanım | Purity: ≥ 96%, Size: 70 µm |
| Graphitized Multi Walled Carbon Nanotubes | NK0722 | Genel Endüstriyel Kullanım | Purity: > 99.99%, Outside Diameter: 8-18 nm |
| Manganese (II) Chloride (MnCl₂) | NK0723 | Genel Endüstriyel Kullanım | Purity: > 99% |
| Zinc (Zn) Sputtering Targets | NK0724 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Helical Multi Walled Carbon Nanotubes | NK0725 | Genel Endüstriyel Kullanım | Outside Diameter: 75-175 nm, Length: 2-15 µm |
| Iron (Fe) Sputtering Targets | NK0726 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Nickel-Coated Multi Walled Carbon Nanotubes | NK0727 | Genel Endüstriyel Kullanım | Purity: > 99%, Outside Diameter: 4-16 nm |
| Tungsten (W) Nanopowder/Nanoparticles | NK0728 | Genel Endüstriyel Kullanım | Purity: 99.955+%, Size: 65 nm, Metal Basis |
| Multi Walled Carbon Nanotubes N-Methyl-2-Pyrrolidinone Dispersion | NK0729 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 96 %, OD: 18-28 nm, Length 8-18 µm |
| Iron (III) Chloride (FeCl3) | NK0730 | Genel Endüstriyel Kullanım | Purity: > 99% |
| Carbon Nanotubes Metal Tapes with Iron (Fe) 14 wt% | NK0731 | Genel Endüstriyel Kullanım | Thickness: 18 µm, Dia: 47 mm |
| Copper (Cu) Nanopowder/Nanoparticles | NK0732 | Genel Endüstriyel Kullanım | Purity: 99.85%, Size: 22 nm, Carbon Coated |
| Copper (Cu) Sputtering Targets | NK0733 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Magnesium (Mg) Sputtering Targets | NK0734 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Graphene Oxide | NK0735 | Elektronik, Batarya Elektrotları, Sensörler | 2-5 Layer, Dia: 4, 5 µm, SA: 420 m2/gr |
| Aluminum Silicon Copper (AlSiCu) Sputtering Targets | NK0736 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Copper Oxide (CuO) Nanopowder/Nanoparticles Water Dispersion | NK0737 | Genel Endüstriyel Kullanım | Size: 20-50 nm, 22 wt% |
| Zinc Sulfide (ZnS) Pellets | NK0738 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1-10 mm |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in Water | NK0739 | Seramik, Yarı İletken, Kimyasal Endüstri | Anatase, Size: 3-12 nm, 16 wt% |
| (-OH) Functionalized Industrial Multi Walled Carbon Nanotubes | NK0740 | Genel Endüstriyel Kullanım | Purity: > 92%, Outside Diameter: 7-16 nm |
| Graphitic Carbon Nitride (g-C3N4) Powder 1-10 μm | NK0741 | Genel Endüstriyel Kullanım | |
| Aluminum Silicon Copper (AlSiCu) Sputtering Targets | NK0742 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 3” , Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK0743 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Carbon Nanotube-Mica Prepared by Electrostatic Adsorption | NK0744 | Genel Endüstriyel Kullanım | CNTs: 15 wt%; Mica: 85 wt% |
| Cobalt (Co) Sputtering Targets | NK0745 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Silver Tin (Ag-Sn) Alloy Nanopowder/Nanoparticles | NK0746 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size : < 110 nm |
| Carbon Nanotube-TiO2 Prepared by Electrostatic Adsorption | NK0747 | Genel Endüstriyel Kullanım | CNTs: 15 wt%, TiO2-rutile: 85 wt% |
| Copper Foam for Battery and Supercapacitor Research | NK0748 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size : 100 mm x100 mm x 1mm |
| Cobalt (Co) Micron Powder | NK0749 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 100 mesh |
| Graphene Ethanol Dispersion | NK0750 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Graphene: 2 wt% |
| Cobalt Titanate Green Spinel Nanopowder ( Co2TiO4) | NK0751 | Genel Endüstriyel Kullanım | |
| Titanium Oxynitride Nanoparticle | NK0752 | Seramik, Yarı İletken, Kimyasal Endüstri | APS: 20 nm, Purity: 99.9% |
| Europium Oxide (Eu2O3) Micron Powder | NK0753 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Lithium Nickel Cobalt Aluminum Oxide (NCA) (LiNi0.8Co0.15Al0.05O2) Powder for High Power Li-ion Battery Cathode Application | NK0754 | Genel Endüstriyel Kullanım | |
| Silicon Carbide (SiC) Nanopowder/Nanoparticles | NK0755 | Elektronik, Yarı İletkenler, Optik Malzemeler | Beta, Purity: 99.5+%, Size: 50-70 nm |
| Silver Copper (Ag-Cu) Alloy Nanopowder/Nanoparticles | NK0756 | Genel Endüstriyel Kullanım | Purity: 99.95% , Size: < 110 nm |
| Tungsten Carbide (WC) Nanopowder/Nanoparticles | NK0757 | Genel Endüstriyel Kullanım | Purity: 99.96%, Size: 25-95 nm |
| Iron Foam for Battery and Supercapacitor Research | NK0758 | Genel Endüstriyel Kullanım | Purity:98%, Size:300*200mm, Thickness: 2mm |
| PVDF Binder for Li-ion Battery Electrodes (set: 80g ) | NK0759 | Genel Endüstriyel Kullanım | |
| Zinc (Zn) Micron Powder | NK0760 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 10 µm |
| Aluminum Silicon Copper (AlSiCu) Sputtering Targets | NK0761 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Lead Oxide (PbO) Micron Powder | NK0762 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh, Yellow |
| Multi Walled Carbon Nanotubes Water Dispersion | NK0763 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 96%, OD: 3-13 nm, Length: 45 µm |
| Graphite Sheet Thermal Interface Material | NK0764 | Genel Endüstriyel Kullanım | EYG Series, 1300 W/m.K, Thickness: 50 µm, Lenght: 180 mm, Width: 115 mm |
| Titanium Alloy Micron Powders | NK0765 | Seramik, Yarı İletken, Kimyasal Endüstri | CPTi, 10-25 µm, Spherical |
| Tungsten Oxide (WO3) Micron Powder | NK0766 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Carbon Nanotubes Doped with 52 wt% Copper (Cu) Nanopowder/Nanoparticles | NK0767 | Genel Endüstriyel Kullanım | |
| Carbon Nanotubes Doped with 52 wt% Tin (Sn) Nanopowder/Nanoparticles | NK0768 | Genel Endüstriyel Kullanım | |
| Titanium Aluminum Carbide (Ti2AlC) MAX Phase Micron Powder | NK0769 | Seramik, Yarı İletken, Kimyasal Endüstri | APS: 325 Mesh, Purity: 99+ % |
| Titanium (Ti) Micron Powder | NK0770 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity:99.5+%, Size:15-53 µm, Spherical |
| Super Conductive Carbon Black Nanopowder and Carbon Nanotube Mixed | NK0771 | Genel Endüstriyel Kullanım | |
| Aluminum (Al) Sputtering Targets | NK0772 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Tin (Sn) Sputtering Targets | NK0773 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Graphitized Carbon Nanofiber | NK0774 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 200-600 nm |
| Cesium Tungsten Oxide (Cs0.33WO3) Nanopowder/Nanoparticles | NK0775 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: 18 nm |
| Aluminum (Al) Sputtering Targets | NK0776 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Cuprous Oxide (Cu2O) Nanopowder/Nanoparticles | NK0777 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 80 nm |
| Tantalum Pentoxide (Ta2O5) Micron Powder | NK0778 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 3 µm, White |
| Titanium (Ti) Micron Powder | NK0779 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity:99.5+%, Size:5-25 µm, Spherical |
| SS316 Coin Cell Battery Spacer | NK0780 | Genel Endüstriyel Kullanım | Diameter: 15.8mm, Thickness: 1mm |
| Iron (Fe) Sputtering Targets | NK0781 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Carbon Nanotubes Doped with 52 wt% Silica (SiO2) Nanopowder/Nanoparticles | NK0782 | Genel Endüstriyel Kullanım | |
| Carbon Nanotubes Doped with 52 wt% Iron Oxide (Fe3O4) Nanopowder/Nanoparticles | NK0783 | Pigment, Manyetik Malzemeler, Katalizörler | |
| Carbon Nanotubes Doped with 52 wt% Zinc (Zn) Nanopowder/Nanoparticles | NK0784 | Genel Endüstriyel Kullanım | |
| Carbon Nanotubes Doped with 52 wt% Titanium (Ti) Nanopowder/Nanoparticles | NK0785 | Seramik, Yarı İletken, Kimyasal Endüstri | |
| Carbon Nanotubes Doped with 52 wt% Cobalt (Co) Nanopowder/Nanoparticles | NK0786 | Genel Endüstriyel Kullanım | |
| Gold (Au) Nanopowder/Nanoparticles Dispersion | NK0787 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 20-30 nm, 172 ppm |
| Zinc (Zn) Sputtering Targets | NK0788 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Cobalt (Co) Sputtering Targets | NK0789 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Copper (Cu) Sputtering Targets | NK0790 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Chromium Nitride (CrN) Micron Powder | NK0791 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1-3 µm |
| Tantalum (Ta) Micron Powder | NK0792 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh |
| Cobalt Oxide (CoO) Micron Powder | NK0793 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Graphite Sheet Thermal Interface Material | NK0794 | Genel Endüstriyel Kullanım | EYG Series, 1600 W/m.K, Thickness: 25 µm, Lenght: 230 mm, Width: 180 mm |
| Boron (B) Micron Powder | NK0795 | Genel Endüstriyel Kullanım | Purity: 95+%, Size: < 1 µm, Amorphous |
| (-COOH) Functionalized Short Single Walled Carbon Nanotubes | NK0796 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Tungsten Titanium (TiW) Sputtering Targets | NK0797 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Niobium (Nb) Sputtering Targets | NK0798 | Genel Endüstriyel Kullanım | Purity: 99.95% pure Ex Ta, Size: 4”, Thickness: 0.250” |
| Carbon (C) (Graphite) Sputtering Targets | NK0799 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Single Walled Carbon Nanotubes | NK0800 | Genel Endüstriyel Kullanım | Purity: > 92%, OD: 1-2 nm |
| Nickel Oxide (NiO) Nanopowder/Nanoparticles | NK0801 | Genel Endüstriyel Kullanım | High Purity: 99.99%, Size: 18 nm, Cubic |
| Tungsten Titanium (TiW) Sputtering Targets | NK0802 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Dispersion in PGMEA or PGME | NK0803 | Seramik, Yarı İletken, Kimyasal Endüstri | Size: 1 µm, Rutile, 20 wt% |
| Carbon Nanotubes Doped with 52 wt% Alumina (Al2O3) Nanopowder/Nanoparticles | NK0804 | Genel Endüstriyel Kullanım | |
| Cobalt (Co) Sputtering Targets | NK0805 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles | NK0806 | Seramik, Yarı İletken, Kimyasal Endüstri | Rutile: 90 wt%, CNTs: 8 wt% |
| Lithium (Li) Foil Thickness:0.6 mm | NK0807 | Genel Endüstriyel Kullanım | Width: 25 mm, Length: 100 mm, Purity: 99.9% |
| Carbon Nanotubes Doped with 52 wt% Aluminum (Al) Nanopowder/Nanoparticles | NK0808 | Genel Endüstriyel Kullanım | |
| Silicon (Si) Sputtering Targets | NK0809 | Elektronik, Yarı İletkenler, Optik Malzemeler | undoped, Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Titanium Aluminum Carbide (Ti3AlC2) MAX Phase Micron Powder | NK0810 | Seramik, Yarı İletken, Kimyasal Endüstri | APS: 325 Mesh, Purity: 99+ % |
| Tin (Sn) Sputtering Targets | NK0811 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Nitrogen-doped Multi Walled Carbon Nanotubes | NK0812 | Genel Endüstriyel Kullanım | |
| Nickel Chromium (Ni-Cr) Alloy Nanopowder/Nanoparticles | NK0813 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: < 90 nm |
| Zinc (Zn) Sputtering Targets | NK0814 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Iron (Fe) Sputtering Targets | NK0815 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Graphene Water Dispersion | NK0816 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Black Liquid, Graphene: 2 wt% |
| Iron (Fe) Sputtering Targets | NK0817 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lanthanum Hexaboride (LaB6) Micron Powder | NK0818 | Genel Endüstriyel Kullanım | High Purity: 99.95+%, Size: 200 mesh |
| Tantalum (Ta) Micron Powder | NK0819 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 100 mesh |
| Nickel (Ni) Micron Powder Type 255 | NK0820 | Genel Endüstriyel Kullanım | Purity: >99.7 %, APS: 2.2–2.8 μm |
| Carbon Nanotubes Doped with 12 wt% Iron (Fe) Nanopowder/Nanoparticles | NK0821 | Genel Endüstriyel Kullanım | |
| Beryllium (Be) Micron Powder | NK0822 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: -100 mesh |
| Magnesium Nitride (Mg3N2) Micron Powder | NK0823 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 35 µm |
| Tin Oxide (SnO2) Nanopowder/Nanoparticles | NK0824 | Genel Endüstriyel Kullanım | High Purity: 99.99%, Size: 18 nm |
| Hafnium Carbide (HfC) Nanopowder/Nanoparticles | NK0825 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 790 nm, Cubic |
| Aluminum (Al) Sputtering Targets | NK0826 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Carbon Nanotubes Doped with 32 wt% Silicon (Si) Nanopowder/Nanoparticles | NK0827 | Elektronik, Yarı İletkenler, Optik Malzemeler | |
| Carbon Nanotubes Doped with 32 wt% Copper (Cu) Nanopowder/Nanoparticles | NK0828 | Genel Endüstriyel Kullanım | |
| Carbon Nanotubes Doped with 32 wt% Iron (Fe) Nanopowder/Nanoparticles | NK0829 | Genel Endüstriyel Kullanım | |
| Carbon Nanotubes Doped with 12 wt% Copper (Cu) Nanopowder/Nanoparticles | NK0830 | Genel Endüstriyel Kullanım | |
| Carbon Nanotubes Doped with 52 wt% Silicon (Si) Nanopowder/Nanoparticles | NK0831 | Elektronik, Yarı İletkenler, Optik Malzemeler | |
| Silicon Dioxide (SiO2) Sputtering Targets | NK0832 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 2” , Thickness: 0.250” |
| Copper (Cu) Sputtering Targets | NK0833 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Niobium (Nb) Micron Powder | NK0834 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 3 µm |
| Cadmium Selenide (CdSe) Micron Powder | NK0835 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 1-10 µm |
| Carbon Nanotubes Doped with 52 wt% Iron (Fe) Nanopowder/Nanoparticles | NK0836 | Genel Endüstriyel Kullanım | |
| Niobium (Nb) Sputtering Targets | NK0837 | Genel Endüstriyel Kullanım | Purity: 99.95% pure Ex Ta, Size: 1”, Thickness: 0.125” |
| Carbon Nanotubes Doped with 32 wt% Silicon (Si) and 32 wt% Graphene Nanopowder/Nanoparticles | NK0838 | Elektronik, Batarya Elektrotları, Sensörler | |
| Carbon Nanotubes Doped with 12 wt% Aluminum (Al) Nanopowder/Nanoparticles | NK0839 | Genel Endüstriyel Kullanım | |
| Dysprosium (Dy) Micron Powder | NK0840 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Lead (Pb) Sputtering Targets | NK0841 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 1”, Thickness: 0.125” |
| Graphene NMP Dispersion | NK0842 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Graphene: 2, 0 wt% |
| Carbon Nanotubes Doped with 32 wt% Aluminum (Al) Nanopowder/Nanoparticles | NK0843 | Genel Endüstriyel Kullanım | |
| Copper (Cu) Sputtering Targets | NK0844 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK0845 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Magnesium Oxide (MgO) Sputtering Targets | NK0846 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | indium, Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Zinc (Zn) Sputtering Targets | NK0847 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Copper (Cu) Sputtering Targets | NK0848 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Magnesium (Mg) Sputtering Targets | NK0849 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK0850 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 1”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK0851 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Aluminum Zirconium Alloy Powder | NK0852 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: < 44 µm, Al: 90%, Zr: 10% |
| Tungsten (W) Sputtering Targets | NK0853 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| SS304 Coin Cell Battery Spacer | NK0854 | Genel Endüstriyel Kullanım | Diameter: 15.8mm, Thickness: 1mm |
| Niobium (Nb) Sputtering Targets | NK0855 | Genel Endüstriyel Kullanım | Purity: 99.95% pure Ex Ta, Size: 1”, Thickness: 0.250” |
| Vanadium (V) Sputtering Targets | NK0856 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 1”, Thickness: 0.125” |
| Silicon (Si) Nanopowder for Battery Applications | NK0857 | Elektronik, Yarı İletkenler, Optik Malzemeler | |
| Yttrium Oxyfluoride (YOF) Nanopowder | NK0858 | Genel Endüstriyel Kullanım | Purity: 99.9%, APS: < 50 nm |
| Selenium (Se) Sputtering Targets | NK0859 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Yttrium Fluoride (YF3) Nanopowder | NK0860 | Genel Endüstriyel Kullanım | Purity: 99.9%, APS: < 50 nm |
| Selenium (Se) Sputtering Targets | NK0861 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size:1”, Thickness: 0.125” |
| Tin (Sn) Sputtering Targets | NK0862 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Vanadium (V) Sputtering Targets | NK0863 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 1”, Thickness: 0.250” |
| (-OH) Functionalized Single Walled Carbon Nanotubes | NK0864 | Genel Endüstriyel Kullanım | Purity: > 92%, SSA: 370 m2/g, Dia: 1.0 nm |
| (-COOH) Functionalized Single Walled Carbon Nanotubes | NK0865 | Genel Endüstriyel Kullanım | Purity: > 92%, SSA: 370 m2/g |
| Cobalt (Co) Sputtering Targets | NK0866 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| PPL Inside Chamber for Hydrothermal Synthesis Autoclave Reactors | NK0867 | Genel Endüstriyel Kullanım | |
| Zinc (Zn) Sputtering Targets | NK0868 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Aluminum (Al) Sputtering Targets | NK0869 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Water-_21_.webp | NK0870 | Genel Endüstriyel Kullanım | |
| Diamond (C) Nanopowder/Nanoparticles | NK0871 | Genel Endüstriyel Kullanım | Purity: 99%, Size: 30-50 nm |
| Lanthanum Hexaboride (LaB6) Micron Powder | NK0872 | Genel Endüstriyel Kullanım | High Purity: 99.5+%, Size: 1.5-18 µm |
| Crystalline Boron (B) Micron Powder | NK0873 | Genel Endüstriyel Kullanım | Average Particle Size: -325 Mesh, Purity: 99+% |
| Aluminum 2024 Alloy Powder | NK0874 | Genel Endüstriyel Kullanım | Size: – 325 mesh |
| Aluminum 6061 Alloy Powder | NK0875 | Genel Endüstriyel Kullanım | Size: 15-53 µm, Spherical |
| N-Methyl-2-Pyrrolidone (NMP) Solvent for Lithium Battery Cathode Materials | NK0876 | Genel Endüstriyel Kullanım | Purity: 99.90% |
| Carbon Nanotube-Polystyrene Microspheres Prepared by Electrostatic Adsorption | NK0877 | Genel Endüstriyel Kullanım | CNTs: 25 wt%; Polystyrene Microspheres: 75 wt% |
| Niobium (Nb) Micron Powder | NK0878 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 325 mesh |
| Copper (Cu) Micron Powder | NK0879 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 100 mesh, Spherical |
| Hafnium (Hf) Micron Powder | NK0880 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh |
| View Product | NK0881 | Genel Endüstriyel Kullanım | |
| Titanium Dioxide (TiO2) Nanopowder/Nanoparticles Dispersion in 2-Propanol | NK0882 | Seramik, Yarı İletken, Kimyasal Endüstri | Size: 12 nm, Anatase, 22 wt% |
| Cobalt Chromium (Co-Cr) Alloy Powder | NK0883 | Genel Endüstriyel Kullanım | Size: < 44 µm, Co: 20%, Cr: 80% |
| Copper (Cu) Sputtering Targets | NK0884 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Ni-Ti50 Alloy Powder / Solid Spherical Micron Powder | NK0885 | Genel Endüstriyel Kullanım | Purity: 99.9%, APS: 45-105 μm |
| WE43 Magnesium Alloy Average Particle Size: 15-53 um | NK0886 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Spherical |
| Zirconium (Zr) Micron Powder | NK0887 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh |
| Crystalline Boron (B) Micron Powder | NK0888 | Genel Endüstriyel Kullanım | Average Particle Size: 5 µm, Purity: 99+% |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK0889 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Lithium Lanthanum Tantalum Zirconate (LLZTO) | NK0890 | Genel Endüstriyel Kullanım | Size: 1-3 µm, Purity: ≥99.5 |
| Graphite Sheet Thermal Interface Material | NK0891 | Genel Endüstriyel Kullanım | EYG Series, 1300 W/m.K, Thickness: 50 µm, Lenght: 230 mm, Width: 180 mm |
| Cobalt (Co) Sputtering Targets | NK0892 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK0893 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Iron (Fe) Sputtering Targets | NK0894 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Aluminum Silicon (AlSi) Sputtering Targets | NK0895 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Nickel (Ni) Nanopowder/Nanoparticles | NK0896 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 31 nm, Metal Basis |
| Nickel (Ni) Nanopowder/Nanoparticles | NK0897 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 90 nm, Metal Basis |
| Praseodymium (Pr) Sputtering Targets | NK0898 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Carbon Nanotubes Doped with 52 wt% Silver (Ag) Nanopowder/Nanoparticles | NK0899 | Genel Endüstriyel Kullanım | |
| Carbon Nanotubes Doped with 12 wt% Silver (Ag) Nanopowder/Nanoparticles | NK0900 | Genel Endüstriyel Kullanım | |
| Aluminum (Al) Sputtering Targets | NK0901 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK0902 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 3”, Thickness: 0.125” |
| Copper Indium (Cu-In) Alloy Nanopowder/Nanoparticles | NK0903 | Genel Endüstriyel Kullanım | Purity: 99.9% , Size: < 500 nm |
| Aluminum Nitride (AlN) Nanopowder/Nanoparticles | NK0904 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 790 nm, Hexagonal |
| Molybdenum (Mo) Sputtering Targets | NK0905 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK0906 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Indium (In) Sputtering Targets | NK0907 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Carbon Nanotube-TiO2 Prepared by Electrostatic Adsorption | NK0908 | Genel Endüstriyel Kullanım | CNTs: 25 wt%, TiO2-rutile: 75 wt% |
| Zinc (Zn) Sputtering Targets | NK0909 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Carbon Nanotubes Doped with 32 wt% Silver (Ag) Nanopowder/Nanoparticles | NK0910 | Genel Endüstriyel Kullanım | |
| Molybdenum (Mo) Nanopowder/Nanoparticles | NK0911 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 50-150 nm, Metal Basis |
| Aluminum Silicon (AlSi) Sputtering Targets | NK0912 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Iron (Fe) Sputtering Targets | NK0913 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Magnesium (Mg) Sputtering Targets | NK0914 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 1”, Thickness: 0.125” |
| Lead Zirconate Titanate (PZT) Nanopowder/Nanoparticles | NK0915 | Genel Endüstriyel Kullanım | Purity: 99.5+ %, Size: < 100 nm |
| Silicon Dioxide (SiO2) Sputtering Targets | NK0916 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 3”, Thickness: 0.250” |
| Crystalline Boron (B) Micron Powder | NK0917 | Genel Endüstriyel Kullanım | Average Particle Size: 1 µm, Purity: 99+% |
| Prime CZ-Si Wafer | NK0918 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 279 ± 20 μm |
| Scandium (Sc) Micron Powder | NK0919 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Particle Size: 200 mesh |
| Praseodymium (Pr) Sputtering Targets | NK0920 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Iron (Fe) Sputtering Targets | NK0921 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK0922 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK0923 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Iron (Fe) Sputtering Targets | NK0924 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK0925 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Nickel Iron (Ni-Fe) Sputtering Targets | NK0926 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Germanium (Ge) Sputtering Targets | NK0927 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Tin (Sn) Sputtering Targets | NK0928 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK0929 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Vanadium Aluminum Carbide (V2AlC) MAX Phase Micron Powder | NK0930 | Genel Endüstriyel Kullanım | APS: 325 Mesh, Purity: 99+ % |
| Magnesium (Mg) Sputtering Targets | NK0931 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 1”, Thickness: 0.250” |
| Lead (Pb) Sputtering Targets | NK0932 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 1”, Thickness: 0.250” |
| Copper (Cu) Nanopowder/Nanoparticles | NK0933 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 65 nm, Metal Basis |
| Nickel (Ni) Sputtering Targets | NK0934 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Iron (Fe) Sputtering Targets | NK0935 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Amino-Multi Walled Carbon Nanotubes | NK0936 | Genel Endüstriyel Kullanım | Purity: > 95 wt%, Length: 60 μm |
| Carbon Nanotube Sponges | NK0937 | Genel Endüstriyel Kullanım | Size: 10 mm x 10 mm, Thickness: 1-2 mm |
| Scandium (Sc) Micron Powder | NK0938 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Carbon Nanotubes Metal Films with Iron (Fe) 13 wt% | NK0939 | Genel Endüstriyel Kullanım | Thickness: 18 µm, Diameter: 47 mm |
| Titanium Tin Carbide (Ti2SnC) MAX Phase Micron Powder | NK0940 | Seramik, Yarı İletken, Kimyasal Endüstri | APS: 325 Mesh, Purity: 99+ % |
| Niobium Aluminum Carbide (Nb2AlC) MAX Phase Micron Powder | NK0941 | Genel Endüstriyel Kullanım | APS: 325 Mesh, Purity: 99+ % |
| Carbon (C) (Graphite) Sputtering Targets | NK0942 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Molybdenum (Mo) Sputtering Targets | NK0943 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Bismuth (III) Sulfide (Bi2S3) Nanopowder/Nanoparticles | NK0944 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 500 nm |
| Hydrothermal Synthesis Autoclave Reactor with PTFE Lined Vessel 50 ml | NK0945 | Genel Endüstriyel Kullanım | |
| Nickel (Ni) Sputtering Targets | NK0946 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Cobalt (Co) Sputtering Targets | NK0947 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Indium Oxide (In2O3) Micron Powder | NK0948 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh, White |
| Nickel Iron (Ni-Fe) Sputtering Targets | NK0949 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Prime CZ-Si Wafer | NK0950 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 625±25um |
| Prime CZ-Si Wafer | NK0951 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (111), Boron Doped, Resistivity: 1-20 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK0952 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 1”, Thickness: 0.250” |
| Lead (Pb) Sputtering Targets | NK0953 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 2”, Thickness: 0.250” |
| Molybdenum (Mo) Sputtering Targets | NK0954 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.125” |
| Tungsten Titanium (TiW) Sputtering Targets | NK0955 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.995%, Size: 1”, Thickness: 0.250” |
| Titanium Foam for Battery and Supercapacitor Research | NK0956 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99+%, Size: 100 mm x100 mm x 2.8mm |
| Carbon Nanotube Sponges | NK0957 | Genel Endüstriyel Kullanım | Size: 10 mm x 10 mm, Thickness: 3-4 mm |
| Molybdenum (Mo) Sputtering Targets | NK0958 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Styrene-Butadiene Rubber (SBR) Binder for Li-ion Battery Anode Materials | NK0959 | Genel Endüstriyel Kullanım | |
| Carbon Nanotube-Carbon Black Prepared by Electrostatic Adsorption | NK0960 | Genel Endüstriyel Kullanım | CNTs: 34.4 wt%, Carbon Black: 65.6 wt% |
| Yttrium (Y) Sputtering Targets | NK0961 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Copper (Cu) Sputtering Targets | NK0962 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Cubic Boron Nitride Nanopowder | NK0963 | Genel Endüstriyel Kullanım | Cubic, Size: <250 nm Purity: 99.5% |
| Aluminum Silicon (AlSi) Sputtering Targets | NK0964 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK0965 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Prime CZ-Si Wafer | NK0966 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (111), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 280 ± 15 μm |
| Erbium Oxide (Er2O3) Sputtering Targets | NK0967 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Borosilicate Wafer | NK0968 | Genel Endüstriyel Kullanım | Size: 3”, 2-Side polished, Thickness: 500 ± 25 μm |
| Carbon Nanotube Buckypaper with Metal 0.8% | NK0969 | Genel Endüstriyel Kullanım | Thickness: 28 µm, Diameter: 35-39 mm |
| Carbon (C) (Graphite) Sputtering Targets | NK0970 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Molybdenum (Mo) Sputtering Targets | NK0971 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Molybdenum (Mo) Sputtering Targets | NK0972 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK0973 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK0974 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Copper-Zinc Alloy Nanopowder | NK0975 | Genel Endüstriyel Kullanım | Cu55Zn45, Average Particle Size: 50nm, Purity: 99.9% |
| Lithium Battery Strapping Tape | NK0976 | Genel Endüstriyel Kullanım | Width: 10 mm, Thickness: 0.03 mm, Length: 100 m |
| Iron-Silicon Nanoparticles | NK0977 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fe65Si35, APS:50nm, Purity: 99.9% |
| Iron-Nickel Nanoparticles | NK0978 | Genel Endüstriyel Kullanım | Fe65Ni35, APS: 50nm, Purity: 99.9% |
| Copper Nickel Alloy Nanopowder | NK0979 | Genel Endüstriyel Kullanım | Cu55Ni45, APS: 50nm, Purity: 99.9% |
| Aluminum-Silicon (AlSi) Alloy Powder | NK0980 | Elektronik, Yarı İletkenler, Optik Malzemeler | Al85Si15, APS: 50nm, Purity: 99.9% |
| Silver Indium (Ag-In) Alloy Nanopowder/Nanoparticles | NK0981 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 40-100 nm |
| Vanadium Nitrade (VN) Nanopowder | NK0982 | Genel Endüstriyel Kullanım | APS: 40nm, Purity: 99.9% |
| Indium (In) Sputtering Targets | NK0983 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Dummy CZ-Si Wafer | NK0984 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (111), Phosphor Doped, Resistivity: 1-50 (ohm.cm), 2-Side Polished, Thickness: 525 ± 25 μm |
| Prime CZ-Si Wafer | NK0985 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 280 ± 25 μm |
| Multi Walled Carbon Nanotubes Isopropanol Dispersion | NK0986 | Genel Endüstriyel Kullanım | 4 wt%, Purity: >96%, OD: 45-75 nm, Length 8-28 µm |
| Prime CZ-Si Wafer | NK0987 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (100), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 279 ± 20 μm |
| Multi Walled Carbon Nanotubes N-butanol Dispersion | NK0988 | Genel Endüstriyel Kullanım | 4 wt%, Purity: >96%, OD: 45-75 nm, Length 8-28 µm |
| CR2032 Coin Cell Cases with 304SS | NK0989 | Genel Endüstriyel Kullanım | Diameter: 20 mm, Height: 3.2 mm |
| Prime CZ-Si Wafer | NK0990 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (111), Arsenic Doped, Resistivity: 0, 001-, 0.005 (ohm.cm), 1-Side Polished, Thickness: 400 ± 25 μm |
| Cobalt (II) Chloride Hexahydrate (Cl2CoH12O6) | NK0991 | Genel Endüstriyel Kullanım | Purity: > 99% |
| Erbium Oxide (Er2O3) Sputtering Targets | NK0992 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Iron (Fe) Sputtering Targets | NK0993 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Aluminum Silicon (AlSi) Sputtering Targets | NK0994 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Copper (Cu) Sputtering Targets | NK0995 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Nickel Vanadium (NiV) Sputtering Targets | NK0996 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Germanium (Ge) Sputtering Targets | NK0997 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Iron (Fe) Sputtering Targets | NK0998 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Lead (Pb) Sputtering Targets | NK0999 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 2”, Thickness: 0.125” |
| Prime CZ-Si Wafer | NK1000 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 380 ± 25 μm |
| Aluminum (Al) Nanopowder/Nanoparticles | NK1001 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 770 nm, Metal Basis |
| Aluminum Tab for Pouch Li-ion Cell | NK1002 | Genel Endüstriyel Kullanım | Width: 4 mm, Length: 57 mm |
| Quartz Wafer | NK1003 | Genel Endüstriyel Kullanım | (X-Cut), Size: 2”, 2-Side Polished, Thickness: 500 ± 25 μm |
| Prime CZ-Si Wafer | NK1004 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm |
| Test CZ-Si Wafer | NK1005 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-20 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm |
| Borosilicate Wafer | NK1006 | Genel Endüstriyel Kullanım | Size: 3”, 1-Side polished, Thickness: 150 ± 25 μm |
| Dummy CZ-Si Wafer | NK1007 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (111), Phosphor Doped, Resistivity: 0, 001-100 (ohm.cm), 1-Side Polished, Thickness: 340 ± 25 μm |
| Prime CZ-Si Wafer | NK1008 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 380±25um |
| Borosilicate Wafer | NK1009 | Genel Endüstriyel Kullanım | Size: 4”, 1-Side polished, Thickness: 700 ± 25 μm |
| Carbon Nanotubes Highly Conductive Tapes with Metal 8% | NK1010 | Genel Endüstriyel Kullanım | Thickness: 18 µm, Dia: 47 mm |
| Zinc (Zn) Sputtering Targets | NK1011 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Lithium Titanate (Li2TiO3) Sputtering Targets | NK1012 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Carbon Nanotubes Doped with 12 wt% Silicon (Si) Nanopowder/Nanoparticles | NK1013 | Elektronik, Yarı İletkenler, Optik Malzemeler | |
| Niobium (Nb) Sputtering Targets | NK1014 | Genel Endüstriyel Kullanım | Purity: 99.95% pure Ex Ta, Size: 2”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK1015 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Platinum (Pt) Nanopowder/Nanoparticles Dispersion | NK1016 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 10 nm, 1100 ppm |
| Nickel (Ni) Sputtering Targets | NK1017 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| CR2032 Coin Cell Case (Negative Case | NK1018 | Genel Endüstriyel Kullanım | Cone Spring, Spacer, Positive Case) |
| Thulium (III) oxide Micron Powder | NK1019 | Genel Endüstriyel Kullanım | Size: 3-5 um, Purity: 99.9 % |
| Aluminum (Al) Sputtering Targets | NK1020 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Cubic Boron Nitride Nanopowder | NK1021 | Genel Endüstriyel Kullanım | Cubic, Size: <200 nm Purity: 99.9% |
| Copper (Cu) Nanopowder/Nanoparticles | NK1022 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 80 nm, Metal Basis |
| Graphene Oxide Water Dispersion | NK1023 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, Black Liquid, GO: 2, 0 wt% |
| Reduced Graphene Oxide Water Dispersion | NK1024 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5%, rGO: 2, 0 wt% |
| Silicon (Si) Sputtering Targets | NK1025 | Elektronik, Yarı İletkenler, Optik Malzemeler | undoped, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Tin (Sn) Sputtering Targets | NK1026 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Molybdenum (Mo) Sputtering Targets | NK1027 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Prime CZ-Si Wafer | NK1028 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 625±25um |
| Short Single Walled Carbon Nanotubes | NK1029 | Genel Endüstriyel Kullanım | Purity: > 92% |
| Nickel (Ni) Sputtering Targets | NK1030 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 2”, Thickness: 0.125” |
| Prime CZ-Si Wafer | NK1031 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (111), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm |
| Aluminum (Al) Sputtering Targets | NK1032 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Iron (Fe) Sputtering Targets | NK1033 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Graphite Fluoride (Carbon Monofluoride) Micron Powder | NK1034 | Genel Endüstriyel Kullanım | 8-10 micron, F/C Ratio : 1.2 |
| Aluminum (Al) Sputtering Targets | NK1035 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.125” |
| Tantalum (Ta) Nanopowder/Nanoparticles | NK1036 | Genel Endüstriyel Kullanım | High Purity: 99.9%, Size: 45-75 nm |
| Large Surface Area Single Walled Carbon Nanotubes | NK1037 | Genel Endüstriyel Kullanım | Purity: > 95%, SSA: 400 m2/g |
| Prime Si+SiO2 Wafer (dry) | NK1038 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 279 ± 20 μm, Coating 100 nm |
| (-OH) Functionalized Short Length Double Walled Carbon Nanotubes | NK1039 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Lithium Lanthanum Zirconate (LLZO | NK1040 | Genel Endüstriyel Kullanım | Li7La3Zr2O12), Purity: ≥99.5, Size: 0.3 -1 µm |
| Prime CZ-Si Wafer | NK1041 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (110), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm |
| Cobalt (Co) Sputtering Targets | NK1042 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Iron (Fe) Sputtering Targets | NK1043 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Prime CZ-Si Wafer | NK1044 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm |
| Prime CZ-Si Wafer | NK1045 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm |
| Prime CZ-Si Wafer | NK1046 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 525 ± 25 μm |
| Dummy CZ-Si Wafer | NK1047 | Genel Endüstriyel Kullanım | Size: 6”, Orientation: (100), Boron Doped, Resistivity: 0.001 – 100 (ohm.cm), 1-Side Polished, Thickness: 650 ± 50 μm |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1048 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Praseodymium (Pr) Sputtering Targets | NK1049 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Dummy CZ-Si Wafer | NK1050 | Genel Endüstriyel Kullanım | Size: 6”, Orientation: (100), Phosphor Doped, Resistivity: 0.001 – 100 (ohm.cm), 1-Side Polished, Thickness: 650 ± 50 μm |
| Borosilicate Wafer | NK1051 | Genel Endüstriyel Kullanım | Size: 4”, 1-Side polished, Thickness: 1000 ± 20 μm |
| Platinum Oxide (PtO2) Nanopowder/Nanoparticles | NK1052 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: <100 nm |
| Aluminum Silicon (AlSi) Sputtering Targets | NK1053 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Zinc (Zn) Sputtering Targets | NK1054 | Genel Endüstriyel Kullanım | Purity: 99.99% Size: 3”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK1055 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Niobium (Nb) Sputtering Targets | NK1056 | Genel Endüstriyel Kullanım | Purity: 99.95% pure Ex Ta, Size: 2”, Thickness: 0.250” |
| Molybdenum (Mo) Sputtering Targets | NK1057 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Magnesium (Mg) Sputtering Targets | NK1058 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Copper (Cu) Nanopowder/Nanoparticles | NK1059 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 35 nm, Metal Basis |
| Tantalum (Ta) Sputtering Targets | NK1060 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1061 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Indium (In) Sputtering Targets | NK1062 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Thulium (Tm) Micron Powder | NK1063 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Nickel (Ni) Sputtering Targets | NK1064 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 3”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK1065 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 2”, Thickness: 0.250” |
| Single Layer Graphene Oxide | NK1066 | Elektronik, Batarya Elektrotları, Sensörler | Purity: 99.5 % |
| Magnesium (Mg) Sputtering Targets | NK1067 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 2”, Thickness: 0.125” |
| (-COOH) Functionalized Short Length Double Walled Carbon Nanotubes | NK1068 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Antimony (Sb) Sputtering Targets | NK1069 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| CR2016 Coin Cell Cases with 304SS (Positive+Negative Cases) | NK1070 | Genel Endüstriyel Kullanım | Diameter: 20 mm, Height : 1.6 mm |
| CR2325 Coin Cell Cases with 304SS (Positive+Negative Cases) | NK1071 | Genel Endüstriyel Kullanım | Diameter: 23 mm, Height : 2.5 mm |
| Tin (Sn) Micron Powder | NK1072 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 3 µm |
| Nickel Iron (Ni-Fe) Sputtering Targets | NK1073 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Niobium (Nb) Sputtering Targets | NK1074 | Genel Endüstriyel Kullanım | Purity: 99.95% pure Ex Ta, Size: 4”, Thickness: 0.125” |
| Zinc (Zn) Sputtering Targets | NK1075 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Zinc (Zn) Sputtering Targets | NK1076 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Vanadium (V) Sputtering Targets | NK1077 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Niobium (Nb) Sputtering Targets | NK1078 | Genel Endüstriyel Kullanım | Purity: 99.95% pure Ex Ta, Size: 3”, Thickness: 0.125” |
| Aluminum Silicon (AlSi) Sputtering Targets | NK1079 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Iron (Fe) Sputtering Targets | NK1080 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Prime FZ-Si Wafer | NK1081 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (100), Phosphor Doped, Resistivity: 7000 – 8000 (ohm.cm), 2-Side Polished, Thickness: 250 ± 15 μm |
| Prime CZ-Si Wafer | NK1082 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2-Side Polished, Thickness: 2000 ± 50 μm |
| Prime CZ-Si Wafer | NK1083 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 8-12 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm |
| Prime Si+SiO2 Wafer (wet) | NK1084 | Genel Endüstriyel Kullanım | Size: 2”, Orientation: (111), Boron Doped, Resistivity: 1 -20 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm, Coating 500 nm |
| Erbium Oxide (Er2O3) Sputtering Targets | NK1085 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Hydrothermal Synthesis Autoclave Reactor with PPL Lined Vessel 50 ml | NK1086 | Genel Endüstriyel Kullanım | |
| Iron (Fe) Nanopowder/Nanoparticles | NK1087 | Genel Endüstriyel Kullanım | Purity: 99.55+%, Size: 30-40 nm, Metal Basis |
| Aluminum (Al) Sputtering Targets | NK1088 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| (-OH) Functionalized Short Single Walled Carbon Nanotubes | NK1089 | Genel Endüstriyel Kullanım | Purity: >92% |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1090 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1091 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 4”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1092 | Elektronik, Yarı İletkenler, Optik Malzemeler | undoped, Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Niobium (Nb) Sputtering Targets | NK1093 | Genel Endüstriyel Kullanım | Purity: 99.95% pure Ex Ta, Size: 3”, Thickness: 0.250” |
| Nickel Vanadium (NiV) Sputtering Targets | NK1094 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Zinc (Zn) Sputtering Targets | NK1095 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Zinc (Zn) Sputtering Targets | NK1096 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Gallium Arsenide (GaAs) Wafers | NK1097 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 350± 25 μm, Single Side Polished, EPI-ready, Mobility: 1000-3000 |
| Gallium Arsenide (GaAs) Wafers | NK1098 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350±25 μm, Single Side Polished, EPI-ready, Dopant: Zinc (P Type) |
| Erbium Oxide (Er2O3) Sputtering Targets | NK1099 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Scandium Oxide (Sc2O3) Micron Powder | NK1100 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Prime CZ-Si Wafer | NK1101 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Boron Doped, Resistivity: 0, 01-0, 02 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm |
| Prime Si+SiO2 Wafer (wet) | NK1102 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 380 ± 25 μm, Coating 300 nm |
| Prime Si+SiO2 Wafer (dry) | NK1103 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 380 ± 25 μm, Coating 100 nm |
| Test CZ-Si Wafer | NK1104 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 0, 001-0, 005 (ohm.cm), 2-Side Polished, Thickness: 200 ± 10 μm |
| Dummy CZ-Si Wafer | NK1105 | Genel Endüstriyel Kullanım | Size: 6”, Orientation: (100), Boron Doped, Resistivity: 5-10 (ohm.cm), 1-Side Polished, Thickness: 675 ± 25 μm |
| Iron (II) Sulfate (FeSO4.xH2O) | NK1106 | Genel Endüstriyel Kullanım | Purity: > 98% |
| CR2450 Coin Cell Cases with 304SS (Positive+Negative Cases) | NK1107 | Genel Endüstriyel Kullanım | Diameter: 24 mm, Height : 5 mm |
| Aluminum 7075 Alloy Powder | NK1108 | Genel Endüstriyel Kullanım | Size: 15-53 µm, Spherical |
| Silver Conductive Adhesive Paste | NK1109 | Genel Endüstriyel Kullanım | |
| Hydrothermal Synthesis Autoclave Reactor with PTFE Lined Vessel 100 ml | NK1110 | Genel Endüstriyel Kullanım | |
| Magnetic Graphene Aerogel | NK1111 | Elektronik, Batarya Elektrotları, Sensörler | Content of Fe3O4: 65%, Diameter: 1±0.1 cm |
| Impending Self-Help Transfer Nickel Graphene Foam | NK1112 | Elektronik, Batarya Elektrotları, Sensörler | Thickness: 1±0.1 mm, Size: 1×1 cm |
| Magnetic Graphene Aerogel | NK1113 | Elektronik, Batarya Elektrotları, Sensörler | Content of Fe3O4: 50%, Diameter: 1±0.1 cm |
| Zinc (Zn) Sputtering Targets | NK1114 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Lithium Titanate (Li2TiO3) Sputtering Targets | NK1115 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Prime CZ-Si Wafer | NK1116 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 0.001 – 0.005 (ohm.cm), 2- Polished, Thickness: 200 ± 10 μm |
| Borosilicate Wafer | NK1117 | Genel Endüstriyel Kullanım | Size: 4”, 2-Side polished, Thickness: 700 ± 20 μm |
| Hafnium (Hf) Micron Powder | NK1118 | Genel Endüstriyel Kullanım | Purity: 99.9+%, Size: 15-53 μm, Spherical |
| Prime CZ-Si Wafer | NK1119 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2- Polished, Thickness: 200 ± 10 μm |
| Prime CZ-Si Wafer | NK1120 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 0, 01-0, 02 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm |
| Prime CZ-Si Wafer | NK1121 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 300 ± 25 μm |
| Graphitized Carbon Nanofibers | NK1122 | Genel Endüstriyel Kullanım | Purity: > 99.9%, Outside Diameter: 50-100 nm, Length: 1-15 μm |
| Borosilicate Wafer | NK1123 | Genel Endüstriyel Kullanım | Size: 4”, 2-Side polished, Thickness: 500 ± 25 μm |
| Prime CZ-Si Wafer | NK1124 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: NG08SW0227 400±25um |
| CR2032 Coin Cell Case (Negative Case | NK1125 | Genel Endüstriyel Kullanım | Cone Spring, Spacer, Positive Case), Materials: 316SS |
| Carbon Nanotube (CNT) Nanoribbon | NK1126 | Genel Endüstriyel Kullanım | |
| Ultralight Graphene Aerogel | NK1127 | Elektronik, Batarya Elektrotları, Sensörler | Diameter: 1.2±0.1 cm, Height: 1.2±0.1 cm |
| Lithium Cobalt Oxide (LiCoO2) Coated Aluminum Foil | NK1128 | Genel Endüstriyel Kullanım | |
| Lithium Iron Phosphate (LiFePO4) Coated Aluminum Foil | NK1129 | Genel Endüstriyel Kullanım | |
| Indium (In) Sputtering Targets | NK1130 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Silver (Ag) Sputtering Targets | NK1131 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Silicon Hexaboride (SiB6) Nanopowder | NK1132 | Elektronik, Yarı İletkenler, Optik Malzemeler | APS: 40nm, Purity: 99% |
| Carbon-Coated Aluminum Foil | NK1133 | Genel Endüstriyel Kullanım | |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1134 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1135 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Chromium (Cr) Sputtering Targets | NK1136 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Silver (Ag) Sputtering Targets | NK1137 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Nickel Iron (Ni-Fe) Sputtering Targets | NK1138 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Magnesium (Mg) Sputtering Targets | NK1139 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Tungsten (W) Sputtering Targets | NK1140 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Magnesium (Mg) Sputtering Targets | NK1141 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1142 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1143 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Praseodymium (Pr) Sputtering Targets | NK1144 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Antimony (Sb) Sputtering Targets | NK1145 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Strong Graphene Aerogel | NK1146 | Elektronik, Batarya Elektrotları, Sensörler | Diameter: 1.2±0.1 cm, Height: 1.2±0.1 cm |
| Carbon Nanotubes(CNT) Modified Graphene Aerogel | NK1147 | Elektronik, Batarya Elektrotları, Sensörler | Diameter: 1.2±0.1cm, Height: 1.2±0.1cm |
| Permalloy (Ni-Fe-Mo) Sputtering Targets | NK1148 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 0.125” |
| Magnesium (Mg) Sputtering Targets | NK1149 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Tantalum (Ta) Sputtering Targets | NK1150 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK1151 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 3”, Thickness: 0.250” |
| Prime Si+SiO2 Wafer (wet) | NK1152 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (111), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 381 ± 25 μm, Coating 500 nm |
| Magnesium (Mg) Sputtering Targets | NK1153 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 2”, Thickness: 0.250” |
| Hydrothermal Synthesis Autoclave Reactor with PPL Lined Vessel 100 ml | NK1154 | Genel Endüstriyel Kullanım | |
| Nickel Foam for Battery Cathode Substrate | NK1155 | Genel Endüstriyel Kullanım | Size: 1000 mm x 300 mm x 1.6 mm |
| Antimony (Sb) Sputtering Targets | NK1156 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Large Inner Diameter Thin Multi-Wall Carbon Nanotubes | NK1157 | Genel Endüstriyel Kullanım | Purity: > 92%, OD: 28-58 nm, ID: 18-48 nm |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1158 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 4”, Thickness: 0.250” |
| Prime Si+SiO2 Wafer (dry) | NK1159 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 200 nm |
| Prime Si+SiO2 Wafer (wet) | NK1160 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 2-Side Polished, Thickness: 500 ± 15 μm, Coating 300 nm |
| Prime CZ-Si Wafer | NK1161 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Phosphor Doped, Resistivity: 0.05 – 0.152 (ohm.cm), 2-Side Polished, Thickness: 365 ± 15 μm |
| Prime Si+SiO2 Wafer (wet) | NK1162 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 300 nm |
| Prime Si+SiO2 Wafer (wet) | NK1163 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 400 nm |
| Mesocarbon Microbeads (MCMB) Graphite Micron Powder for Lithium Ion Battery | NK1164 | Genel Endüstriyel Kullanım | |
| Fused Silica Wafer | NK1165 | Genel Endüstriyel Kullanım | Size: 4”, 2-Side Polished, Thickness: 1000 ± 25 μm |
| Fused Silica Wafer | NK1166 | Genel Endüstriyel Kullanım | Size: 10mm x 20mm, 2-Side Polished, Thickness: 500 ± 00 μm, |
| Magnesium (Mg) Sputtering Targets | NK1167 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 3”, Thickness: 0.125” |
| Zinc (Zn) Sputtering Targets | NK1168 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Erbium Oxide (Er2O3) Sputtering Targets | NK1169 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| (-COOH) Functionalized Short Length Single Walled Carbon Nanotubes | NK1170 | Genel Endüstriyel Kullanım | Purity: > 92% |
| CR2032 Coin Cell Cases with 316SS | NK1171 | Genel Endüstriyel Kullanım | Diameter: 20 mm, Height: 3.2 mm |
| Prime CZ-Si Wafer | NK1172 | Genel Endüstriyel Kullanım | Size: 6”, Orientation: (111), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 625±25um |
| Silver (Ag) Nanopowder/Nanoparticles Dispersion | NK1173 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 14 nm, 52000 ppm |
| Carbon (C) (Graphite) Sputtering Targets | NK1174 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1175 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 5”, Thickness: 0.250” |
| Aluminum (Al) Sputtering Targets | NK1176 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK1177 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Erbium Oxide (Er2O3) Sputtering Targets | NK1178 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Copper (Cu) Sputtering Targets | NK1179 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Short Length Double Walled Carbon Nanotubes | NK1180 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Single Walled Carbon Nanotubes | NK1181 | Genel Endüstriyel Kullanım | Purity: > 96%, Dia: 1.0 nm |
| Carbon (C) (Graphite) Sputtering Targets | NK1182 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Zinc (Zn) Sputtering Targets | NK1183 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Carbon Nanotubes Metal Tapes with Copper (Cu) 13 wt% | NK1184 | Genel Endüstriyel Kullanım | Thickness: 22 µm, Dia: 47 mm |
| Barium (Ba) Sputtering Targets | NK1185 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 1”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK1186 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Barium (Ba) Sputtering Targets | NK1187 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 1”, Thickness: 0.250” |
| Carbon Nanotubes Metal Films with Copper (Cu) 14 wt% | NK1188 | Genel Endüstriyel Kullanım | Thickness: 18 µm, Dia: 47 mm |
| Aluminum (Al) Sputtering Targets | NK1189 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Magnesium (Mg) Sputtering Targets | NK1190 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Erbium Oxide (Er2O3) Sputtering Targets | NK1191 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1192 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Molybdenum (Mo) Sputtering Targets | NK1193 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Prime CZ-Si Wafer | NK1194 | Genel Endüstriyel Kullanım | Size: 6”, Orientation: (100), Phosphor Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 500±25um |
| Nickel Iron (Ni-Fe) Sputtering Targets | NK1195 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Chromium (Cr) Nanopowder/Nanoparticles | NK1196 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 30-40 nm, Metal Basis |
| Magnesium (Mg) Sputtering Targets | NK1197 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 3”, Thickness: 0.250” |
| Magnetic Fe2O3@SiO2 powder | NK1198 | Genel Endüstriyel Kullanım | Size: 250 nm, Core size: 45 nm, Shell size: 205 nm, Positively-charged |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1199 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Carbon (C) (Graphite) Sputtering Targets | NK1200 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Prime CZ-Si Wafer | NK1201 | Genel Endüstriyel Kullanım | Size: 6”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 1-Side Polished, Thickness: 525±25um |
| Indium Oxide (In2O3) Sputtering Targets | NK1202 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Prime Si+SiO2 Wafer (dry) | NK1203 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 -10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 100 nm |
| Bismuth (Bi) Sputtering Targets | NK1204 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Nickel Vanadium (NiV) Sputtering Targets | NK1205 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1206 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 1”, Thickness: 0.125”, Dark Gray to Black |
| Borosilicate Wafer | NK1207 | Genel Endüstriyel Kullanım | Size: 4”, 2-Side polished, Thickness: 500 ± 20 μm |
| Graphite Plate | NK1208 | Genel Endüstriyel Kullanım | Purity: 99.99%, D: 100mm x 20mm |
| Zinc Sulfide (ZnS) Sputtering Targets | NK1209 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Prime FZ-Si Wafer | NK1210 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 2000 – 4000 (ohm.cm), 1-Side Polished, Thickness: 300 ± 10 μm |
| Magnetic Fe2O3@SiO2 powder | NK1211 | Genel Endüstriyel Kullanım | Size: 250 nm, Core size: 45 nm, Shell size: 205 nm, Negatively-charged |
| Magnetic Fe3O4@SiO2 powder | NK1212 | Genel Endüstriyel Kullanım | Size: 250 nm, Core size: 45 nm, Shell size: 205 nm, Positively-charged |
| Tin (Sn) Sputtering Targets | NK1213 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1214 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, indium, Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Magnesium (Mg) Sputtering Targets | NK1215 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 4”, Thickness: 0.125” |
| Platinum Foil | NK1216 | Genel Endüstriyel Kullanım | Purity 99.95%, Thickness: 0.5mm, 1×1 cm |
| Magnetic Fe3O4@SiO2 powder | NK1217 | Genel Endüstriyel Kullanım | Size: 250 nm, Core size: 45 nm, Shell size: 205 nm, Negatively-charged |
| Borosilicate Wafer | NK1218 | Genel Endüstriyel Kullanım | Size: 6”, 1-Side polished, Thickness: 700 ± 25 μm |
| Tungsten (W) Sputtering Targets | NK1219 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| 18650 Cylinder Cell Case | NK1220 | Genel Endüstriyel Kullanım | |
| Platinum Foil | NK1221 | Genel Endüstriyel Kullanım | Purity 99.95%, Thickness: 1 mm, 1×1 cm |
| Manganese (Mn) Sputtering Targets | NK1222 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| AZ31 Spherical Magnesium Alloy Powder | NK1223 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Size: 15-53 µm, Purity: > 95 % |
| PE Separator Film for Battery Applications Thickness: 12μm | NK1224 | Genel Endüstriyel Kullanım | Width: 60mm, Length: 500 m, 1 roll: 500 m |
| Iron Oxide (Fe3O4) Sputtering Targets | NK1225 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Titanium (Ti) Nanopowder/Nanoparticles | NK1226 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity:99.9+%, Size: 80-120 nm |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1227 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 6”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK1228 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 6”, Thickness: 0.250” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1229 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.9%, Size: 1”, Thickness: 0.125”, White to Gray |
| Permalloy (Ni-Fe-Mo) Sputtering Targets | NK1230 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 0.250” |
| CR2016 Coin Cell Cases with 316SS (Positive+Negative Cases) | NK1231 | Genel Endüstriyel Kullanım | Diameter: 20 mm, Height : 1.6 mm |
| Water-_17_.webp | NK1232 | Genel Endüstriyel Kullanım | |
| Hafnium Diboride Micron Powder | NK1233 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 1-3 μm |
| CR2450 Coin Cell Cases with 316SS (Positive+Negative Cases) | NK1234 | Genel Endüstriyel Kullanım | Diameter: 24 mm, Height : 5 mm |
| Chromium (Cr) Nanopowder/Nanoparticles | NK1235 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 100 nm, Metal Basis |
| Aluminum Silicon (AlSi) Sputtering Targets | NK1236 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK1237 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Aluminum (Al) Sputtering Targets | NK1238 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Tantalum (Ta) Sputtering Targets | NK1239 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Bismuth (Bi) Sputtering Targets | NK1240 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Borosilicate Wafer | NK1241 | Genel Endüstriyel Kullanım | Size: 4”, 2-Side polished, Thickness: 200 ± 20 μm |
| Aluminum (Al) Sputtering Targets | NK1242 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Borosilicate Wafer | NK1243 | Genel Endüstriyel Kullanım | Size: 6”, 2-Side polished, Thickness: 700 ± 20 μm |
| CR2325 Coin Cell Cases with 316SS (Positive+Negative Cases) | NK1244 | Genel Endüstriyel Kullanım | Diameter: 23 mm, Height : 2.5 mm |
| Prime CZ-Si Wafer | NK1245 | Genel Endüstriyel Kullanım | Size: 8”, Orientation: (100), Phospor Doped, Resistivity: 0.001-0.005 (ohm.cm), 1-Side Polished, Thickness: 725 ± 20 μm |
| Magnesium (Mg) Sputtering Targets | NK1246 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1247 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 1”, Thickness: 0.125”, Grey to Black |
| Nickel (Ni) Sputtering Targets | NK1248 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Iron (Fe) Sputtering Targets | NK1249 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Nickel Titanium (Ni-Ti) Alloy Nanopowder/Nanoparticles | NK1250 | Seramik, Yarı İletken, Kimyasal Endüstri | Size: 55 nm, Ni:Ti/50:50 |
| (-COOH) Functionalized Double Walled Carbon Nanotubes | NK1251 | Genel Endüstriyel Kullanım | Purity: > 65% |
| Nickel Vanadium (NiV) Sputtering Targets | NK1252 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Cobalt (Co) Sputtering Targets | NK1253 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| 18650 Nickel Strip for Battery Tab | NK1254 | Genel Endüstriyel Kullanım | Width: 4 mm, Thickness: 0.1 mm, 1 Roll: 1 kg |
| Prime Si+Si3N4 Wafer | NK1255 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 381± 25 μm, Coating 150 nm |
| Carbon Nanotubes Highly Conductive Films | NK1256 | Genel Endüstriyel Kullanım | Thickness: 10-20 µm, Dia: 120-130 mm |
| Magnetic Fe2O3@SiO2 powder | NK1257 | Genel Endüstriyel Kullanım | Size: 150 nm, Core size: 22 nm, Shell size: 128 nm, Positively-charged |
| Magnetic Fe2O3@SiO2 powder | NK1258 | Genel Endüstriyel Kullanım | Size: 150 nm, Core size: 22 nm, Shell size: 128 nm, Negatively-charged |
| Prime Si+SiO2 Wafer (wet) | NK1259 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (111), Phosphor Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 1000 nm |
| Vanadium (V) Micron Powder | NK1260 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 325 mesh |
| Borosilicate Wafer | NK1261 | Genel Endüstriyel Kullanım | Size: 6”, 2- Side polished, Thickness: 1100 ± 20 μm |
| Lithium Cobalt Oxide (LiCoO2) Powder for Li-ion Battery Cathode Application | NK1262 | Genel Endüstriyel Kullanım | |
| Prime Si+Si3N4 Wafer | NK1263 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 380± 15 μm, Coating 150 nm |
| High Quality Natural Agate Mortar and Pestle | NK1264 | Genel Endüstriyel Kullanım | Size: 4″ |
| Magnesium (Mg) Sputtering Targets | NK1265 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 4”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1266 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Magnetic Fe3O4@SiO2 powder | NK1267 | Genel Endüstriyel Kullanım | Size: 150 nm, Core size: 22 nm, Shell size: 128 nm, Positively-charged |
| Nickel (Ni) Sputtering Targets | NK1268 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Aluminum Silicon (AlSi) Sputtering Targets | NK1269 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Bismuth (Bi) Sputtering Targets | NK1270 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1271 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 6”, Thickness: 0.250” |
| Indium Oxide (In2O3) Sputtering Targets | NK1272 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1273 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Magnetic Fe3O4@SiO2 powder | NK1274 | Genel Endüstriyel Kullanım | Size: 150 nm, Core size: 22 nm, Shell size: 128 nm, Negatively-charged |
| Silver (Ag) Sputtering Targets | NK1275 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Copper (Cu) Sputtering Targets | NK1276 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 7”, Thickness: 0.125” |
| Bismuth (Bi) Sputtering Targets | NK1277 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1278 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, Purity: 99.995%, Size: 8”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1279 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Tantalum (Ta) Sputtering Targets | NK1280 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Prime Si+SiO2 Wafer (wet) | NK1281 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1 – 10 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 1500 nm |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1282 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1283 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Nickel Iron (Ni-Fe) Sputtering Targets | NK1284 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Selenium (Se) Sputtering Targets | NK1285 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Aluminum (Al) Sputtering Targets | NK1286 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 8”, Thickness: 0.125” |
| Magnetic Graphene Aerogel | NK1287 | Elektronik, Batarya Elektrotları, Sensörler | Content of Fe3O4: 65%, Diameter: 2±0.4 cm |
| Magnetic Graphene Aerogel | NK1288 | Elektronik, Batarya Elektrotları, Sensörler | Content of Fe3O4: 50%, Diameter: 2±0.4 cm |
| Lutetium Oxide (Lu2O3) Micron Powder | NK1289 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 325 mesh |
| Magnetic Fe2O3@SiO2 powder | NK1290 | Genel Endüstriyel Kullanım | Size: 100 nm, Core size: 30 nm, Shell size: 70 nm, Positively-charged |
| Bismuth (Bi) Sputtering Targets | NK1291 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Ultralight Graphene Aerogel | NK1292 | Elektronik, Batarya Elektrotları, Sensörler | Diameter: 2±0.4 cm, Height: 2±0.4 cm |
| Indium (In) Sputtering Targets | NK1293 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Lithium Titanate (Li2TiO3) Sputtering Targets | NK1294 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1295 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK1296 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 8”, Thickness: 0.250” |
| Aluminum (Al) Sputtering Targets | NK1297 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 6”, Thickness: 0.125” |
| Aluminum Foil for Battery Cathode Substrate | NK1298 | Genel Endüstriyel Kullanım | Size: 350 m*280 mm*15 µm |
| Indium (In) Sputtering Targets | NK1299 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Graphene Sample Pack (Includes 9 products) | NK1300 | Elektronik, Batarya Elektrotları, Sensörler | |
| Magnetic Fe3O4@SiO2 powder | NK1301 | Genel Endüstriyel Kullanım | Size: 100 nm, Core size: 30 nm, Shell size: 70 nm, Positively-charged |
| Magnetic Fe2O3@SiO2 powder | NK1302 | Genel Endüstriyel Kullanım | Size: 100 nm, Core size: 30 nm, Shell size: 70 nm, Negatively-charged |
| Prime Si+SiO2 Wafer (wet) | NK1303 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 0.001 – 0.01 (ohm.cm), 1-Side Polished, Thickness: 525 ± 25 μm, Coating 500 nm |
| Tungsten Titanium (TiW) Sputtering Targets | NK1304 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1305 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 1”, Thickness: 0.250”, Dark Gray to Black |
| Silicon (Si) Sputtering Targets | NK1306 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Titanium (Ti) Nanopowder/Nanoparticles | NK1307 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9+%, Size: 30-80 nm |
| Nickel Vanadium (NiV) Sputtering Targets | NK1308 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1309 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Copper (Cu) Sputtering Targets | NK1310 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Magnetic Fe3O4@SiO2 powder | NK1311 | Genel Endüstriyel Kullanım | Size: 100 nm, Core size: 30 nm, Shell size: 70 nm, Negatively-charged |
| Prime Si+Si3N4 Wafer | NK1312 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 525± 25 μm, Coating 70 nm |
| Copper (Cu) Sputtering Targets | NK1313 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 6”, Thickness: 0.250” |
| Multi Walled Carbon Nanotubes N-butanol Dispersion | NK1314 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 96%, OD: 18-28 nm, Length: 8-18 µm |
| Carbon Nanotubes(CNT) Modified Graphene Aerogel | NK1315 | Elektronik, Batarya Elektrotları, Sensörler | Diameter: 2±0.4 cm, Height: 2±0.4 cm |
| Praseodymium (Pr) Sputtering Targets | NK1316 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Boron (B) Sputtering Targets | NK1317 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Bismuth (Bi) Sputtering Targets | NK1318 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Tungsten (W) Nanopowder/Nanoparticles | NK1319 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 35-55 nm, Metal Basis |
| Copper Tin (Cu-Sn) Alloy Nanopowder/Nanoparticles | NK1320 | Genel Endüstriyel Kullanım | Size: 35-95 nm, Sn:Cu/92:8 |
| Tungsten (W) Sputtering Targets | NK1321 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Copper Tin (Cu-Sn) Alloy Nanopowder/Nanoparticles | NK1322 | Genel Endüstriyel Kullanım | Size: 35-95 nm, Sn:Cu/1:9 |
| Magnesium (Mg) Sputtering Targets | NK1323 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 5”, Thickness: 0.125” |
| Zinc (Zn) Sputtering Targets | NK1324 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Yttrium (Y) Sputtering Targets | NK1325 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK1326 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 4”, Thickness: 0.125” |
| Multi Walled Carbon Nanotubes Ethanol Dispersion | NK1327 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 96 %, OD: 45-75 nm, Length 8-28 µm |
| Magnetic Fe2O3@SiO2 powder | NK1328 | Genel Endüstriyel Kullanım | Size: 50 nm, Core size: 20 nm, Shell size: 30 nm, Positively-charged |
| Prime Si+Si3N4 Wafer | NK1329 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 525± 25 μm, Coating 150 nm |
| Lithium Titanate (Li2TiO3) Sputtering Targets | NK1330 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1331 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 1”, Thickness: 0.250”, Grey to Black |
| Vanadium (V) Sputtering Targets | NK1332 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1333 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1334 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.9%, Size: 1”, Thickness: 0.250”, White to Gray |
| Silicon (Si) Nanopowder/Nanoparticles | NK1335 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 97+%, Size: 25-35 nm, Oxygen Content: < 3% |
| Magnetic Fe3O4@SiO2 powder | NK1336 | Genel Endüstriyel Kullanım | Size: 50 nm, Core size: 20 nm, Shell size: 30 nm, Positively-charged |
| Ãrün-Görselleri-_6_.webp | NK1337 | Genel Endüstriyel Kullanım | |
| Holey Super Graphene | NK1338 | Elektronik, Batarya Elektrotları, Sensörler | |
| Copper (Cu) Sputtering Targets | NK1339 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK1340 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Magnetic Fe2O3@SiO2 powder | NK1341 | Genel Endüstriyel Kullanım | Size: 50 nm, Core size: 20 nm, Shell size: 30 nm, Negatively-charged |
| Cobalt Acetate (C4H6CoO4) | NK1342 | Genel Endüstriyel Kullanım | Purity: > 98% |
| Nickel Vanadium (NiV) Sputtering Targets | NK1343 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Bismuth (Bi) Sputtering Targets | NK1344 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1345 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Magnetic Fe3O4@SiO2 powder | NK1346 | Genel Endüstriyel Kullanım | Size: 50 nm, Core size: 20 nm, Shell size: 30 nm, Negatively-charged |
| Lead (Pb) Sputtering Targets | NK1347 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 3”, Thickness: 0.125” |
| Gadolinium (Gd) Micron Powder | NK1348 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Molybdenum (Mo) Sputtering Targets | NK1349 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Selenium (Se) Sputtering Targets | NK1350 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK1351 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.250” |
| Fused Silica Wafer | NK1352 | Genel Endüstriyel Kullanım | Size: 4”, 2-Side Polished, Thickness: 500 ± 25 μm |
| Fused Silica Wafer | NK1353 | Genel Endüstriyel Kullanım | Size: 6”, 2-Side Polished, Thickness: 700 ± 25 μm |
| Prime Si+Si3N4 Wafer | NK1354 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 381± 25 μm, Coating 300 nm |
| Prime FZ-Si Wafer | NK1355 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (111), None Doped, Resistivity: 10000 – 100000 (ohm.cm), 2-Side Polished, Thickness: 300 ± 20 μm |
| Carbon Nanotube Fibres | NK1356 | Genel Endüstriyel Kullanım | Fiber diameter: 60-80 µm, Tensile Strength: 310-500 MPa, Electrical conductivity: 1×10^5~2×10^5 S/m |
| Selenium (Se) Sputtering Targets | NK1357 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Vanadium (V) Sputtering Targets | NK1358 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Aluminum (Al) Sputtering Targets | NK1359 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Iron Nickel Cobalt (Fe-Ni-Co) Alloy Nanopowder/Nanoparticles | NK1360 | Genel Endüstriyel Kullanım | Size: 35-95 nm, Fe:Ni:Co/55:28:17 |
| Impending Self-Help Transfer Nickel Graphene Foam | NK1361 | Elektronik, Batarya Elektrotları, Sensörler | Thickness: 1±0.1 mm, Size: 2×2 cm |
| Barium (Ba) Sputtering Targets | NK1362 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Barium (Ba) Sputtering Targets | NK1363 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1364 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Permalloy (Ni-Fe-Mo) Sputtering Targets | NK1365 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 0.250” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK1366 | Genel Endüstriyel Kullanım | Purity: 99.8%-99.9%, Size: 1”, Thickness: 0.125” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1367 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Molybdenum Aluminum Boride (MoAlB) Max Phase Powder | NK1368 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: 200 mesh |
| Magnetic Fe2O3@SiO2 powder | NK1369 | Genel Endüstriyel Kullanım | Size: 20 nm, Core size: 12 nm, Shell size: 8 nm, Positively-charged |
| Prime Si+SiO2 Wafer (dry) | NK1370 | Genel Endüstriyel Kullanım | Size: 6”, Orientation: (100), Boron Doped, Resistivity: 1 – 10 (ohm.cm), 2-Side Polished, Thickness: 675 ± 15 μm, Coating 200 nm |
| Prime FZ-Si Wafer | NK1371 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), None Doped, Resistivity: 1000 – 10000 (ohm.cm), 2-Side Polished, Thickness: 500 ± 25 μm |
| Strong Graphene Aerogel | NK1372 | Elektronik, Batarya Elektrotları, Sensörler | Diameter: 2±0.4 cm, Height: 2±0.4 cm |
| Vanadium (V) Micron Powder | NK1373 | Genel Endüstriyel Kullanım | Purity: 99.9 %, Size: 100 mesh |
| Flash-Ignited Multi-Walled Carbon Nanotubes | NK1374 | Genel Endüstriyel Kullanım | MWCNTs: 48 wt%, Fe Nanoparticles: 23 wt%, Amorphous Carbon: 23 wt% |
| Aluminum Laminated Film | NK1375 | Genel Endüstriyel Kullanım | Width: 400 mm, Length: 7.5 m |
| Zinc Sulfide (ZnS) Sputtering Targets | NK1376 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK1377 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1378 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1379 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Magnetic Fe2O3@SiO2 powder | NK1380 | Genel Endüstriyel Kullanım | Size: 20 nm, Core size: 12 nm, Shell size: 8 nm, Negatively-charged |
| Nickel(II) Nitrate Hexahydrate (Ni(NO₃)₂*6H₂O) | NK1381 | Genel Endüstriyel Kullanım | Purity: > 98% |
| Silver (Ag) Nanopowder/Nanoparticles Water Dispersion | NK1382 | Genel Endüstriyel Kullanım | Size: 15 nm, Tawny Color, 55.000 ppm |
| Magnetic Fe3O4@SiO2 powder | NK1383 | Genel Endüstriyel Kullanım | Size: 20 nm, Core size: 12 nm, Shell size: 8 nm, Negatively-charged |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK1384 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK1385 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK1386 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Molybdenum (Mo) Sputtering Targets | NK1387 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK1388 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1389 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Tin (Sn) Sputtering Targets | NK1390 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Lead (Pb) Sputtering Targets | NK1391 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 4”, Thickness: 0.125” |
| Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets | NK1392 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Nanopowder/Nanoparticles Dispersion in 2-Propanol | NK1393 | Genel Endüstriyel Kullanım | Gamma, Size: 12 nm, 12 wt% |
| Prime FZ-Si Wafer | NK1394 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Phosphor Doped, Resistivity: 3000 – 100000 (ohm.cm), 2-Side Polished, Thickness: 200 ± 10 μm |
| Prime FZ-Si Wafer | NK1395 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Phosphor Doped, Resistivity: 5000 – 500000 (ohm.cm), 2-Side Polished, Thickness: 300 ± 10 μm |
| Antimony (Sb) Sputtering Targets | NK1396 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Boron Oxide (B2O3) Nanopowder/Nanoparticles | NK1397 | Genel Endüstriyel Kullanım | Purity: 99.95 %, Size: 50 nm |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK1398 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Polyhydroxylated Fullerene (Fullerenols)/ C60 | NK1399 | Genel Endüstriyel Kullanım | (-OH) Functionalized, Dispersed in Water, 80 ppm Dry powder |
| Silicon (Si) Sputtering Targets | NK1400 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Hand-Held Disc Cutter with Ring Cutting Dies | NK1401 | Genel Endüstriyel Kullanım | ID: 8, 15, 18, 20 mm |
| Manganese (Mn) Sputtering Targets | NK1402 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Aluminum Nickel Composite Strip for Battery Tab | NK1403 | Genel Endüstriyel Kullanım | Width: 4 mm, Thickness: 0.1 mm, 1Roll: 1 kg |
| Tungsten (W) Sputtering Targets | NK1404 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1405 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Cobalt (Co) Nanopowder/Nanoparticles | NK1406 | Genel Endüstriyel Kullanım | Purity: 99.85%, Size: 28 nm, Carbon Coated |
| Prime Si+Si3N4 Wafer | NK1407 | Genel Endüstriyel Kullanım | Size: 4”, Orientation: (100), Arsenic Doped, Resistivity: 0, 001-0, 005 (ohm.cm), 1 Side Polished, Thickness: 525± 25 μm, Coating 450 nm |
| Prime FZ-Si Wafer | NK1408 | Genel Endüstriyel Kullanım | Size: 3”, Orientation: (100), None Doped, Resistivity: 10000 – 100000 (ohm.cm), 2-Side Polished, Thickness: 380 ± 25 μm |
| Multi Walled Carbon Nanotubes Ethanol Dispersion | NK1409 | Genel Endüstriyel Kullanım | 3 wt%, Purity: > 95%, OD: 18-28 nm, Length: 8-28 µm |
| Selenium (Se) Sputtering Targets | NK1410 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Germanium (Ge) Sputtering Targets | NK1411 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Carbon Nanotubes Highly Conductive Films with Metal 8% | NK1412 | Genel Endüstriyel Kullanım | Thickness: 18 µm, Dia: 47 mm |
| Multi Walled Carbon Nanotubes N-butanol Dispersion | NK1413 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 95%, OD: 8-16 nm, Length: 45 µm |
| Multi Walled Carbon Nanotubes Ethanol Dispersion | NK1414 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 96%, OD: 3-13 nm, Length: 45 µm |
| Carbon Nanotubes Metal Films with Nickel (Ni) 12 wt% | NK1415 | Genel Endüstriyel Kullanım | Thickness: 18 µm, Dia: 47 mm |
| Multi Walled Carbon Nanotubes Isopropanol Dispersion | NK1416 | Genel Endüstriyel Kullanım | 4wt%, Purity: > 96%, OD: 4-12 nm, Length: 55 µm |
| Multi Walled Carbon Nanotubes N-Methyl-2-Pyrrolidinone Dispersion | NK1417 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 96%, OD: 4-13 nm, Length: 45 µm |
| Multi Walled Carbon Nanotubes Isopropanol Dispersion | NK1418 | Genel Endüstriyel Kullanım | 4 wt%, Purity: > 95%, OD: 18-35 nm, Length: 8-18 µm |
| Nickel Iron (Ni-Fe) Sputtering Targets | NK1419 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size:3”, Thickness: 0.250” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK1420 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1421 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, indium, Purity: 99.995%, Size: 1”, Thickness: 0.125” |
| Boron Nitride (BN) Sputtering Targets | NK1422 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 1”, Thickness: 0.125” |
| Tungsten Titanium (TiW) Sputtering Targets | NK1423 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Praseodymium (Pr) Sputtering Targets | NK1424 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK1425 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 4”, Thickness: 0.250” |
| Boron Doped Graphene Nanopowder (B/G) | NK1426 | Elektronik, Batarya Elektrotları, Sensörler | |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK1427 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Titanium Boride (TiB2) Sputtering Targets | NK1428 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 1”, Thickness: 0.250” |
| Quartz Wafer | NK1429 | Genel Endüstriyel Kullanım | (AT-Cut), Size: 4”, 2-Side Polished, Thickness: 500 ± 25 μm |
| Quartz Wafer | NK1430 | Genel Endüstriyel Kullanım | (ST-Cut), Size: 4”, 1-Side Polished, Thickness: 625 ± 25 μm |
| Carbon Nanotube Wire | NK1431 | Genel Endüstriyel Kullanım | Diameter: 30-50 μm, Hardness: 1.0-1.5 GPa |
| Molybdenum (Mo) Sputtering Targets | NK1432 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Quartz Wafer | NK1433 | Genel Endüstriyel Kullanım | (X-Cut), Size: 4”, 2-Side Polished, Thickness: 300 ± 25 μm |
| Copper Tin (Cu-Sn) Alloy Nanopowder/Nanoparticles | NK1434 | Genel Endüstriyel Kullanım | Size: 35-95 nm, Sn:Cu/9:1 |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1435 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1436 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Selenium (Se) Sputtering Targets | NK1437 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Boron (B) Sputtering Targets | NK1438 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Bismuth (Bi) Sputtering Targets | NK1439 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Lead (Pb) Sputtering Targets | NK1440 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 3”, Thickness: 0.250” |
| Titanium Nitride (TiN) Sputtering Targets | NK1441 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 1”, Thickness: 0.125” |
| Indium (In) Sputtering Targets | NK1442 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK1443 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1444 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Tin (Sn) Sputtering Targets | NK1445 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Antimony (Sb) Sputtering Targets | NK1446 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK1447 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK1448 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Zinc Sulfide (ZnS) Sputtering Targets | NK1449 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Carbon (C) Sputtering Targets | NK1450 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Copper (Cu) Sputtering Targets | NK1451 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK1452 | Genel Endüstriyel Kullanım | Purity: 99.8%-99.9%, Size: 1”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK1453 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK1454 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Germanium (Ge) Sputtering Targets | NK1455 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Permalloy (Ni-Fe-Mo) Sputtering Targets | NK1456 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 0.125” |
| Water-_20_.webp | NK1457 | Genel Endüstriyel Kullanım | |
| Diamond (C) Nanopowder/Nanoparticles | NK1458 | Genel Endüstriyel Kullanım | Purity: 99%, Size: 10 nm |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1459 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK1460 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1461 | Elektronik, Yarı İletkenler, Optik Malzemeler | undoped, Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Lead (Pb) Sputtering Targets | NK1462 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 4”, Thickness: 0.250” |
| Zinc (Zn) Sputtering Targets | NK1463 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1464 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 2”, Thickness: 0.125”, Grey to Black |
| Germanium (Ge) Micron Powder | NK1465 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 100 mesh |
| Copper (Cu) Sputtering Targets | NK1466 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.250” |
| Magnesium (Mg) Micron Powder | NK1467 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 0-200 µm |
| Bismuth (Bi) Sputtering Targets | NK1468 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1469 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK1470 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1471 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Boron Nitride (BN) Sputtering Targets | NK1472 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 1”, Thickness: 0.250” |
| Carbon (C) Sputtering Targets | NK1473 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Tungsten Titanium (TiW) Sputtering Targets | NK1474 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| High Purity Atomized Spherical Magnesium (Mg) Powder NGW120 | NK1475 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1476 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Aluminum Laminated Film for Pouch Cell Case | NK1477 | Genel Endüstriyel Kullanım | |
| Nickel Vanadium (NiV) Sputtering Targets | NK1478 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1479 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| PTFE Separator Film for Battery Applications Thickness: 50μm | NK1480 | Genel Endüstriyel Kullanım | Width: 60mm, Length: 600 m, 1 roll: 600 m |
| Boron (B) Sputtering Targets | NK1481 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1482 | Elektronik, Yarı İletkenler, Optik Malzemeler | undoped, Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Carbon Nanotube Sponges | NK1483 | Genel Endüstriyel Kullanım | Size: 20 mm x 20 mm, Thickness: 1-2 mm |
| Tin (Sn) Sputtering Targets | NK1484 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1485 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Polyhydroxylated Fullerene (Fullerenols)/ C60 | NK1486 | Genel Endüstriyel Kullanım | (-OH) Functionalized, Dispersed in Water, 130 ppm Dry powder |
| Li-Ion Battery Separator Film | NK1487 | Genel Endüstriyel Kullanım | Thickness: 25 μm, Width: 60 mm, Length: 500 m, 1 Roll: 500 m |
| Copper Zinc (Cu-Zn) Alloy Nanopowder/Nanoparticles | NK1488 | Genel Endüstriyel Kullanım | Size: 35-95 nm, Cu:Zn/6:4 |
| Iron Nickel (Fe-Ni) Alloy Nanopowder/Nanoparticles | NK1489 | Genel Endüstriyel Kullanım | Size: 30-90 nm, Fe:Ni/5:5 |
| Copper Zinc (Cu-Zn) Alloy Nanopowder/Nanoparticles | NK1490 | Genel Endüstriyel Kullanım | Size: 35-95 nm, Cu:Zn/5:5 |
| Chromium (Cr) Sputtering Targets | NK1491 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Magnesium (Mg) Micron Powder | NK1492 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 0-100 µm |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK1493 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Zinc (Zn) Sputtering Targets | NK1494 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Germanium (Ge) Micron Powder | NK1495 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 5 µm |
| High Purity Atomized Spherical Magnesium (Mg) Powder NGW60 | NK1496 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | |
| Fullerene-C60 | NK1497 | Genel Endüstriyel Kullanım | Purity: 95% |
| Nickel (Ni) Sputtering Targets | NK1498 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Permalloy (Ni-Fe-Mo) Sputtering Targets | NK1499 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 0.125” |
| Aluminum Nitride (AlN) Sputtering Targets | NK1500 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size: 1”, Thickness: 0.125” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1501 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, indium, Purity: 99.995%, Size: 2”, Thickness: 0.125” |
| Indium (In) Sputtering Targets | NK1502 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Vanadium (V) Sputtering Targets | NK1503 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Zinc (Zn) Sputtering Targets | NK1504 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Antimony (Sb) Sputtering Targets | NK1505 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Indium (In) Sputtering Targets | NK1506 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Nickel Vanadium (NiV) Sputtering Targets | NK1507 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1508 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK1509 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1510 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Silver (Ag) Sputtering Targets | NK1511 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Silver (Ag) Sputtering Targets | NK1512 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK1513 | Genel Endüstriyel Kullanım | Purity: 99.8%-99.9%, Size: 2”, Thickness: 0.125” |
| Carbon Nanotube Sponges | NK1514 | Genel Endüstriyel Kullanım | Size: 50 mm x 10 mm, Thickness: 1-2 mm |
| Carbon Nanotube Fibres | NK1515 | Genel Endüstriyel Kullanım | Fiber diameter: 5-12 µm, Tensile Strength: 800-1000 MPa, Electrical conductivity: 5×10^4~7×10^4 S/m |
| Silicon (Si) Sputtering Targets | NK1516 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 8”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK1517 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Carbon Nanotube Wire | NK1518 | Genel Endüstriyel Kullanım | Diameter: 60-100 μm, Hardness: 350-500 MPa |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1519 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK1520 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1521 | Elektronik, Yarı İletkenler, Optik Malzemeler | undoped, Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1522 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Tungsten Titanium (TiW) Sputtering Targets | NK1523 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1524 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1525 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Carbon Nanotube Wire | NK1526 | Genel Endüstriyel Kullanım | Diameter: 120-150 μm, Hardness: 350-500 MPa |
| Iron (II) Acetate Fe(C2H3O2)2 | NK1527 | Genel Endüstriyel Kullanım | Purity: > 95% |
| Nickel Foil | NK1528 | Genel Endüstriyel Kullanım | Purity: 99.9+% , Thickness: 0.03mm, Width: 100mm |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK1529 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Indium (In) Micron Powder | NK1530 | Genel Endüstriyel Kullanım | Purity:99.99%, APS:1-5 µm, Spherical |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1531 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1532 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 5”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1533 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1534 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Iron Chromium Cobalt (Fe-Cr-Co) Alloy Nanopowder/Nanoparticles | NK1535 | Genel Endüstriyel Kullanım | Size: 35-95 nm, Fe:Cr:Co/64:25:11 |
| Nickel (Ni) Sputtering Targets | NK1536 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1537 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 8”, Thickness: 0.250” |
| Nickel Iron (Ni-Fe) Sputtering Targets | NK1538 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size:4”, Thickness: 0.125” |
| Aluminum (Al) Nanopowder/Nanoparticles | NK1539 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 18 nm, Laser Synthesized |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1540 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 2”, Thickness: 0.250”, Grey to Black |
| Tantalum (Ta) Sputtering Targets | NK1541 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1542 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Tantalum Oxide (Ta2O5) Sputtering Targets | NK1543 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Titanium Nitride (TiN) Sputtering Targets | NK1544 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 1”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK1545 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 8”, Thickness: 0.125” |
| Tantalum (Ta) Sputtering Targets | NK1546 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Boron Nitride (BN) Sputtering Targets | NK1547 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets | NK1548 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1549 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1550 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 2”, Thickness: 0.125”, Dark Gray to Black |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1551 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK1552 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Yttrium (Y) Sputtering Targets | NK1553 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Zinc (Zn) Sputtering Targets | NK1554 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK1555 | Pigment, Manyetik Malzemeler, Katalizörler | indium, Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1556 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Carbon Nanotube Sponges | NK1557 | Genel Endüstriyel Kullanım | Size: 20 mm x 20 mm, Thickness: 3-4 mm |
| Borosilicate Wafer | NK1558 | Genel Endüstriyel Kullanım | Size: 8”, 2-Side Polished, Thickness: 1250 ± 25 μm |
| Silicon Carbide (SiC) Sputtering Targets | NK1559 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 1”, Thickness: 0.125” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1560 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Tantalum Oxide (Ta2O5) Sputtering Targets | NK1561 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Tungsten (W) Sputtering Targets | NK1562 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK1563 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Manganese (Mn) Sputtering Targets | NK1564 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK1565 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Fullerene-C60 | NK1566 | Genel Endüstriyel Kullanım | Purity: 98% |
| Tungsten Titanium (TiW) Sputtering Targets | NK1567 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Indium Phosphide (InP) Wafers | NK1568 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350± 25 μm, Orientation: 100, Single Side Polished, Testing Grade |
| Titanium Boride (TiB2) Sputtering Targets | NK1569 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1570 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 6”, Thickness: 0.125” |
| Nickel Foil | NK1571 | Genel Endüstriyel Kullanım | Purity: 99.9+% , Thickness: 0.08mm, Width: 100mm |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK1572 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1573 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 5”, Thickness: 0.250” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK1574 | Genel Endüstriyel Kullanım | Purity: 99.8%-99.9%, Size: 2”, Thickness: 0.250” |
| Cobalt (Co) Sputtering Targets | NK1575 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.125” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1576 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.9%, Size: 2”, Thickness: 0.125”, White to Gray |
| Silicon (Si) Sputtering Targets | NK1577 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 6”, Thickness: 0.250” |
| Cobalt Iron Boron (Co-Fe-B) Sputtering Targets | NK1578 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Prime Si+Si3N4 Wafer | NK1579 | Genel Endüstriyel Kullanım | Size: 4”, Orientaion: (100), Boron Doped, Resistivity: 1-10 (ohm.cm), 2 Side Polished, Thickness: 380± 15 μm, Coating 1000 nm |
| Silicon Carbide (SiC) Sputtering Targets | NK1580 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 1”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK1581 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1582 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| Permalloy (Ni-Fe-Mo) Sputtering Targets | NK1583 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 0.250” |
| Antimony (Sb) Sputtering Targets | NK1584 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1585 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Nickel Vanadium (NiV) Sputtering Targets | NK1586 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Chromium (Cr) Sputtering Targets | NK1587 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Chromium Aluminum Boride (Cr2AlB2) Max Phase Powder | NK1588 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: 200 mesh |
| Shape Memory Polymer NGM9020 | NK1589 | Genel Endüstriyel Kullanım | Ether Type |
| Platinum (Pt) Nanopowder/Nanoparticles | NK1590 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 15 nm |
| Indium (In) Sputtering Targets | NK1591 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Copper-Carbon Nanotube Fibers Composite Wires | NK1592 | Genel Endüstriyel Kullanım | Cu-CNT, Diameter: 10-30 µm, Coating Thickness: 1 µm, Electrical conductivity: 1×10^7 S/m |
| Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets | NK1593 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK1594 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1595 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 6”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK1596 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 6”, Thickness: 0.125” |
| Antimony (Sb) Sputtering Targets | NK1597 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1598 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1599 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Vanadium (V) Sputtering Targets | NK1600 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1601 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Shape Memory Polymer NGM7520 | NK1602 | Genel Endüstriyel Kullanım | Ether Type |
| Fullerene-C60 | NK1603 | Genel Endüstriyel Kullanım | Purity: 99% |
| Shape Memory Polymer NGS2520 | NK1604 | Genel Endüstriyel Kullanım | Solution Type |
| Indium Phosphide (InP) Wafers | NK1605 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350±25 μm, Orientation: 100, Single Side Polished, EPI-Ready |
| High Purity Atomized Spherical Magnesium (Mg) Powder NGW40 | NK1606 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | |
| Tungsten Titanium (TiW) Sputtering Targets | NK1607 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Polyhydroxylated Fullerene (Fullerenols)/ C60 | NK1608 | Genel Endüstriyel Kullanım | (-OH) Functionalized, Dispersed in Water, 250 ppm Dry powder |
| Indium Phosphide (InP) Wafers | NK1609 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350± 25 μm, Orientation: 111, Single Side Polished, EPI-Ready |
| Magnesium (Mg) Sputtering Targets | NK1610 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK1611 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Barium (Ba) Sputtering Targets | NK1612 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Iron Aluminum Boride (Fe2AlB2) Max Phase Powder | NK1613 | Genel Endüstriyel Kullanım | Purity: 99+%, Size: 200 mesh |
| Silver-Carbon Nanotube Fibers Composite Wires | NK1614 | Genel Endüstriyel Kullanım | Ag-CNT, Diameter: 10-30 µm, Coating Thickness: 1 µm, Electrical conductivity: 1.5×10^7 S/m |
| Barium (Ba) Sputtering Targets | NK1615 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Germanium (Ge) Sputtering Targets | NK1616 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Germanium (Ge) Sputtering Targets | NK1617 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Aluminum Nitride (AlN) Sputtering Targets | NK1618 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size: 1”, Thickness: 0.250” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1619 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1620 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Germanium (Ge) Sputtering Targets | NK1621 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Germanium (Ge) Sputtering Targets | NK1622 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Tin Oxide (SnO2) Sputtering Targets | NK1623 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Gold (Au) Nanopowder/Nanoparticles | NK1624 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 50-100 nm |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK1625 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK1626 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Quartz Wafer | NK1627 | Genel Endüstriyel Kullanım | (X-Cut), Size: 4”, 2-Side Polished, Thickness: 200 ± 25 μm |
| Hafnium Oxide (HfO2) Pellet | NK1628 | Genel Endüstriyel Kullanım | Granule Type, Color: Black, Purity: 99.99%, Size: 1-3mm |
| Hafnium Oxide (HfO2) Pellet | NK1629 | Genel Endüstriyel Kullanım | Granule Type, Color: White, Purity:99.99%, Size:1-3mm |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1630 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Nickel Vanadium (NiV) Sputtering Targets | NK1631 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1632 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK1633 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 8”, Thickness: 0.125” |
| Gallium Arsenide (GaAs) Wafers | NK1634 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 450±25 μm, Single Side Polished, EPI-ready, Dopant: Silicon (N Type) |
| Ytterbium Oxide (Yb2O3) Sputtering Targets | NK1635 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Nickel (Ni) Sputtering Targets | NK1636 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK1637 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Lithium Niobate (LiNbO3) Sputtering Targets | NK1638 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK1639 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1640 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Lithium Titanate (Li2TiO3) Sputtering Targets | NK1641 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Sulphur (S) Nanopowder/Nanoparticles | NK1642 | Genel Endüstriyel Kullanım | High Purity: 99.995%, Size: 47 nm |
| Fullerene-C60 | NK1643 | Genel Endüstriyel Kullanım | Purity: 99.5% |
| Shape Memory Polymer NGM6520 | NK1644 | Genel Endüstriyel Kullanım | Ether Type |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1645 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK1646 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK1647 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Yttrium Ferrite (Y3Fe5O12) Sputtering Targets | NK1648 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Copper (Cu) Sputtering Targets | NK1649 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1650 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Chromium (Cr) Sputtering Targets | NK1651 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1652 | Elektronik, Yarı İletkenler, Optik Malzemeler | N-type, Purity: 99.999%, Size: 8”, Thickness: 0.250” |
| Cobalt Iron Boron (Co-Fe-B) Sputtering Targets | NK1653 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Magnesium (Mg) Sputtering Targets | NK1654 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 6”, Thickness: 0.250” |
| Shape Memory Polymer NGM5520 | NK1655 | Genel Endüstriyel Kullanım | Ether Type |
| Indium (In) Sputtering Targets | NK1656 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK1657 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1658 | Genel Endüstriyel Kullanım | indium, Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Yttrium (Y) Sputtering Targets | NK1659 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1660 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 2”, Thickness: 0.250”, Dark Gray to Black |
| Indium (In) Sputtering Targets | NK1661 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1662 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Manganese (Mn) Sputtering Targets | NK1663 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK1664 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Tungsten (W) Sputtering Targets | NK1665 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1666 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Indium Oxide (In2O3) Sputtering Targets | NK1667 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Silicon Carbide (SiC) Sputtering Targets | NK1668 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK1669 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1670 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.9%, Size: 2”, Thickness: 0.250”, White to Gray |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK1671 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1672 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, indium, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Graphene Sheet | NK1673 | Elektronik, Batarya Elektrotları, Sensörler | Size: 29 cm x 39 cm, Thickness: 35 µm, Highly Conductive |
| Zinc Oxide (ZnO) Sputtering Targets | NK1674 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK1675 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK1676 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, Purity: 99.999%, Size: 6”, Thickness: 0.125” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1677 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Manganese (Mn) Sputtering Targets | NK1678 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Manganese (Mn) Sputtering Targets | NK1679 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Shape Memory Polymer NGM4520 | NK1680 | Genel Endüstriyel Kullanım | Ether Type |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1681 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 3”, Thickness: 0.125”, Grey to Black |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK1682 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Aluminum (Al) Nanopowder/Nanoparticles | NK1683 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 38 nm, Metal Basis |
| Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 450 nm | NK1684 | Genel Endüstriyel Kullanım | |
| Thermoplastic Carbon Paste | NK1685 | Genel Endüstriyel Kullanım | Drying Temperature: <100 °C |
| Quantum Dots Magnetic Microspheres 615 nm | NK1686 | Genel Endüstriyel Kullanım | |
| Quantum Dots Magnetic Microspheres 525 nm | NK1687 | Genel Endüstriyel Kullanım | |
| Quantum Dots Microspheres 615 nm | NK1688 | Genel Endüstriyel Kullanım | |
| Quantum Dots Microspheres 525 nm | NK1689 | Genel Endüstriyel Kullanım | |
| Water Soluble Carbon Quantum Dots 528 nm | NK1690 | Genel Endüstriyel Kullanım | |
| Water Soluble Carbon Quantum Dots 515 nm | NK1691 | Genel Endüstriyel Kullanım | |
| Water Soluble Carbon Quantum Dots 505 nm | NK1692 | Genel Endüstriyel Kullanım | |
| Water Soluble Carbon Quantum Dots 420 nm | NK1693 | Genel Endüstriyel Kullanım | |
| Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 645 nm | NK1694 | Genel Endüstriyel Kullanım | |
| Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 625 nm | NK1695 | Genel Endüstriyel Kullanım | |
| Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 545 nm | NK1696 | Genel Endüstriyel Kullanım | |
| Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 525 nm | NK1697 | Genel Endüstriyel Kullanım | |
| Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 500 nm | NK1698 | Genel Endüstriyel Kullanım | |
| Water Soluble Cadmium Selenide Quantum Dots (CdSe/ZnS) 470 nm | NK1699 | Genel Endüstriyel Kullanım | |
| Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 700 nm | NK1700 | Genel Endüstriyel Kullanım | |
| Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 625 nm | NK1701 | Genel Endüstriyel Kullanım | |
| Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 600 nm | NK1702 | Genel Endüstriyel Kullanım | |
| Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 560 nm | NK1703 | Genel Endüstriyel Kullanım | |
| Water Soluble Indium Phosphide Quantum Dots (InP/ZnS QD) 525 nm | NK1704 | Genel Endüstriyel Kullanım | |
| Cobalt Iron Boron (Co-Fe-B) Sputtering Targets | NK1705 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Gallium Arsenide (GaAs) Wafers | NK1706 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350±25 μm, Double Side Polished, EPI-ready, Dopant: Zinc (P Type) |
| Tin (Sn) Sputtering Targets | NK1707 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1708 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Carbon Nanotube Sponges | NK1709 | Genel Endüstriyel Kullanım | Size: 50 mm x 10 mm, Thickness: 3-4 mm |
| Boron Nitride (BN) Sputtering Targets | NK1710 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK1711 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1712 | Genel Endüstriyel Kullanım | indium, Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Bismuth (Bi) Nanopowder/Nanoparticles | NK1713 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 78 nm, Metal Basis |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK1714 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Ytterbium Oxide (Yb2O3) Sputtering Targets | NK1715 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK1716 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Silver Conductive Paste | NK1717 | Genel Endüstriyel Kullanım | Surface Curing: ~80℃ |
| Zinc Sulfide (ZnS) Sputtering Targets | NK1718 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Gallium Arsenide (GaAs) Wafers | NK1719 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 400±25 μm, Double Side Polished, EPI-ready |
| Boron (B) Sputtering Targets | NK1720 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Indium Oxide (In2O3) Sputtering Targets | NK1721 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Magnesium (Mg) Sputtering Targets | NK1722 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Cobalt Iron Boron (Co-Fe-B) Sputtering Targets | NK1723 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Thermoplastic Carbon Paste for Long-term Cell Degradation | NK1724 | Genel Endüstriyel Kullanım | |
| Nickel (Ni) Sputtering Targets | NK1725 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 8”, Thickness: 0.250” |
| Carbon Nanotube Wire | NK1726 | Genel Endüstriyel Kullanım | Diameter: 5-15 μm, Hardness: 1.0-1.5 GPa |
| High-Performance Copper Foil Rolls for Lithium Ion Battery | NK1727 | Genel Endüstriyel Kullanım | Size: 10 µm |
| Cobalt Oxalate (CoC2O4) | NK1728 | Genel Endüstriyel Kullanım | Purity: > 98% |
| High Purity Atomized Spherical Magnesium (Mg) Powder NGW20 | NK1729 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK1730 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Fullerene-C60 | NK1731 | Genel Endüstriyel Kullanım | Purity: 99.9% |
| Meshed Lithium Air CR2032 Coin Cell Case with 304SS | NK1732 | Genel Endüstriyel Kullanım | Diameter: 20 mm, Height: 3.2 mm |
| Thermoset Carbon Paste (140 ℃ | NK1733 | Genel Endüstriyel Kullanım | 100 ohm/sqr/25µm), 15-20 µm |
| Thermoset Carbon Paste (140 ℃ | NK1734 | Genel Endüstriyel Kullanım | 1000 ohm/sqr/25µm, 10-15 µm) |
| Vanadium (V) Sputtering Targets | NK1735 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1736 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Thermoplastic Carbon Paste | NK1737 | Genel Endüstriyel Kullanım | Drying Temperature: 120˚C for 10 minutes |
| Selenium (Se) Sputtering Targets | NK1738 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Erbium Oxide (Er2O3) Sputtering Targets | NK1739 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness:0.125” |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1740 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.125” |
| Shape Memory Polymer NGM2520 | NK1741 | Genel Endüstriyel Kullanım | Ether Type |
| Thermoset Carbon Paste (140℃ | NK1742 | Genel Endüstriyel Kullanım | <20 ohm/sqr/25µm), 10-12 µm |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK1743 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Boron (B) Sputtering Targets | NK1744 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Boron Nitride (BN) Sputtering Targets | NK1745 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Nickel (Ni) Sputtering Targets | NK1746 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1747 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Praseodymium (Pr) Sputtering Targets | NK1748 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Copper (Cu) Sputtering Targets | NK1749 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 8”, Thickness: 0.250” |
| Tantalum Oxide (Ta2O5) Sputtering Targets | NK1750 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1751 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1752 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Boron (B) Sputtering Targets | NK1753 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Boron Carbide (B4C) Sputtering Targets | NK1754 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Tin (Sn) Sputtering Targets | NK1755 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1756 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 3”, Thickness: 0.250”, Grey to Black |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1757 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.9%, Size: 1”, Thickness: 0.125”, Grey to Black |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1758 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1759 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK1760 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1761 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1762 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Titanium Nitride (TiN) Sputtering Targets | NK1763 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1764 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1765 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Cobalt Iron Boron (Co-Fe-B) Sputtering Targets | NK1766 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Hydrothermal Synthesis Autoclave Reactor with PTFE Lined Vessel 500 ml | NK1767 | Genel Endüstriyel Kullanım | |
| Manganese (Mn) Sputtering Targets | NK1768 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1769 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Boron Nitride (BN) Sputtering Targets | NK1770 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets | NK1771 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK1772 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Ytterbium Oxide (Yb2O3) Sputtering Targets | NK1773 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Tungsten (W) Sputtering Targets | NK1774 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Nickel Oxide (NiO) Sputtering Targets | NK1775 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size:1”, Thickness: 0.125” |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1776 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 8”, Thickness: 0.250” |
| Tin Oxide (SnO2) Sputtering Targets | NK1777 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Titanium Nitride (TiN) Sputtering Targets | NK1778 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK1779 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Nickel Oxide (NiO) Sputtering Targets | NK1780 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size:1”, Thickness: 0.125” |
| Yttrium Ferrite (Y3Fe5O12) Sputtering Targets | NK1781 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1782 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Cobalt Iron Boron (Co-Fe-B) Sputtering Targets | NK1783 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1784 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 4”, Thickness: 0.125”, Grey to Black |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK1785 | Genel Endüstriyel Kullanım | Purity: 99.8%-99.9%, Size: 3”, Thickness: 0.125” |
| Gold (Au) Nanopowder/Nanoparticles | NK1786 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 28 nm |
| Yttrium (Y) Sputtering Targets | NK1787 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Tin Oxide (SnO2) Sputtering Targets | NK1788 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1789 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Antimony (Sb) Sputtering Targets | NK1790 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK1791 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK1792 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1793 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Silver (Ag) Sputtering Targets | NK1794 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1795 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1796 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Boron Carbide (B4C) Sputtering Targets | NK1797 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 8”, Thickness: 0.125” |
| Antimony (Sb) Sputtering Targets | NK1798 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1799 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Selenium (Se) Sputtering Targets | NK1800 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Magnesium Oxide (MgO) Sputtering Targets | NK1801 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 5”, Thickness: 0.125” |
| Carbon Nanotube Fibres | NK1802 | Genel Endüstriyel Kullanım | Fiber Diameter: 5-12 µm, Tensile Strength 1000-1200 MPa, Electrical conductivity 5×10^4~7×10^4 S/m |
| Ytterbium Oxide (Yb2O3) Sputtering Targets | NK1803 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Tungsten (W) Sputtering Targets | NK1804 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Vanadium (V) Sputtering Targets | NK1805 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 8”, Thickness: 0.250” |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK1806 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1807 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1808 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Lithium Niobate (LiNbO3) Sputtering Targets | NK1809 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Lithium Nickel Cobalt Oxide (LiNi(1-x)CoxO2) Sputtering Targets | NK1810 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Tin (Sn) Sputtering Targets | NK1811 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Tin Oxide (SnO2) Sputtering Targets | NK1812 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1813 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 4”, Thickness: 0.250”, Grey to Black |
| Ytterbium Oxide (Yb2O3) Sputtering Targets | NK1814 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| High-Performance Copper Foil Rolls for Lithium Ion Battery | NK1815 | Genel Endüstriyel Kullanım | Size: 25 µm |
| Ytterbium Oxide (Yb2O3) Sputtering Targets | NK1816 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Indium (In) Nanopowder/Nanoparticles | NK1817 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size: 70 nm, Tetragonal |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK1818 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1819 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Magnesium Oxide (MgO) Sputtering Targets | NK1820 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 5”, Thickness: 0.250” |
| Magnesium (Mg) Sputtering Targets | NK1821 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.98%, Size: 8”, Thickness: 0.250” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1822 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Tin (Sn) Sputtering Targets | NK1823 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK1824 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK1825 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.125” |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK1826 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Cobalt Iron Boron (Co-Fe-B) Sputtering Targets | NK1827 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Tin Oxide (SnO2) Sputtering Targets | NK1828 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Tantalum Oxide (Ta2O5) Sputtering Targets | NK1829 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1830 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK1831 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Boron Carbide (B4C) Sputtering Targets | NK1832 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 6”, Thickness: 0.250” |
| Tantalum Oxide (Ta2O5) Sputtering Targets | NK1833 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Manganese (Mn) Sputtering Targets | NK1834 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK1835 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| Boron Carbide (B4C) Sputtering Targets | NK1836 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK1837 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1838 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 1”, Thickness: 0.125”, Beige to White |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK1839 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Li-Ion Battery Separator Film | NK1840 | Genel Endüstriyel Kullanım | Length: 800 m, Width: 85 mm, Thickness: 25 μm |
| Stainless Steel Two-Electrode Split Test Cell | NK1841 | Genel Endüstriyel Kullanım | |
| Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets | NK1842 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Tin (Sn) Sputtering Targets | NK1843 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Zinc Selenide Quantum Dots (ZnSe/ZnS QD) 450 nm | NK1844 | Genel Endüstriyel Kullanım | |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1845 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Boron Nitride (BN) Sputtering Targets | NK1846 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| Indium Phosphide Quantum Dots (InP/ZnS QD) 700 nm | NK1847 | Genel Endüstriyel Kullanım | |
| Lithium Titanate (Li2TiO3) Sputtering Targets | NK1848 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1849 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK1850 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1851 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Polyhydroxylated Fullerene (Fullerenols)/ C60 | NK1852 | Genel Endüstriyel Kullanım | (-OH) Functionalized, Dispersed in Water, 500 ppm Dry powder |
| Gold-Carbon Nanotube Fibers Composite Wires | NK1853 | Genel Endüstriyel Kullanım | Au-CNT, Diameter: 10-30 µm, Coating Thickness: 1 µm, Electrical conductivity: 1×10^7 S/m |
| Indium Phosphide Quantum (InP/ZnS QD) Dots 625 nm | NK1854 | Genel Endüstriyel Kullanım | |
| Tin Oxide (SnO2) Sputtering Targets | NK1855 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK1856 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Tungsten (W) Sputtering Targets | NK1857 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.125” |
| Boron Carbide (B4C) Sputtering Targets | NK1858 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK1859 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Silver (Ag) Sputtering Targets | NK1860 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1861 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Praseodymium (Pr) Sputtering Targets | NK1862 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Zinc Selenide Quantum Dots (ZnSe/ZnS QD) 420 nm | NK1863 | Genel Endüstriyel Kullanım | |
| Boron Carbide (B4C) Sputtering Targets | NK1864 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 6”, Thickness: 0.125” |
| Nickel Oxide (NiO) Sputtering Targets | NK1865 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size:1”, Thickness: 0.250” |
| Gold (Au) Nanopowder/Nanoparticles | NK1866 | Genel Endüstriyel Kullanım | Purity: 99.99+%, Size: 14 nm |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1867 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, indium, Purity: 99.995%, Size: 4”, Thickness: 0.125” |
| Indium (In) Sputtering Targets | NK1868 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Chromium (Cr) Sputtering Targets | NK1869 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK1870 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Titanium Boride (TiB2) Sputtering Targets | NK1871 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Indium Phosphide Quantum (InP/ZnS QD) Dots 600 nm | NK1872 | Genel Endüstriyel Kullanım | |
| Boron Carbide (B4C) Sputtering Targets | NK1873 | Genel Endüstriyel Kullanım | Purity: 99.5, Size: 8”, Thickness: 0.250” |
| Tungsten (W) Sputtering Targets | NK1874 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1875 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1876 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Boron Carbide (B4C) Sputtering Targets | NK1877 | Genel Endüstriyel Kullanım | indium, Purity: 99.5%, Size: 1”, Thickness: 0.125” |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK1878 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Tin (Sn) Sputtering Targets | NK1879 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK1880 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Ytterbium Oxide (Yb2O3) Sputtering Targets | NK1881 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK1882 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Cobalt (Co) Sputtering Targets | NK1883 | Genel Endüstriyel Kullanım | indium, Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Lithium Niobate (LiNbO3) Sputtering Targets | NK1884 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Electrolyte Lithium Hexafluorophosphate (LiPF6) for Lithium-ion Battery Research Development | NK1885 | Genel Endüstriyel Kullanım | 1 Kg in Stainless Steel Container |
| Titanium Boride (TiB2) Sputtering Targets | NK1886 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1887 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Tin (Sn) Sputtering Targets | NK1888 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Titanium Carbide (TiC) Sputtering Targets | NK1889 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 1”, Thickness: 0.250” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1890 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK1891 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1892 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK1893 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK1894 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK1895 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 1”, Thickness: 0.250” |
| Indium Phosphide Quantum Dots (InP/ZnS QD) 560 nm | NK1896 | Genel Endüstriyel Kullanım | |
| Barium Zirconate (BaZrO3) Sputtering Targets | NK1897 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Barium Zirconate (BaZrO3) Sputtering Targets | NK1898 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Tin Oxide (SnO2) Sputtering Targets | NK1899 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1900 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Tungsten Disulfide (WS2) Sputtering Targets | NK1901 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1902 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 2”, Thickness: 0.125”, Beige to White |
| Silver Nanowires Suspension in Ethanol | NK1903 | Genel Endüstriyel Kullanım | Purity: > 99 wt%, Diameter : 50 nm |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1904 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1905 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.9%, Size: 3”, Thickness: 0.125”, White to Gray |
| Indium Phosphide Quantum Dots (InP/ZnS QD) 525 nm | NK1906 | Genel Endüstriyel Kullanım | |
| Tungsten Titanium (TiW) Sputtering Targets | NK1907 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Manganese (Mn) Sputtering Targets | NK1908 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Boron Nitride (BN) Sputtering Targets | NK1909 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Titanium Carbide (TiC) Sputtering Targets | NK1910 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1911 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Titanium Nitride (TiN) Sputtering Targets | NK1912 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1913 | Seramik, Yarı İletken, Kimyasal Endüstri | elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125”, Grey to Black |
| Zinc Oxide (ZnO) Sputtering Targets | NK1914 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Hydrothermal Synthesis Autoclave Reactor with PPL Lined Vessel 500 ml | NK1915 | Genel Endüstriyel Kullanım | |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK1916 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Praseodymium (Pr) Sputtering Targets | NK1917 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Indium Phosphide Quantum Dots (InP/ZnS QD) 480 nm | NK1918 | Genel Endüstriyel Kullanım | |
| Nickel Chromium (Ni-Cr) Sputtering Targets | NK1919 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Nickel Oxide (NiO) Sputtering Targets | NK1920 | Genel Endüstriyel Kullanım | Purity: 99.98%, Size:2”, Thickness: 0.125” |
| Silicon Carbide (SiC) Sputtering Targets | NK1921 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Cobalt (Co) Sputtering Targets | NK1922 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Lithium Titanate (Li2TiO3) Sputtering Targets | NK1923 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Carbon (C) Sputtering Targets | NK1924 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK1925 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK1926 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Tin Oxide (SnO2) Sputtering Targets | NK1927 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK1928 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Silicon Dioxide (SiO2) Sputtering Targets | NK1929 | Elektronik, Yarı İletkenler, Optik Malzemeler | Fused Quartz, indium, Purity: 99.995%, Size: 3”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK1930 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Shape Memory Polymer NGM3520 | NK1931 | Genel Endüstriyel Kullanım | Ether Type |
| Titanium Carbide (TiC) Sputtering Targets | NK1932 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 2”, Thickness: 0.250” |
| Zinc Oxide (ZnO) Sputtering Targets | NK1933 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK1934 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Titanium Boride (TiB2) Sputtering Targets | NK1935 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK1936 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK1937 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Copper (Cu) Sputtering Targets | NK1938 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 7”, Thickness: 0.250” |
| Yttrium (Y) Sputtering Targets | NK1939 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK1940 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Zinc Sulfide (ZnS) Sputtering Targets | NK1941 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Silicon Carbide (SiC) Sputtering Targets | NK1942 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Nickel Oxide (NiO) Sputtering Targets | NK1943 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size:1”, Thickness: 0.250” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK1944 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Aluminum Nitride (AlN) Sputtering Targets | NK1945 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.8%, Size: 1”, Thickness: 0.125” |
| Silicon Carbide (SiC) Sputtering Targets | NK1946 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Lithium (Li) Foil Thickness:0.5 mm | NK1947 | Genel Endüstriyel Kullanım | Width: 50 mm, Length: 1000 mm, Purity: 99.9% |
| Vanadium Oxide (VO2) Nanopowder/Nanoparticles | NK1948 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: 30-60 nm |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK1949 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK1950 | Genel Endüstriyel Kullanım | Purity: 99.8%-99.9%, Size: 3”, Thickness: 0.250” |
| Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 645 nm | NK1951 | Genel Endüstriyel Kullanım | |
| Silicon Carbide (SiC) Sputtering Targets | NK1952 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| Silicon Carbide (SiC) Sputtering Targets | NK1953 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Tungsten Titanium (TiW) Sputtering Targets | NK1954 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1955 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125”, Grey to Black |
| Silicon Nitride (Si3N4) Sputtering Targets | NK1956 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 3”, Thickness: 0.250”, Dark Gray to Black |
| Zinc Sulfide (ZnS) Sputtering Targets | NK1957 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Aluminum Nitride (AlN) Sputtering Targets | NK1958 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size: 2”, Thickness: 0.125” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK1959 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 625 nm | NK1960 | Genel Endüstriyel Kullanım | |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK1961 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Lithium Nickel Cobalt Oxide (LiNi(1-x)CoxO2) Sputtering Targets | NK1962 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1963 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK1964 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK1965 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Boron Carbide (B4C) Sputtering Targets | NK1966 | Genel Endüstriyel Kullanım | indium, Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Gallium Arsenide (GaAs) Wafers | NK1967 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350±25 μm, Single Side Polished, EPI-ready |
| Indium (In) Sputtering Targets | NK1968 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Boron (B) Sputtering Targets | NK1969 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Gallium Arsenide (GaAs) Wafers | NK1970 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 640±25 μm, Single Side Polished, EPI-ready, Dopant: Silicon (N-type) |
| Tungsten (W) Sputtering Targets | NK1971 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK1972 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK1973 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK1974 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 545 nm | NK1975 | Genel Endüstriyel Kullanım | |
| Tungsten Titanium (TiW) Sputtering Targets | NK1976 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK1977 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Cerium Oxide (CeO2) Sputtering Targets | NK1978 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK1979 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK1980 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Chromium (Cr) Sputtering Targets | NK1981 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK1982 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Boron Nitride (BN) Sputtering Targets | NK1983 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 6”, Thickness: 0.125” |
| Cobalt (Co) Sputtering Targets | NK1984 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK1985 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 6”, Thickness: 0.250”, Grey to Black |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK1986 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Multi Walled Carbon Nanotubes Array on Monocrystal Silicon | NK1987 | Elektronik, Yarı İletkenler, Optik Malzemeler | Height: 960 µm |
| Multi Walled Carbon Nanotubes Array on Monocrystal Silicon | NK1988 | Elektronik, Yarı İletkenler, Optik Malzemeler | Height: 180 µm |
| Multi Walled Carbon Nanotubes Array on Polycrystal Silicon | NK1989 | Elektronik, Yarı İletkenler, Optik Malzemeler | Height: 960 µm |
| Multi Walled Carbon Nanotubes Array on Quartz | NK1990 | Genel Endüstriyel Kullanım | Height: 960 µm |
| Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 525 nm | NK1991 | Genel Endüstriyel Kullanım | |
| Multi Walled Carbon Nanotubes Array on Quartz | NK1992 | Genel Endüstriyel Kullanım | Height: 490 µm |
| Multi Walled Carbon Nanotubes Array on Quartz | NK1993 | Genel Endüstriyel Kullanım | Height: 95 µm |
| Multi Walled Carbon Nanotubes Array on Polycrystal Silicon | NK1994 | Elektronik, Yarı İletkenler, Optik Malzemeler | Height: 95 µm |
| Zinc (Zn) Sputtering Targets | NK1995 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Carbon Nanotube Fibres | NK1996 | Genel Endüstriyel Kullanım | Fiber Diameter: 5-12 µm, Tensile Strength 1200-1500 MPa, Electrical conductivity 5×10^4~7×10^4 S/m |
| Multi Walled Carbon Nanotubes Array on Monocrystal Silicon | NK1997 | Elektronik, Yarı İletkenler, Optik Malzemeler | Height: 95 µm |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK1998 | Genel Endüstriyel Kullanım | indium, Purity: 99.8%, Size: 2”, Thickness: 0.125” |
| Manganese (Mn) Sputtering Targets | NK1999 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Multi Walled Carbon Nanotubes Array on Polycrystal Silicon | NK2000 | Elektronik, Yarı İletkenler, Optik Malzemeler | Height: 490 µm |
| Carbon Nanotube Sponges | NK2001 | Genel Endüstriyel Kullanım | Size: 50 mm x 20 mm, Thickness: 1-2 mm |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK2002 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK2003 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Yttrium Ferrite (Y3Fe5O12) Sputtering Targets | NK2004 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2005 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Cobalt (Co) Sputtering Targets | NK2006 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.125” |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK2007 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK2008 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK2009 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK2010 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.250” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK2011 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lithium Niobate (LiNbO3) Sputtering Targets | NK2012 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Indium (In) Sputtering Targets | NK2013 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2014 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Zinc Sulfide (ZnS) Sputtering Targets | NK2015 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK2016 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2017 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Nickel Oxide (NiO) Sputtering Targets | NK2018 | Genel Endüstriyel Kullanım | Purity: 99.995%, Size:2”, Thickness: 0.125” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK2019 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Chromium (Cr) Sputtering Targets | NK2020 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK2021 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2022 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Tantalum Oxide (Ta2O5) Sputtering Targets | NK2023 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2024 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2025 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 480 nm | NK2026 | Genel Endüstriyel Kullanım | |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK2027 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Cobalt (Co) Sputtering Targets | NK2028 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Silicon Nitride (Si3N4) Sputtering Targets | NK2029 | Elektronik, Yarı İletkenler, Optik Malzemeler | Purity: 99.5%, Size: 3”, Thickness: 0.125”, Dark Gray to Black |
| Tantalum (Ta) Sputtering Targets | NK2030 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2031 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Silicon Carbide (SiC) Sputtering Targets | NK2032 | Elektronik, Yarı İletkenler, Optik Malzemeler | indium, Purity: 99.5%, Size: 1”, Thickness: 0.125” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK2033 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Carbon (C) Sputtering Targets | NK2034 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2035 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 1”, Thickness: 0.250” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK2036 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK2037 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2038 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Cadmium Selenide Quantum Dots (CdSe/ZnS QD) 460 nm | NK2039 | Genel Endüstriyel Kullanım | |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2040 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2041 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Yttrium Ferrite (Y3Fe5O12) Sputtering Targets | NK2042 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lanthanum Aluminate (LaAlO3) Sputtering Targets | NK2043 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Titanium Boride (TiB2) Sputtering Targets | NK2044 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2045 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Tantalum (Ta) Sputtering Targets | NK2046 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2047 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Indium (In) Sputtering Targets | NK2048 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Barium Zirconate (BaZrO3) Sputtering Targets | NK2049 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Barium Zirconate (BaZrO3) Sputtering Targets | NK2050 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2051 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 6”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2052 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Silicon (Si) Sputtering Targets | NK2053 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, indium, Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2054 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2055 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2056 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 1”, Thickness: 0.250”, Beige to White |
| Titanium Carbide (TiC) Sputtering Targets | NK2057 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Prime CZ-Si Wafer | NK2058 | Genel Endüstriyel Kullanım | Size: 8”, Orientation: (100), Boron Doped, Resistivity: 1-100 (ohm.cm), 1-Side Polished, Thickness: 725 ± 25 μm |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK2059 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 7”, Thickness: 0.125” |
| Silicon (Si) Sputtering Targets | NK2060 | Elektronik, Yarı İletkenler, Optik Malzemeler | P-type, indium, Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Chromium (Cr) Sputtering Targets | NK2061 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.125” |
| CQD-675-nm.webp | NK2062 | Genel Endüstriyel Kullanım | |
| Carbon Quantum Dots (CQD) 675 nm | NK2063 | Genel Endüstriyel Kullanım | |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2064 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Cobalt (Co) Sputtering Targets | NK2065 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Zinc Oxide (ZnO) Sputtering Targets | NK2066 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Tantalum (Ta) Sputtering Targets | NK2067 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2068 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2069 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Carbon Quantum Dots (CQD) 630 nm | NK2070 | Genel Endüstriyel Kullanım | |
| Barium Fluoride (BaF2) Sputtering Targets | NK2071 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Yttrium (Y) Sputtering Targets | NK2072 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK2073 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2074 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Tantalum (Ta) Sputtering Targets | NK2075 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Boron (B) Sputtering Targets | NK2076 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Polyhydroxylated Fullerene (Fullerenols)/ C60 | NK2077 | Genel Endüstriyel Kullanım | (-OH) Functionalized, Dispersed in Water, 1000 ppm Dry powder |
| Barium (Ba) Sputtering Targets | NK2078 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| Barium (Ba) Sputtering Targets | NK2079 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Tungsten Oxide (WO3) Sputtering Targets | NK2080 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK2081 | Genel Endüstriyel Kullanım | Purity: 99.8%-99.9%, Size: 4”, Thickness: 0.125” |
| Vanadium (V) Sputtering Targets | NK2082 | Genel Endüstriyel Kullanım | indium, Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Indium Oxide (In2O3) Sputtering Targets | NK2083 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Tantalum Oxide (Ta2O5) Sputtering Targets | NK2084 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Aluminum Nitride (AlN) Sputtering Targets | NK2085 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size: 3”, Thickness: 0.125” |
| Titanium Boride (TiB2) Sputtering Targets | NK2086 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK2087 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2088 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Antimony (Sb) Sputtering Targets | NK2089 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Lithium Niobate (LiNbO3) Sputtering Targets | NK2090 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Gallium Arsenide (GaAs) Wafers | NK2091 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350±25 μm, Single Side Polished, EPI-ready, Mobility: 1000-3000 |
| Gallium Arsenide (GaAs) Wafers | NK2092 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350±25 μm, Double Side Polished, EPI-ready |
| Gallium Arsenide (GaAs) Wafers | NK2093 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350± 25 μm, Orientation: 100, Single Side Polished, EPI-ready |
| Gallium Arsenide (GaAs) Wafers | NK2094 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 625±25 μm, Single Side Polished, EPI-ready |
| Gallium Arsenide (GaAs) Wafers | NK2095 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 350±25 μm, Single Side Polished, EPI-ready |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2096 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2097 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2098 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Boron Nitride (BN) Sputtering Targets | NK2099 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 6”, Thickness: 0.250” |
| Indium Oxide (In2O3) Sputtering Targets | NK2100 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2101 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK2102 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK2103 | Genel Endüstriyel Kullanım | indium, Purity: 99.9% , Size: 2”, Thickness: 0.125” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2104 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Titanium Nitride (TiN) Sputtering Targets | NK2105 | Seramik, Yarı İletken, Kimyasal Endüstri | elastomer, Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Indium Oxide (In2O3) Sputtering Targets | NK2106 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Titanium Carbide (TiC) Sputtering Targets | NK2107 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Titanium Boride (TiB2) Sputtering Targets | NK2108 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| 565.webp | NK2109 | Genel Endüstriyel Kullanım | |
| Carbon Quantum Dots (CQD) 565 nm | NK2110 | Genel Endüstriyel Kullanım | |
| Tin Oxide (SnO2) Sputtering Targets | NK2111 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size:2”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2112 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2113 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Impending Self-Help Transfer Nickel Graphene Foam | NK2114 | Elektronik, Batarya Elektrotları, Sensörler | Thickness: 1±0.1 mm, Size: 5×5 cm |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK2115 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Yttrium (Y) Sputtering Targets | NK2116 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK2117 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 7”, Thickness: 0.250” |
| Indium Oxide (In2O3) Sputtering Targets | NK2118 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Tin Oxide (SnO2) Sputtering Targets | NK2119 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Samarium (Sm) Micron Powder | NK2120 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| 535.webp | NK2121 | Genel Endüstriyel Kullanım | |
| Carbon Quantum Dots (CQD) 535 nm | NK2122 | Genel Endüstriyel Kullanım | |
| Titanium Carbide (TiC) Sputtering Targets | NK2123 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Lanthanum Calcium Manganate (La0.7Ca0.3MnO3) Sputtering Targets | NK2124 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Yttrium Ferrite (Y3Fe5O12) Sputtering Targets | NK2125 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Tungsten Oxide (WO3) Sputtering Targets | NK2126 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Tin Oxide (SnO2) Sputtering Targets | NK2127 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Tantalum (Ta) Sputtering Targets | NK2128 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2129 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.250” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2130 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK2131 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK2132 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2133 | Pigment, Manyetik Malzemeler, Katalizörler | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Titanium Nitride (TiN) Sputtering Targets | NK2134 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK2135 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2136 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Yttrium Ferrite (Y3Fe5O12) Sputtering Targets | NK2137 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2138 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Aluminum Nitride (AlN) Sputtering Targets | NK2139 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size: 2”, Thickness: 0.250” |
| Germanium (Ge) Sputtering Targets | NK2140 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK2141 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2142 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.95%, Size: 1”, Thickness: 0.125” |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK2143 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK2144 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Cobalt (Co) Nanopowder/Nanoparticles | NK2145 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 100 nm |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK2146 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 2”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2147 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| Manganese (Mn) Sputtering Targets | NK2148 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Carbon (C) (Pyrolytic Graphite) Sputtering Targets | NK2149 | Genel Endüstriyel Kullanım | indium, Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2150 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Bismuth Oxide (Bi2O3) Sputtering Targets | NK2151 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Tantalum (Ta) Sputtering Targets | NK2152 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.125” |
| 515.webp | NK2153 | Genel Endüstriyel Kullanım | |
| Carbon Quantum Dots (CQD) 515 nm | NK2154 | Genel Endüstriyel Kullanım | |
| Titanium Nitride (TiN) Sputtering Targets | NK2155 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 3”, Thickness: 0.250” |
| Lead Sulfide Quantum Dots (PbS QD) 1550 nm | NK2156 | Genel Endüstriyel Kullanım | |
| Lithium Niobate (LiNbO3) Sputtering Targets | NK2157 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK2158 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Titanium Carbide (TiC) Sputtering Targets | NK2159 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| 505.webp | NK2160 | Genel Endüstriyel Kullanım | |
| Carbon Quantum Dots (CQD) 505 nm | NK2161 | Genel Endüstriyel Kullanım | |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2162 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.99%, Size: 1”, Thickness: 0.125”, Beige to White |
| Cerium Oxide (CeO2) Sputtering Targets | NK2163 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2164 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| 440.webp | NK2165 | Genel Endüstriyel Kullanım | |
| Carbon Quantum Dots (CQD) 440 nm | NK2166 | Genel Endüstriyel Kullanım | |
| Lead Sulfide Quantum Dots (PbS QD) 1450 nm | NK2167 | Genel Endüstriyel Kullanım | |
| Gallium Arsenide (GaAs) Wafers | NK2168 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 600±25 μm, Double Side Polished, EPI-ready |
| Perovskite Quantum Dots (CsPbI3) 670 nm | NK2169 | Genel Endüstriyel Kullanım | |
| Nickel Oxide (NiO) Sputtering Targets | NK2170 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size:2”, Thickness: 0.250” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2171 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Lanthanum Aluminate (LaAlO3) Sputtering Targets | NK2172 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK2173 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2174 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Lead Sulfide Quantum Dots (PbS QD) 1350 nm | NK2175 | Genel Endüstriyel Kullanım | |
| Fullerene-C70 | NK2176 | Genel Endüstriyel Kullanım | Purity: 95% |
| Lithium Titanate (Li2TiO3) Sputtering Targets | NK2177 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| 420.webp | NK2178 | Genel Endüstriyel Kullanım | |
| Carbon Quantum Dots (CQD) 420 nm | NK2179 | Genel Endüstriyel Kullanım | |
| Lead Sulfide Quantum Dots (PbS QD) 1250 nm | NK2180 | Genel Endüstriyel Kullanım | |
| Tantalum (Ta) Sputtering Targets | NK2181 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2182 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Silicon Carbide (SiC) Sputtering Targets | NK2183 | Elektronik, Yarı İletkenler, Optik Malzemeler | indium, Purity: 99.5%, Size: 2”, Thickness: 0.125” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK2184 | Genel Endüstriyel Kullanım | Purity: 99.8%-99.9%, Size: 4”, Thickness: 0.250” |
| Lead Sulfide Quantum Dots (PbS QD) 1150 nm | NK2185 | Genel Endüstriyel Kullanım | |
| Perovskite Quantum Dots (CsPbCl3) 410 nm | NK2186 | Genel Endüstriyel Kullanım | |
| Perovskite Quantum Dots (CsPbBr3) 510 nm | NK2187 | Genel Endüstriyel Kullanım | |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK2188 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2189 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 2”, Thickness: 0.250”, Beige to White |
| Zinc Sulfide (ZnS) Sputtering Targets | NK2190 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2191 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Lead Sulfide Quantum Dots (PbS QD) 1050 nm | NK2192 | Genel Endüstriyel Kullanım | |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2193 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2194 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2195 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2196 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2197 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2198 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Molybdenum Oxide (MoO3) Sputtering Targets | NK2199 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lead Sulfide Quantum Dots (PbS QD) 950 nm | NK2200 | Genel Endüstriyel Kullanım | |
| Boron Carbide (B4C) Sputtering Targets | NK2201 | Genel Endüstriyel Kullanım | indium, Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2202 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2203 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.125” |
| Carbon Nanotube Sponges | NK2204 | Genel Endüstriyel Kullanım | Size: 50 mm x 20 mm, Thickness: 3-4 mm |
| Lead Sulfide Quantum Dots (PbS QD) 850 nm | NK2205 | Genel Endüstriyel Kullanım | |
| Germanium (Ge) Micron Powder | NK2206 | Genel Endüstriyel Kullanım | Purity: 99.99 %, Size: 325 mesh |
| Magnesium Oxide (MgO) Sputtering Targets | NK2207 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | indium, Purity: 99.95%, Size:1”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2208 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Zinc Sulfide (ZnS) Sputtering Targets | NK2209 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2210 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2211 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| Aluminum Nitride (AlN) Sputtering Targets | NK2212 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.8%, Size: 3”, Thickness: 0.125” |
| Aluminum Nitride (AlN) Sputtering Targets | NK2213 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.8%, Size: 2”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2214 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Lanthanum Strontium Manganate (La0.9Sr0.1MnO3) Sputtering Targets | NK2215 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2216 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Manganese (Mn) Sputtering Targets | NK2217 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2218 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2219 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 7”, Thickness: 0.125” |
| Lithium Niobate (LiNbO3) Sputtering Targets | NK2220 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2221 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2222 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 2”, Thickness: 0.250” |
| Barium Zirconate (BaZrO3) Sputtering Targets | NK2223 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2224 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.95%, Size: 4”, Thickness: 0.125” , Grey to Black |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2225 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2226 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK2227 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2228 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2229 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Fullerene-C70 | NK2230 | Genel Endüstriyel Kullanım | Purity: 96% |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2231 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125”, Grey to Black |
| Titanium Nitride (TiN) Sputtering Targets | NK2232 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Zinc Oxide (ZnO) Sputtering Targets | NK2233 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2234 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Gallium Arsenide (GaAs) Wafer | NK2235 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 300± 25 μm, Double Side Polished, EPI-ready |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2236 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2237 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Boron Carbide (B4C) Sputtering Targets | NK2238 | Genel Endüstriyel Kullanım | Indium Bonding, Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2239 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 3”, Thickness: 0.250” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2240 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK2241 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Barium Zirconate (BaZrO3) Sputtering Targets | NK2242 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2243 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2244 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK2245 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2246 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2247 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2248 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.125” |
| Indium Zinc Oxide/IZO (InZnO) Sputtering Targets | NK2249 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2250 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 7”, Thickness: 0.250” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK2251 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2252 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2253 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2254 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| InP-based QLED Quantum Dots 525 nm | NK2255 | Genel Endüstriyel Kullanım | |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2256 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 6”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2257 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 6”, Thickness: 0.250” |
| Cd-based QLED Quantum Dots 465 nm | NK2258 | Genel Endüstriyel Kullanım | |
| Cd-based QLED Quantum Dots 525 nm | NK2259 | Genel Endüstriyel Kullanım | |
| Titanium Nitride (TiN) Sputtering Targets | NK2260 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.5%, Size: 4”, Thickness: 0.250” |
| Cd-based QLED Quantum Dots 625 nm | NK2261 | Genel Endüstriyel Kullanım | |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2262 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| ZnSe-based QLED Quantum Dots 455 nm | NK2263 | Genel Endüstriyel Kullanım | |
| InP-based QLED Quantum Dots 625 nm | NK2264 | Genel Endüstriyel Kullanım | |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2265 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2266 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Strontium Titanate (SrTiO3) Sputtering Targets | NK2267 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2268 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 7”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2269 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | elastomer, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK2270 | Genel Endüstriyel Kullanım | indium, Purity: 99.8%, Size: 3”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2271 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK2272 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Multi-Layer Accordion-Shaped Titanium Carbide ( Ti3C2Tx) MXene Phase Powder | NK2273 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 98+%, Size: ~400 mesh |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2274 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.99%, Size: 2”, Thickness: 0.125”, Beige to White |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2275 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.9%, Size: 3”, Thickness: 0.125”, Beige to White |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK2276 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2277 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Aluminum Nitride (AlN) Sputtering Targets | NK2278 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size: 3”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2279 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Gold Nanostars | NK2280 | Genel Endüstriyel Kullanım | Size: 40-45 nm |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2281 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.9%, Size: 4”, Thickness: 0.125”, Grey to Black |
| Zinc Oxide (ZnO) Sputtering Targets | NK2282 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2283 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Zinc Oxide (ZnO) with Alumina Sputtering Targets | NK2284 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Tantalum Oxide (Ta2O5) Sputtering Targets | NK2285 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Nickel Oxide (NiO) Sputtering Targets | NK2286 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2287 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK2288 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Silver (Ag) Sputtering Targets | NK2289 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK2290 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2291 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2292 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | indium, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2293 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Vanadium Oxide (V2O5) Sputtering Targets | NK2294 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Boron (B) Sputtering Targets | NK2295 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2296 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.250” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2297 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.250” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2298 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.125” |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK2299 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Lithium Niobate (LiNbO3) Sputtering Targets | NK2300 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK2301 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2302 | Pigment, Manyetik Malzemeler, Katalizörler | Purity: 99.9%, Size: 7”, Thickness: 0.250” |
| Tungsten Oxide (WO3) Sputtering Targets | NK2303 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2304 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Praseodymium (Pr) Sputtering Targets | NK2305 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Titanium Nitride (TiN) Sputtering Targets | NK2306 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2307 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| Fullerene-C70 | NK2308 | Genel Endüstriyel Kullanım | Purity: 98% |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2309 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Lithium Cobalt Oxide (LiCoO2) Sputtering Targets | NK2310 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2311 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2312 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Silicon Carbide (SiC) Sputtering Targets | NK2313 | Elektronik, Yarı İletkenler, Optik Malzemeler | indium, Purity: 99.5%, Size: 3”, Thickness: 0.125” |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2314 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Nickel Oxide (NiO) Sputtering Targets | NK2315 | Genel Endüstriyel Kullanım | indium, Purity: 99.98%, Size: 2”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2316 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2317 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2318 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Silicon Carbide (SiC) Sputtering Targets | NK2319 | Elektronik, Yarı İletkenler, Optik Malzemeler | indium, Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Zinc Sulfide (ZnS) Sputtering Targets | NK2320 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2321 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK2322 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Nickel Oxide (NiO) Sputtering Targets | NK2323 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 2”, Thickness: 0.125” |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2324 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 2”, Thickness: 350 μm, Mechanical Grade, 4H Area: 80% |
| Single Walled Carbon Nanotubes Array on Monocrystal Silicon | NK2325 | Elektronik, Yarı İletkenler, Optik Malzemeler | Height: 95 µm |
| Single Walled Carbon Nanotubes Array on Quartz | NK2326 | Genel Endüstriyel Kullanım | Height: 190 µm |
| Single Walled Carbon Nanotubes Array on Quartz | NK2327 | Genel Endüstriyel Kullanım | Height: 290 µm |
| Single Walled Carbon Nanotubes Array on Quartz | NK2328 | Genel Endüstriyel Kullanım | Height: 95 µm |
| Tungsten Oxide (WO3) Sputtering Targets | NK2329 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Tungsten Oxide (WO3) Sputtering Targets | NK2330 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2331 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2332 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Iron Oxide (Fe3O4) Sputtering Targets | NK2333 | Pigment, Manyetik Malzemeler, Katalizörler | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lithium Chips for Coin Cell Materials | NK2334 | Genel Endüstriyel Kullanım | Diameter: 16 mm, Thickness: 0.6 mm, 1500 pieces |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2335 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2336 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 1”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2337 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2338 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2339 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2340 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 8”, Thickness: 0.125” |
| Magnesium Fluoride (MgF2) Sputtering Targets | NK2341 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2342 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 5”, Thickness: 0.125” |
| Molybdenum Disilicide (MoSi2) Sputtering Targets | NK2343 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2344 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2345 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2346 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.250” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2347 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Lanthanum Titanate (LaTiO3) Sputtering Targets | NK2348 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2349 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2350 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Nickel Oxide (NiO) Sputtering Targets | NK2351 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2352 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2353 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2354 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2355 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2356 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2357 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Aluminum Nitride (AlN) Sputtering Targets | NK2358 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size: 4”, Thickness: 0.125” |
| Fullerene-C70 | NK2359 | Genel Endüstriyel Kullanım | Purity: 99% |
| Tungsten Oxide (WO3) Sputtering Targets | NK2360 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2361 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 3”, Thickness: 0.250”, Beige to White |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2362 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Manganese (Mn) Sputtering Targets | NK2363 | Genel Endüstriyel Kullanım | indium, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2364 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2365 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2366 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2367 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2368 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2369 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2370 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2371 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| Chromium Oxide (Cr2O3) Sputtering Targets | NK2372 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size: 4”, Thickness: 0.125” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2373 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2374 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Barium Zirconate (BaZrO3) Sputtering Targets | NK2375 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Single Walled Carbon Nanotubes Array on Monocrystal Silicon | NK2376 | Elektronik, Yarı İletkenler, Optik Malzemeler | Height: 190 µm |
| Aluminum Nitride (AlN) Sputtering Targets | NK2377 | Genel Endüstriyel Kullanım | Purity: 99.8%, Size:4”, Thickness: 0.250” |
| Calcium Manganate (CaMnO3) Sputtering Targets | NK2378 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Aluminum Oxide (Al2O3) Sputtering Targets | NK2379 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 8”, Thickness: 0.250” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK2380 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK2381 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Stainless Steel Three-Electrode Split Test Cell | NK2382 | Genel Endüstriyel Kullanım | |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2383 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2384 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 1”, Thickness: 0.125” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2385 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 2”, Thickness: 0.250” |
| Polyhydroxylated Fullerene (Fullerenols)/ C60 | NK2386 | Genel Endüstriyel Kullanım | (-OH) Functionalized, Dispersed in Water, 2000 ppm Dry powder |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2387 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2388 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 3”, Thickness: 0.250” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2389 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.250” |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2390 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2391 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2392 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2393 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2394 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 5”, Thickness: 0.250” |
| Barium Zirconate (BaZrO3) Sputtering Targets | NK2395 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2396 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2397 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2398 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | indium, Purity: 99.95%, Size: 3”, Thickness: 0.125” |
| Lanthanum Strontium Manganate (La0.7Sr0.3MnO3) Sputtering Targets | NK2399 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2400 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK2401 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.250” |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK2402 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 3”, Thickness: 0.125” |
| Tungsten Oxide (WO3) Sputtering Targets | NK2403 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 2”, Thickness: 0.125” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2404 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Praseodymium (Pr) Micron Powder | NK2405 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Lanthanum Manganate (LaMnO3) Sputtering Targets | NK2406 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.125” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2407 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Magnetic Fe3O4@SiO2 powder | NK2408 | Genel Endüstriyel Kullanım | Size: 20 nm, Core size: 12 nm, Shell size: 8 nm, Positively-charged |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK2409 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Boron Nitride (BN) Sputtering Targets | NK2410 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 8”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2411 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Indium Tin Oxide/ITO (In203:Sn02) Sputtering Targets | NK2412 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Lanthanum Nickel Oxide (LaNiO3) Sputtering Targets | NK2413 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2414 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2415 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2416 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 7”, Thickness: 0.125” |
| Bismuth Ferrite (BiFeO3) Sputtering Targets | NK2417 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Cerium (Ce) Micron Powder | NK2418 | Genel Endüstriyel Kullanım | Purity: 99.5 %, Size: 325 mesh |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2419 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Impending Self-Help Transfer Nickel Graphene Foam | NK2420 | Elektronik, Batarya Elektrotları, Sensörler | Thickness: 1±0.1 mm, Size: 5×10 cm |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK2421 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2422 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2423 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2424 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 7”, Thickness: 0.250” |
| Antimony Telluride (Sb2Te3) Sputtering Targets | NK2425 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2426 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 5”, Thickness: 0.250” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2427 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Titanium Nitride (TiN) Sputtering Targets | NK2428 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.5%, Size: 4”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2429 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2430 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.125” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2431 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 3”, Thickness: 0.125”, Beige to White |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2432 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2433 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2434 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.95%, Size: 4”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2435 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.250” |
| Mini Pellet Press | NK2436 | Genel Endüstriyel Kullanım | |
| Boron Nitride (BN) Sputtering Targets | NK2437 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 8”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2438 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2439 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2440 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.250” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2441 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 5”, Thickness: 0.125” |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2442 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2443 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 4”, Thickness: 0.125”, Beige to White |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2444 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 3”, Thickness: 0.250” |
| Tungsten Oxide (WO3) Sputtering Targets | NK2445 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 3”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2446 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.125” |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2447 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Niobium Oxide (Nb2O5) Sputtering Targets | NK2448 | Genel Endüstriyel Kullanım | Purity: 99.5%, Size: 1”, Thickness: 0.125” |
| Glassy Carbon Foam for Battery and Supercapacitor Research | NK2449 | Genel Endüstriyel Kullanım | Purity: 95+%, Size: 100 mm x100 mm x 10 mm |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2450 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 8”, Thickness: 0.250”, Beige to White |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2451 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 6”, Thickness: 0.250”, Beige to White |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2452 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 7”, Thickness: 0.125” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2453 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 8”, Thickness: 0.250” |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2454 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2455 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2456 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2457 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Cerium Oxide (CeO2) Sputtering Targets | NK2458 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Zinc Selenide Discs | NK2459 | Genel Endüstriyel Kullanım | Purity: 99.99%, Dia:20mm, Thickness:3mm, 2-side polished |
| Indium Phosphide (InP) Wafers | NK2460 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 350± 25 μm, Orientation: 111, Single Side Polished, Testing Grade |
| Multi-Layer Titanium Carbide (Ti2CTx) MXene Phase Powder | NK2461 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 98+%, Size: 2-20 µm |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2462 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 6”, Thickness: 0.250” |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK2463 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.125” |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK2464 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 4”, Thickness: 0.250” |
| Selenium (Se) Nanopowder/Nanoparticles | NK2465 | Genel Endüstriyel Kullanım | Purity: 99.5+%, Size: < 100 nm |
| Silicon Carbide Wafer (SiC-4H)- 4H | NK2466 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 2”, Thickness: 350 μm, Mechanical Grade, 4H Area: 95% |
| Praseodymium Calcium Manganate (Pr0.7Ca0.3MnO3) Sputtering Targets | NK2467 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2468 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 2”, Thickness: 350 μm, Testing Grade, 4H Area: 80% |
| Fullerene-C70 | NK2469 | Genel Endüstriyel Kullanım | Purity: 99.5% |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2470 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 3”, Thickness: 350 μm, Production Grade, 4H Area: 100% |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2471 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 7”, Thickness: 0.125” |
| Tungsten Oxide (WO3) Sputtering Targets | NK2472 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| 5V-10mA Coin Cell Battery Testing System | NK2473 | Genel Endüstriyel Kullanım | Dimension ( W*L*H) : 480*330*45 mm |
| Polyhydroxylated Fullerene (Fullerenols)/ C60 | NK2474 | Genel Endüstriyel Kullanım | (-OH) Functionalized, Dispersed in Water, 4000 ppm Dry powder |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2475 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 3”, Thickness: 350 μm, Testing Grade, 4H Area: 95% |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK2476 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 6”, Thickness: 0.250” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2477 | Seramik, Yarı İletken, Kimyasal Endüstri | Purity: 99.99%, Size: 4”, Thickness: 0.250”, Beige to White |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2478 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 3”, Thickness: 350 μm, Dummy Grade, 4H Area: 95% |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2479 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 7”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2480 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.250” |
| Lead Zirconium Titanate/PZT (O5PbTiZr) Sputtering Targets | NK2481 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Bismuth Telluride (Bi2Te3) Sputtering Targets | NK2482 | Genel Endüstriyel Kullanım | Purity: 99.999%, Size: 8”, Thickness: 0.250” |
| Gallium Antimonide (GaSb) Wafers | NK2483 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 500± 25 μm, Orientation: 111, Testing Grade |
| Gallium Antimonide (GaSb) Wafers | NK2484 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 500± 25 μm, Orientation: 100, Testing Grade |
| Tungsten Oxide (WO3) Sputtering Targets | NK2485 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 4”, Thickness: 0.250” |
| Magnesium Oxide (MgO) Sputtering Targets | NK2486 | Kimyasal, Alev Geciktirici, Seramik Endüstrisi | indium, Purity: 99.95%, Size: 4”, Thickness: 0.125” |
| High Speed Homogenizer | NK2487 | Genel Endüstriyel Kullanım | 27.000 rpm |
| Barium Fluoride (BaF2) Sputtering Targets | NK2488 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.125” |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2489 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.125” |
| Molybdenum Disulfide (MoS2) Sputtering Targets | NK2490 | Genel Endüstriyel Kullanım | Purity: 99.9%, Size: 6”, Thickness: 0.125” |
| Silicon Nanowires | NK2491 | Elektronik, Yarı İletkenler, Optik Malzemeler | Dia: 100-200nm, Length: >10um, Purity: 99% |
| Silver (Ag) Sputtering Targets | NK2492 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2493 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 6”, Thickness: 0.250” |
| Titanium Dioxide (TiO2) Sputtering Targets | NK2494 | Seramik, Yarı İletken, Kimyasal Endüstri | indium, Purity: 99.99%, Size: 4”, Thickness: 0.125”, Beige to White |
| Platinum Foil | NK2495 | Genel Endüstriyel Kullanım | Purity 99.95%, Thickness: 0.5mm, 5×5 cm |
| Fullerene-C70 | NK2496 | Genel Endüstriyel Kullanım | Purity: 99.9% |
| Coin Cell Punching Machine | NK2497 | Genel Endüstriyel Kullanım | |
| Indium Phosphide (InP) Wafers | NK2498 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 600± 25 μm, Orientation: 111, Single Side Polished, Testing Grade |
| Indium Phosphide (InP) Wafers | NK2499 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 600± 25 μm, Orientation: 100, Single Side Polished, Testing Grade |
| Lithium Phosphate (Li3PO4) Sputtering Targets | NK2500 | Genel Endüstriyel Kullanım | Purity: 99.95%, Size: 8”, Thickness: 0.250” |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2501 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Barium Strontium Titanate (BaO4SrTi) Sputtering Targets | NK2502 | Genel Endüstriyel Kullanım | elastomer, Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Tungsten Oxide (WO3) Sputtering Targets | NK2503 | Genel Endüstriyel Kullanım | indium, Purity: 99.9%, Size: 4”, Thickness: 0.125” |
| Silicon Carbide Wafer (SiC-6H) – 6H | NK2504 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 2”, Thickness: 350 μm, Dummy Grade, Usable Area: 95% |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2505 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2506 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Barium Fluoride (BaF2) Sputtering Targets | NK2507 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Barium Titanate (BaTiO3) Sputtering Targets | NK2508 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.125” |
| Silicon Carbide Wafer (SiC-4H)- 4H | NK2509 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 4”, Thickness: 350 μm, Dummy Grade, 4H Area: 95% |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2510 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 4”, Thickness: 350 μm, Mechanical Grade, 4H Area: 80% |
| Gallium Antimonide (GaSb) Wafers | NK2511 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 500± 25 μm, Orientation: 111, EPI-Ready |
| Gallium Antimonide (GaSb) Wafers | NK2512 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 500± 25 μm, Orientation: 100, EPI-Ready |
| Platinum (Pt) Sputtering Targets | NK2513 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size:2”, Thickness: 0.125” |
| Hydraulic Crimping Machine for All Coin Cells | NK2514 | Genel Endüstriyel Kullanım | |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2515 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 2”, Thickness: 350 μm, Production Grade, 4H Area: 1 |
| Shape Memory Polymer NGP4510 | NK2516 | Genel Endüstriyel Kullanım | Potting Type |
| Shape Memory Polymer NGP5510 | NK2517 | Genel Endüstriyel Kullanım | Potting Type |
| Shape Memory Polymer NGP3510 | NK2518 | Genel Endüstriyel Kullanım | Potting Type |
| Shape Memory Polymer NGP2510 | NK2519 | Genel Endüstriyel Kullanım | Potting Type |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2520 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 4”, Thickness: 350 μm, Mechanical Grade, 4H Area: 100% |
| Indium Arsenide (InAs) Wafers | NK2521 | Genel Endüstriyel Kullanım | Size: 2”, Thickness: 500± 25 μm, Orientation: 100, EPI-Ready |
| Platinum Foil | NK2522 | Genel Endüstriyel Kullanım | Purity 99.95%, Thickness: 1 mm, 5×5 cm |
| Platinum (Pt) Sputtering Targets | NK2523 | Genel Endüstriyel Kullanım | indium, Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Indium Phosphide (InP) Wafers | NK2524 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 600± 25 μm, Orientation: 111, Single Side Polished, EPI-Ready |
| Indium Phosphide (InP) Wafers | NK2525 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 600± 25 μm, Orientation: 100, Single Side Polished, EPI-Ready |
| Gallium Antimonide (GaSb) Wafers | NK2526 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 625± 25 μm, Orientation: 100, Testing Grade |
| Platinum (Pt) Sputtering Targets | NK2527 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.125” |
| Indium Phosphide (InP) Wafers | NK2528 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 625± 25 μm, Orientation: 111, Single Side Polished, Testing Grade |
| Indium Phosphide (InP) Wafers | NK2529 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 625± 25 μm, Orientation: 100, Single Side Polished, Testing Grade |
| Indium Phosphide (InP) Wafers | NK2530 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 600± 25 μm, Orientation: 100, Single Side Polished, EPI-Ready, Dopant: Iron (N Type) |
| Silicon on Insulator (SOI) Wafers | NK2531 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 4”, Thickness: 725 μm, P type (Boron doped) |
| Indium Phosphide (InP) Wafers | NK2532 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 600± 25 μm, Orientation: 111 , Single Side Polished, EPI-Ready, Dopant: Iron (N Type) |
| Electric Coin Cell Hydraulic Crimping Machine | NK2533 | Genel Endüstriyel Kullanım | |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2534 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 3”, Thickness: 350 μm, Research Grade, 4H Area: 95% |
| Pneumatic Cylindrical Battery Sealing Machine | NK2535 | Genel Endüstriyel Kullanım | |
| Platinum (Pt) Sputtering Targets | NK2536 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.125” |
| Platinum (Pt) Sputtering Targets | NK2537 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 4”, Thickness: 0.250” |
| Silicon Carbide Wafer (SiC-4H) – 4H | NK2538 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 4”, Thickness: 350 μm, Testing Grade, 4H Area: 95% |
| Ultrasonic Homogenizer | NK2539 | Genel Endüstriyel Kullanım | |
| High Energy Ball Mill | NK2540 | Genel Endüstriyel Kullanım | |
| Indium Arsenide (InAs) Wafers | NK2541 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 625± 25 μm, Orientation: 100, EPI-Ready |
| Gallium Antimonide (GaSb) Wafers | NK2542 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 625± 25 μm, Orientation: 100, EPI-Ready |
| Gallium Antimonide (GaSb) Wafers | NK2543 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 625± 25 μm, Orientation: 111, Testing Grade |
| Gallium Antimonide (GaSb) Wafers | NK2544 | Genel Endüstriyel Kullanım | Size: 3”, Thickness: 625± 25 μm, Orientation: 111, EPI-Ready |
| Silver (Ag) Sputtering Targets | NK2545 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 8”, Thickness: 0.250” |
| Silicon on Insulator (SOI) Wafers | NK2546 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 6”, Device Thickness: 625 nm, P type |
| Silicon on Insulator (SOI) Wafers | NK2547 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 8”, Device Thickness: 300 nm, P type |
| Silicon on Insulator (SOI) Wafers | NK2548 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 8”, Device Thickness: 600 nm, P type |
| Silicon on Insulator (SOI) Wafers | NK2549 | Elektronik, Yarı İletkenler, Optik Malzemeler | Size: 6”, Device Thickness: 340 nm, P type |
| Pneumatic Die Cutting Machine For Battery Electrode Cutting | NK2550 | Genel Endüstriyel Kullanım | |
| Platinum (Pt) Sputtering Targets | NK2551 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 1”, Thickness: 0.250” |
| Gallium Antimonide (GaSb) Wafers | NK2552 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 1000± 25 μm, Orientation: 100, EPI-Ready |
| Gallium Antimonide (GaSb) Wafers | NK2553 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 1000± 25 μm, Orientation: 111, EPI-Ready |
| Indium Arsenide (InAs) Wafers | NK2554 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 1000± 25 μm, Orientation: 100, EPI-Ready |
| Platinum (Pt) Sputtering Targets | NK2555 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.250” |
| Polyhydroxylated Fullerene (Fullerenols)/ C60 | NK2556 | Genel Endüstriyel Kullanım | (-OH) Functionalized, Dry powder |
| Platinum (Pt) Sputtering Targets | NK2557 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 2”, Thickness: 0.125” |
| Shape Memory Polymer NGS5520 | NK2558 | Genel Endüstriyel Kullanım | Solution Type |
| Shape Memory Polymer NGS4520 | NK2559 | Genel Endüstriyel Kullanım | Solution Type |
| Shape Memory Polymer NGS3520 | NK2560 | Genel Endüstriyel Kullanım | Solution Type |
| Indium Phosphide (InP) Wafers | NK2561 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 625± 25 μm, Orientation: 100, Single Side Polished, EPI-Ready |
| Indium Phosphide (InP) Wafers | NK2562 | Genel Endüstriyel Kullanım | Size: 4”, Thickness: 625± 25 μm, Orientation: 111, Single Side Polished, EPI-Ready |
| Platinum Foil | NK2563 | Genel Endüstriyel Kullanım | Purity 99.95%, Thickness: 0.5mm, 10×10 cm |
| Platinum (Pt) Sputtering Targets | NK2564 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.125” |
| Platinum Foil | NK2565 | Genel Endüstriyel Kullanım | Purity 99.95%, Thickness: 1 mm, 10×10 cm |
| Large-Automatic-Film-Coater-_Doctor-Blade_.webp | NK2566 | Genel Endüstriyel Kullanım | |
| Large Automatic Film Coater (Doctor Blade) | NK2567 | Genel Endüstriyel Kullanım | |
| Platinum (Pt) Sputtering Targets | NK2568 | Genel Endüstriyel Kullanım | Purity: 99.99%, Size: 3”, Thickness: 0.250” |